Poway, California
United States
113
2018-06-28
The entities that hold a legal rights for patent applications filed by inventor Partlo William N.:
William N. Partlo from Poway, US has applied for patents for these inventions. The list has both pending applications and granted patents:
EUV LIGHT SOURCE WITH SUBSYSTEM(S) FOR MAINTAINING LPP DRIVE LASER OUTPUT DURING EUV NON-OUTPUT PERIODS
#2 | 2018-01-18EUV light source with subsystem(s) for maintaining LPP drive laser output during EUV non-output periods
#3 | 2015-07-30Material supply apparatus for extreme ultraviolet light source having a filter constructed with a plurality of openings fluidly coupled to a plurality of through holes to remove non-target particles from the supply material
#4 | 2014-06-05Alignment of light source focus
#5 | 2014-05-29Master oscillator—power amplifier drive laser with pre-pulse for EUV light source
#6 | 2014-05-29EUV light source with subsystem(s) for maintaining LPP drive laser output during EUV non-output periods
#7 | 2014-04-24Systems and methods for optics cleaning in an EUV light source
#8 | 2014-04-17System, method and apparatus for aligning and synchronizing target material for optimum extreme ultraviolet light output
#9 | 2014-02-20System, method and apparatus for laser produced plasma extreme ultraviolet chamber with hot walls and cold collector mirror
#10 | 2013-12-12Corrosion resistant electrodes for laser chambers
#11 | 2012-12-13Systems and methods for buffer gas flow stabilization in a laser produced plasma light source
#12 | 2012-11-22Filter for material supply apparatus of an extreme ultraviolet light source
#13 | 2012-09-06Systems and methods for optics cleaning in an EUV light source
#14 | 2012-07-19Source collector, lithographic apparatus and device manufacturing method
#15 | 2012-04-19Oscillator-amplifier drive laser with seed protection for an EUV light source
#16 | 2012-04-12Laser system
#17 | 2012-04-05EUV light source with subsystem(s) for maintaining LPP drive laser output during EUV non-output periods
#18 | 2012-01-26Alignment of light source focus
#19 | 2012-01-05Laser system
#20 | 2011-12-29Master oscillator-power amplifier drive laser with pre-pulse for EUV light source
#21 | 2011-10-20Systems and methods for cooling an optic
#22 | 2011-10-13Systems and methods for target material delivery protection in a laser produced plasma EUV light source
#23 | 2011-10-06EUV light source glint reduction system
#24 | 2011-08-11Line narrowing module
#25 | 2011-07-07Laser thin film poly-silicon annealing optical system
#26 | 2011-06-16Metrology for extreme ultraviolet light source
#27 | 2011-06-16Beam transport system for extreme ultraviolet light source
#28 | 2011-05-26HIGH POWER HIGH PULSE REPETITION RATE GAS DISCHARGE LASER SYSTEM
#29 | 2011-05-05Laser system
#30 | 2010-12-30EUV light producing system and method utilizing an alignment laser
#31 | 2010-12-09Multi-chamber gas discharge laser bandwidth control through discharge timing
#32 | 2010-10-14System, method and apparatus for aligning and synchronizing target material for optimum extreme ultraviolet light output
#33 | 2010-10-14System, method and apparatus for laser produced plasma extreme ultraviolet chamber with hot walls and cold collector mirror
#34 | 2010-10-14System, method and apparatus for droplet catcher for prevention of backsplash in a EUV generation chamber
#35 | 2010-07-15Extreme ultraviolet light source
#36 | 2010-06-17System method and apparatus for selecting and controlling light source bandwidth
#37 | 2010-06-10Gas discharge laser chamber
#38 | 2010-05-27Systems and methods for drive laser beam delivery in an EUV light source
#39 | 2010-05-27Laser produced plasma EUV light source
#40 | 2010-05-06Laser system
#41 | 2010-04-22Line narrowing module
#42 | 2010-03-25Immersion lithography laser light source with pulse stretcher
#43 | 2010-03-04High pulse repetition rate gas discharge laser
#44 | 2010-02-04Laser produced plasma euv light source
#45 | 2009-12-03Laser system
#46 | 2009-12-03Laser system
#47 | 2009-06-18System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus
#48 | 2009-05-14Laser system
#49 | 2009-03-26Immersion lithography laser light source with pulse stretcher
#50 | 2009-03-12Laser system
#51 | 2008-11-20Method and apparatus for EUV plasma source target delivery
#52 | 2008-10-30Laser system
#53 | 2008-10-30Laser system
#54 | 2008-10-16Laser lithography system with improved bandwidth control
#55 | 2008-09-18Laser system
#56 | 2008-09-18Laser system
#57 | 2008-08-21High repetition rate laser produced plasma EUV light source
#58 | 2008-07-31Laser produced plasma EUV light source
#59 | 2008-07-10Laser system
#60 | 2008-06-26Line narrowing module
#61 | 2008-06-19Laser system
#62 | 2008-03-18DUV light source optical element improvements
#63 | 2008-01-31Extreme ultraviolet light source
#64 | 2007-12-27Bandwidth control device
#65 | 2007-12-20Drive laser for EUV light source
#66 | 2007-12-06Chamber for a high energy excimer laser source
#67 | 2007-10-02High power gas discharge laser with helium purged line narrowing unit
#68 | 2007-07-12EUV light source
#69 | 2007-05-24Collector for EUV light source
#70 | 2007-05-24Collector for EUV light source
#71 | 2007-05-15Line selected Ftwo chamber laser system
#72 | 2007-02-08High repetition rate laser produced plasma EUV light source
#73 | 2007-02-01Discharge produced plasma EUV light source
#74 | 2007-02-01EUV light source collector lifetime improvements
#75 | 2007-01-25Systems for protecting internal components of an EUV light source from plasma-generated debris
#76 | 2007-01-04Gas discharge laser line narrowing module
#77 | 2006-12-28High pulse repetition rate gas discharge laser
#78 | 2006-12-28EUV light source collector erosion mitigation
#79 | 2006-12-12High repetition rate gas discharge laser with precise pulse timing control
#80 | 2006-11-28EUV light source collector erosion mitigation
#81 | 2006-10-12Gas discharge laser output light beam parameter control
#82 | 2006-10-05Laser produced plasma EUV light source
#83 | 2006-09-21Control system for a two chamber gas discharge laser
#84 | 2006-08-31Method and apparatus for EUV plasma source target delivery
#85 | 2006-08-31Systems for protecting internal components of an EUV light source from plasma-generated debris
#86 | 2006-07-06LLP EUV drive laser
#87 | 2006-07-06Multi-chamber gas discharge laser bandwidth control through discharge timing
#88 | 2006-06-22Collector for EUV light source
#89 | 2006-06-15Very narrow band, two chamber, high rep-rate gas discharge laser system
#90 | 2006-06-06Line selected F2 two chamber laser system
#91 | 2006-06-01Line narrowing module
#92 | 2006-06-01High power high pulse repetition rate gas discharge laser system bandwidth management
#93 | 2006-05-04EUV collector debris management
#94 | 2006-05-02Control system for a two chamber gas discharge laser
#95 | 2006-02-21Method and apparatus for cooling magnetic circuit elements
#96 | 2006-01-10Very narrow band, two chamber, high reprate gas discharge laser system
#97 | 2005-12-29Laser output beam wavefront splitter for bandwidth spectrum control
#98 | 2005-12-08Very narrow band, two chamber, high rep-rate gas discharge laser system
#99 | 2005-12-08Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source
#100 | 2005-12-08Laser thin film poly-silicon annealing optical system
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