Gian Francesco Lorusso

City:

Overijse

Country:

Belgium

Published Applications:

Last publication date:

2025-02-13

Top Assignees for applications by Gian Francesco Lorusso

The entities that hold a legal rights for patent applications filed by inventor Lorusso Gian Francesco:

IMEC 4 Leuven, Belgium
IMEC VZW 2 Leuven, Belgium
Katholieke Universiteit Leuven 2 Leuven, Belgium
Interuniversitair Microelektronica Centrum (IMEC) vzw 2 Leuven, Belgium
SAMSUNG ELECTRONICS CO., LTD. 1 Suwon-si, South Korea
Interuniversitair Microelektronica Centrum vzw (IMEC) 1 Leuven, Belgium
Samsung Electronics Co., Ltd. 1 Suwon-Si- Gyenoggi-do, South Korea

Recent patent applications by Lorusso Gian Francesco

Gian Francesco Lorusso from Overijse, BE has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2025-02-13

US20250052703A1

Physics

METHOD FOR EVALUATING THE BENDING STIFFNESS OF HIGH ASPECT RATIO NANOSIZED STRUCTURES

#2 | 2023-09-21

US20230298854A1

Electricity

METHOD OF PERFORMING METROLOGY ON A MICROFABRICATION PATTERN

#3 | 2022-12-08

US20220392742A1

Electricity

Pattern height metrology using an e-beam system

#4 | 2012-04-26

US20120099092A1

Physics

Detection of contamination in EUV systems

#5 | 2012-03-29

US20120075604A1

Physics

Methods and systems for evaluating extreme ultraviolet mask flatness

#6 | 2009-04-23

US20090103069A1

Physics

DETECTION OF CONTAMINATION IN EUV SYSTEMS

#7 | 2008-12-25

US20080315125A1

Physics

Method and system for measuring contamination of a lithographical element

#8 | 2008-09-18

US20080229273A1

Physics

Systems and methods for UV lithography

InventorID:

3130502 ⎘