Santa Clara, California
United States
18
2011-03-29
The entities that hold a legal rights for patent applications filed by inventor Tabery Cyrus E.:
Cyrus E. Tabery from Santa Clara, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Methods for forming small contacts
#2 | 2010-12-21Wafer assembly having a contrast enhancing top anti-reflecting coating and method of lithographic processing
#3 | 2010-06-22Method for removal of immersion lithography medium in immersion lithography processes
#4 | 2009-06-02System and method for designing an integrated circuit device
#5 | 2008-10-07Formation of semiconductor devices to achieve <100> channel orientation
#6 | 2007-12-25Optimizing an integrated circuit layout by taking into consideration layout interactions as well as extra manufacturability margin
#7 | 2007-10-02Lithography mask utilizing asymmetric light source
#8 | 2007-09-06System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniques
#9 | 2007-03-20System and method for design rule creation and selection
#10 | 2007-02-27Methods for forming small contacts
#11 | 2006-10-17Patterning with rigid organic under-layer
#12 | 2006-08-15End-of-range defect minimization in semiconductor device
#13 | 2006-05-30Method for forming wordlines having irregular spacing in a memory array
#14 | 2005-10-13System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniques
#15 | 2005-10-06System and method for fabricating contact holes
#16 | 2005-05-19Self aligned damascene gate
#17 | 2005-03-03Method and apparatus for elimination of bubbles in immersion medium in immersion lithography systems
#18 | 2005-02-15FinFET gate formation using reverse trim and oxide polish
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