Sagamihara
Japan
15
2024-05-30
The entities that hold a legal rights for patent applications filed by inventor Nakano Ryu:
Ryu Nakano from Sagamihara, JP has applied for patents for these inventions. The list has both pending applications and granted patents:
CYCLICAL DEPOSITION METHODS AND STRUCTURES FORMED USING THE METHODS
#2 | 2023-04-13Method for depositing silicon oxide film having improved quality by PEALD using bis(diethylamino)silane
#3 | 2023-01-19Cyclical deposition methods
#4 | 2022-07-07METHOD OF TREATING A SUBSTRATE
#5 | 2022-03-03Method and system for forming patterned structures using multiple patterning process
#6 | 2021-11-11REACTOR SYSTEM COMPRISING A TUNING CIRCUIT
#7 | 2021-10-07Method for forming barrier layer and method for manufacturing semiconductor device
#8 | 2021-02-25Method for depositing silicon oxide film having improved quality by peald using bis(diethylamino)silane
#9 | 2015-11-05Low-oxidation plasma-assisted process
#10 | 2015-10-08Method for stabilizing reaction chamber pressure
#11 | 2015-09-10Film forming apparatus, and method of manufacturing semiconductor device
#12 | 2015-04-30Method for trimming carbon-containing film at reduced trimming rate
#13 | 2015-03-19Method for forming oxide film by plasma-assisted processing
#14 | 2014-12-18Method for controlling in-plane uniformity of substrate processed by plasma-assisted process
#15 | 2012-10-18Footing reduction using etch-selective layer
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