San Jose, California
United States
13
2023-11-30
The entities that hold a legal rights for patent applications filed by inventor Pearman Ryan:
Ryan Pearman from San Jose, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Method and system for determining a charged particle beam exposure for a local pattern density
#2 | 2023-06-29Method and system of reducing charged particle beam write time
#3 | 2023-04-20METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE FOR A LOCAL PATTERN DENSITY
#4 | 2021-10-07Method and system for determining a charged particle beam exposure for a local pattern density
#5 | 2021-07-08Method and system of reducing charged particle beam write time
#6 | 2021-04-22Method and system of reducing charged particle beam write time
#7 | 2020-11-26Method and system for determining a charged particle beam exposure for a local pattern density
#8 | 2020-08-18Method and system for determining a charged particle beam exposure for a local pattern density
#9 | 2020-06-25Method and system of reducing charged particle beam write time
#10 | 2017-05-04Shaped beam lithography including temperature effects
#11 | 2014-05-08Method and system for improving critical dimension uniformity using shaped beam lithography
#12 | 2013-10-24Method and system for critical dimension uniformity using charged particle beam lithography
#13 | 2013-08-22Lithography mask having sub-resolution phased assist features
401800 ⎘