Beaverton, Oregon
United States
29
2017-07-20
The entities that hold a legal rights for patent applications filed by inventor Allison William C.:
William C. Allison from Beaverton, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Polishing pad having polishing surface with continuous protrusions
#2 | 2017-05-04Polishing pad with foundation layer and window attached thereto
#3 | 2016-08-04Low density polishing pad
#4 | 2016-01-28POLISHING PAD WITH CONCENTRIC OR APPROXIMATELY CONCENTRIC POLYGON GROOVE PATTERN
#5 | 2015-12-24Polishing pad having porogens with liquid filler
#6 | 2015-12-03SOFT POLISHING PAD FOR POLISHING A SEMICONDUCTOR SUBSTRATE
#7 | 2015-10-01POLISHING PAD WITH FOUNDATION LAYER AND POLISHING SURFACE LAYER
#8 | 2015-10-01Polishing pad with foundation layer and polishing surface layer
#9 | 2015-09-24Polishing pad with grooved foundation layer and polishing surface layer
#10 | 2015-06-04Polishing pad with alignment feature
#11 | 2015-03-19Method of fabricating a polishing
#12 | 2015-02-26Polishing pad with homogeneous body having discrete protrusions thereon
#13 | 2015-02-05LOW DENSITY POLISHING PAD
#14 | 2014-09-18Polishing pad having polishing surface with continuous protrusions having tapered sidewalls
#15 | 2014-07-24Polishing pad having polishing surface with continuous protrusions
#16 | 2014-06-19Polishing pad with multi-modal distribution of pore diameters
#17 | 2014-05-08Homogeneous polishing pad for eddy current end-point detection
#18 | 2014-04-17Polishing pad for eddy current end-point detection
#19 | 2013-12-05Polishing pad with polishing surface layer having an aperture or opening above a transparent foundation layer
#20 | 2013-05-30Polishing pad with foundation layer and polishing surface layer
#21 | 2013-05-30Polishing pad with grooved foundation layer and polishing surface layer
#22 | 2013-01-17Polishing pad with alignment aperture
#23 | 2012-11-29POLISHING PAD WITH HOMOGENEOUS BODY HAVING DISCRETE PROTRUSIONS THEREON
#24 | 2012-11-08Polishing pad with alignment feature
#25 | 2012-07-26Polishing pad with concentric or approximately concentric polygon groove pattern
#26 | 2012-04-19Polishing pad with multi-modal distribution of pore diameters
#27 | 2012-04-05Homogeneous polishing pad for eddy current end-point detection
#28 | 2012-04-05Polishing pad for eddy current end-point detection
#29 | 2012-04-05Method of fabricating a polishing pad with an end-point detection region for eddy current end-point detection
41675 ⎘