Ramkumar Subramanian

Systems and methods that control liquid temperature in immersion lithography to maintain temperature gradient to reduce turbulence

Surface treatment with an acidic composition to prevent substrate and environmental contamination

Mask having sidewall absorbers to enable the printing of finer features in nanoprint lithography (1XMASK)

Feedback control of imprint mask feature profile using scatterometry and spacer etchback

Imprint lithography mask trimming for imprint mask using etch

Post fabrication CD modification on imprint lithography mask

Using supercritical fluids to clean lenses and monitor defects

Method of making an organic memory cell

Topography compensation of imprint lithography patterning

Two mask photoresist exposure pattern for dense and isolated regions

Silicon-containing resist to pattern organic low k-dielectrics

Extraction of tool independent line-edge-roughness (LER) measurements using in-line programmed LER and reliability structures

System and method for imprint lithography to facilitate dual damascene integration with two imprint acts

Method for manufacturing place & route based on 2-D forbidden patterns

Systems and methods of imprint lithography with adjustable mask

Frame structure for turbulence control in immersion lithography

Organic BARC with adjustable etch rate

Osmotic dosage form with controlled release and fast release aspects

In-situ reticle contamination detection system at exposure wavelength

Using scatterometry to verify contact hole opening during tapered bilayer etch

System and method for imprint lithography to facilitate dual damascene integration with two imprint acts

In-situ defect monitor and control system for immersion medium in immersion lithography

Composite alignment mark scheme for multi-layers in lithography

Systems and methods that employ exposure compensation to provide uniform CD control on reticle during fabrication

Use of supercritical fluid to dry wafer and clean lens in immersion lithography

Using supercritical fluids to clean lenses and monitor defects

Real time immersion medium control using scatterometry

SOtreatment of oxidized CuO for copper sulfide formation of memory element growth

Surface oxide tabulation and photo process control and cost savings

System and method for creation of semiconductor multi-sloped features

Scatterometry and acoustic based active control of thin film deposition process

Scatterometry monitor in cluster process tool environment for advanced process control (APC)

Optical monitoring and control of two layers of liquid immersion media

Non-lithographic shrink techniques for improving line edge roughness and using imperfect (but simpler) BARCs

Shallow trench isolation polish stop layer for reduced topography

System and method using in situ scatterometry to detect photoresist pattern integrity during the photolithography process

System and method for active control of etch process

Patterning for elongated Vcontact flash memory

Damascene process for a T-shaped gate electrode

Refractive index system monitor and control for immersion lithography

Scatterometry with grating to observe resist removal rate during etch

Using scatterometry to detect and control undercut for ARC with developable BARCs

Artificial intelligence system for track defect problem solving

Organic memory cell formation on Ag substrate

Copper oxide monitoring by scatterometry/ellipsometry during nitride or BLOK removal in damascene process

Feed forward process control using scatterometry for reticle fabrication

Comprehensive integrated lithographic process control system based on product design and yield feedback system

Using scatterometry to obtain measurements of in circuit structures

Contact etch resistant spacers

Patterning for elliptical Vss contact on flash memory

Sidewall formation for high density polymer memory element array

Use of scatterometry as a control tool in the manufacture of extreme UV masks

Fab correlation system

E-beam flood exposure of spin-on material to eliminate voids in vias

Photosensitive polymeric memory elements

Monitor and control of silicidation using fourier transform infrared scatterometry

Refractive index system monitor and control for immersion lithography

System for monitoring and analyzing diagnostic data of spin tracks