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Inventor profile of:

Daniel Galburt

City:

Wilton, Connecticut

Country:

United States

Published Applications:

7

Last publication date:

2005-11-15

Top Assignees for applications by Daniel Galburt

The entities that hold a legal rights for patent applications filed by inventor Galburt Daniel:

  • ASML Holding N.V. 6 Veldhoven, Netherlands
  • ASML Netherlands B.V. 1 Veldhoven, Netherlands

Recent patent applications by Galburt Daniel

Daniel Galburt from Wilton, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2005-11-15
US10896235
-

System to increase throughput in a dual substrate stage double exposure lithography system

#2 | 2005-11-10
US20050248747A1
Physics

Method to increase throughput in a dual substrate stage double exposure lithography system

#3 | 2005-07-28
US20050162636A1
Physics

System to increase throughput in a dual substrate stage double exposure lithography system

#4 | 2005-04-14
US20050077484A1
Physics

Method and system for improved trajectory planning and execution

#5 | 2005-04-05
US10632798
-

Method to increase throughput in a dual substrate stage double exposure lithography system

#6 | 2005-02-08
US10406602
-

Position correction in Y of mask object shift due to Z offset and non-perpendicular illumination

#7 | 2005-01-18
US10299855
-

Method, system, and computer program product for improved trajectory planning and execution

InventorID:

4822425 ⎘

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