Milpitas, California
United States
22
2018-11-22
The entities that hold a legal rights for patent applications filed by inventor Rulkens Ron:
Ron Rulkens from Milpitas, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Photovoltaic cell with high efficiency CIGS absorber layer with low minority carrier lifetime and method of making thereof
#2 | 2018-08-07Photovoltaic cell with high efficiency cigs absorber layer with low minority carrier lifetime and method of making thereof
#3 | 2015-10-27Photovoltaic cell with copper poor CIGS absorber layer and method of making thereof
#4 | 2013-12-19Sputtering target including a feature to reduce chalcogen build up and arcing on a backing tube
#5 | 2011-09-08Electroless plating system
#6 | 2011-06-09Electroless Deposition System
#7 | 2010-09-07Sequential deposition/anneal film densification method
#8 | 2009-11-26NON-CORROSIVE CHEMICAL RINSE SYSTEM
#9 | 2009-11-26Electroless deposition system
#10 | 2009-10-08Electroless plating system
#11 | 2009-06-18Method and apparatus for plating solution analysis and control
#12 | 2009-02-17Metal-free catalysts for pulsed deposition layer process for conformal silica laminates
#13 | 2007-11-20Method for controlling properties of conformal silica nanolaminates formed by rapid vapor deposition
#14 | 2007-11-13Methods for the use of alkoxysilanol precursors for vapor deposition of SiOfilms
#15 | 2007-09-18Methods for forming high density, conformal, silica nanolaminate films via pulsed deposition layer in structures of confined geometry
#16 | 2007-05-29Dynamic rapid vapor deposition process for conformal silica laminates
#17 | 2007-04-10Silica thin films produced by rapid surface catalyzed vapor deposition (RVD) using a nucleation layer
#18 | 2006-12-12Sequential deposition/anneal film densification method
#19 | 2006-10-31Aluminum phosphate incorporation in silica thin films produced by rapid surface catalyzed vapor deposition (RVD)
#20 | 2006-08-29Mixed alkoxy precursors and methods of their use for rapid vapor deposition of SiOfilms
#21 | 2006-06-15Precursors for silica or metal silicate films
#22 | 2005-07-19Endpoint detection for high density plasma (HDP) processes
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