Amol Joshi

Semiconductor Device Metal-Insulator-Semiconductor Contacts with Interface Layers and Methods for Forming the Same

Tantalum carbide metal gate stack for mid-gap work function applications

Metal-insulator-semiconductor (MIS) contact with controlled defect density

Gate structures for transistor devices for CMOS applications and products

High Productivity Combinatorial Testing of Multiple Work Function Materials on the Same Semiconductor Substrate

Two Step Deposition of High-k Gate Dielectric Materials

Reduction of native oxides by annealing in reducing gas or plasma

METHODS FOR DEPOSITING AN ALUMINUM OXIDE LAYER OVER GERMANIUM SUSBTRATES IN THE FABRICATION OF INTEGRATED CIRCUITS

METHODS FOR REMOVING A NATIVE OXIDE LAYER FROM GERMANIUM SUSBTRATES IN THE FABRICATION OF INTEGRATED CIRCUITS

METHODS FOR REMOVING A NATIVE OXIDE LAYER FROM GERMANIUM SUSBTRATES IN THE FABRICATION OF INTEGRATED CIRCUITSI

UV treatment for ALD film densification

Methods of forming gate structures for transistor devices for CMOS applications

System and method for manufacturing self-aligned STI with single poly

Method to control depth profiles of dopants using a remote plasma source

PVD-ALD-CVD hybrid HPC for work function material screening

Sacrificial Low Work Function Cap Layer

Method for forming MOS capacitor

Circular transmission line methods compatible with combinatorial processing of semiconductors

Self-aligned STI with single poly for manufacturing a flash memory device

DISTRIBUTED SUBSTRATE TOP CONTACT FOR MOSCAP MEASUREMENTS

High productivity combinatorial oxide terracing and PVD/ALD metal deposition combined with lithography for gate work function extraction

Dual charge storage node memory device and methods for fabricating such device

Dual charge storage node memory device and methods for fabricating such device

Memory device and methods for its fabrication

Memory device and methods for its fabrication

Flash memory cell structure for increased program speed and erase speed