Inventor profile of:

Tammo UITTERDIJK

City:

De Bilt

Country:

Netherlands

Published Applications:

26

Last publication date:

2019-03-21

Top Assignees for applications by Tammo UITTERDIJK

The entities that hold a legal rights for patent applications filed by inventor UITTERDIJK Tammo:

Recent patent applications by UITTERDIJK Tammo

Tammo UITTERDIJK from De Bilt, NL has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2019-03-21
US20190086819A1
Physics

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

#2 | 2017-06-08
US20170160650A1
Physics

Lithographic apparatus and device manufacturing method

#3 | 2014-11-27
US20140347642A1
Physics

Lithographic apparatus and device manufacturing method

#4 | 2014-03-13
US20140071420A1
Physics

Lithographic apparatus and device manufacturing method

#5 | 2013-07-11
US20130176547A1
Physics

Lithographic apparatus and a method for determining a polarization property of a projection system using an adjustable polarizer and interferometric sensor

#6 | 2012-01-12
US20120008113A1
Physics

Lithographic apparatus, control system and device manufacturing method

#7 | 2011-11-17
US20110279796A1
Physics

Lithographic apparatus and device manufacturing method

#8 | 2011-06-30
US20110159441A1
Physics

Lithographic apparatus and device manufacturing method

#9 | 2010-07-22
US20100182582A1
Physics

Passive reticle tool, a lithographic apparatus and a method of patterning a device in a lithography tool

#10 | 2010-05-13
US20100118288A1
Physics

Lithographic projection system and projection lens polarization sensor

#11 | 2010-02-25
US20100045956A1
Physics

Lithographic Apparatus, Method for Determining at Least One Polarization Property Thereof, Polarization Analyzer and Polarization Sensor Thereof

#12 | 2008-10-23
US20080259296A1
Physics

Lithographic apparatus and device manufacturing method

#13 | 2008-09-04
US20080212183A1
Physics

Lithographic apparatus, aberration correction device and device manufacturing method

#14 | 2008-06-12
US20080137049A1
Physics

Lithographic apparatus, device manufacturing methods, mask and method of characterizing a mask and/or pellicle

#15 | 2007-12-27
US20070296938A1
Physics

Method of reducing a wave front aberration, and computer program product

#16 | 2007-09-13
US20070211233A1
Physics

Lithographic apparatus, control system and device manufacturing method

#17 | 2007-07-03
US10738992
-

Lithographic apparatus and device manufacturing method

#18 | 2007-02-15
US20070035845A1
Physics

Lens element, lithographic apparatus, device manufacturing method, and device manufactured thereby

#19 | 2006-09-14
US20060203221A1
Physics

Lithographic apparatus and a method for determining a polarization property

#20 | 2006-08-31
US20060192937A1
Physics

Lithographic apparatus

#21 | 2006-07-20
US20060158628A1
Physics

Lithographic apparatus and device and device manufacturing method

#22 | 2006-06-29
US20060139589A1
Physics

Lithographic apparatus and device manufacturing method

#23 | 2006-05-25
US20060109448A1
Physics

Method for bonding a pellicle to a patterning device and patterning device comprising a pellicle

#24 | 2005-12-22
US20050280789A1
Physics

Lithographic apparatus, device manufacturing method, and mask having a pellicle attached hereto

#25 | 2005-09-22
US20050206879A1
Physics

Lithographic apparatus and methods for use thereof

#26 | 2005-06-30
US20050140949A1
Physics

Lithographic apparatus, device manufacturing methods, mask and method of characterizing a mask and/or pellicle

InventorID:

332646 ⎘