Austin, Texas
United States
8
2008-07-10
The entities that hold a legal rights for patent applications filed by inventor Wang David C.:
David C. Wang from Austin, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Dual interlayer dielectric stressor integration with a sacrificial underlayer film stack
#2 | 2007-04-05Etching technique to planarize a multi-layer structure
#3 | 2006-03-23Method of forming an in-situ recessed structure
#4 | 2006-02-16Method to provide a layer with uniform etch characteristics
#5 | 2005-10-20Structure comprising tunable anti-reflective coating and method of forming thereof
#6 | 2005-08-04Structure comprising amorphous carbon film and method of forming thereof
#7 | 2005-05-19Structure comprising tunable anti-reflective coating and method of forming thereof
#8 | 2005-04-28Method for using ion implantation to treat the sidewalls of a feature in a low-k dielectric film
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