Stanley E. Stokowski

Image acquisition system, image acquisition method, and inspection system

In-line wafer edge inspection, wafer pre-alignment, and wafer cleaning

Apparatus and methods for inspecting extreme ultra violet reticles

Inspecting high-resolution photolithography masks

Apparatus and methods for inspecting extreme ultra violet reticles

Method and apparatus for inspecting a reflective lithographic mask blank and improving mask quality

Inspection systems and methods for detecting defects on extreme ultraviolet mask blanks

Inspection methods and systems for lithographic masks

Method and Apparatus for Detecting Surface Characteristics on a Mask Blank

System for Detecting Anomalies and/or Features of a Surface

Systems and methods for mitigating variances on a patterned wafer using a prediction model

Method for determining and correcting reticle variations

Method for monitoring a reticle

Systems and methods for modifying a reticle's optical properties

System for detecting anomalies and/or features of a surface

Systems and methods for a wafer inspection system using multiple angles and multiple wavelength illumination

Method and apparatus for detecting surface characteristics on a mask blank

Systems and methods for a wafer inspection system using multiple angles and multiple wavelength illumination

Illumination apparatus and methods

Scanning system for inspecting anamolies on surfaces

Scanning system for inspecting anomalies on surfaces