Los Altos, California
United States
18
2016-04-14
The entities that hold a legal rights for patent applications filed by inventor Tucker Michael:
Michael Tucker from Los Altos, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Method for fracturing and forming a pattern using shaped beam charged particle beam lithography
#2 | 2015-04-16Method For Fracturing And Forming A Pattern Using Shaped Beam Charged Particle Beam Lithography
#3 | 2015-03-19Method for forming circular patterns on a surface
#4 | 2014-05-15Method for forming circular patterns on a surface
#5 | 2013-11-28Method for fracturing and forming a pattern using shaped beam charged particle beam lithography
#6 | 2013-05-16Method for fracturing and forming a pattern using shaped beam charged particle beam lithography
#7 | 2013-05-16Method for forming circular patterns on a surface
#8 | 2013-01-24METHOD AND SYSTEM FOR MANUFACTURING A SURFACE USING SHAPED CHARGED PARTICLE BEAM LITHOGRAPHY
#9 | 2012-04-19Method for integrated circuit manufacturing and mask data preparation using curvilinear patterns
#10 | 2012-02-16Method, device, and system for forming circular patterns on a surface
#11 | 2012-02-09Method for fracturing and forming a pattern using circular characters with charged particle beam lithography
#12 | 2012-02-02Method for fracturing and forming a pattern using curvilinear characters with charged particle beam lithography
#13 | 2011-04-21METHOD AND SYSTEM FOR MANUFACTURING A SURFACE USING CHARGED PARTICLE BEAM LITHOGRAPHY
#14 | 2011-04-21Method for fracturing a pattern for writing with a shaped charged particle beam writing system using dragged shots
#15 | 2011-03-03Method for fracturing and forming a pattern using curvilinear characters with charged particle beam lithography
#16 | 2010-03-04Method and system for forming circular patterns on a surface
#17 | 2010-03-04Method for design and manufacture of a reticle using variable shaped beam lithography
#18 | 2010-03-04Method for fracturing circular patterns and for manufacturing a semiconductor device
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