San Jose, California
United States
15
2009-10-01
The entities that hold a legal rights for patent applications filed by inventor Kim Hung-Eil:
Hung-Eil Kim from San Jose, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Method and apparatus for optimizing an optical proximity correction model
#2 | 2009-08-20Method of forming an electronic device including forming features within a mask and a selective removal process
#3 | 2009-06-02System and method for designing an integrated circuit device
#4 | 2008-09-09Mask CD measurement monitor outside of the pellicle area
#5 | 2008-05-06Two mask photoresist exposure pattern for dense and isolated regions
#6 | 2007-12-25Optimizing an integrated circuit layout by taking into consideration layout interactions as well as extra manufacturability margin
#7 | 2007-09-06System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniques
#8 | 2007-04-17Method and system for metrology recipe generation and review and analysis of design, simulation and metrology results
#9 | 2007-03-20System and method for design rule creation and selection
#10 | 2006-06-20Method of verifying an optical proximity correction (OPC) model
#11 | 2006-03-28Patterning for elongated Vcontact flash memory
#12 | 2006-02-16Method of forming narrowly spaced flash memory contact openings and lithography masks
#13 | 2005-10-13System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniques
#14 | 2005-10-06System and method for fabricating contact holes
#15 | 2005-05-31Patterning for elliptical Vss contact on flash memory
4008699 ⎘