Gloucester, Massachusetts
United States
36
2018-07-31
The entities that hold a legal rights for patent applications filed by inventor Vanderberg Bo H.:
Bo H. Vanderberg from Gloucester, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Ion implantation system having beam angle control in drift and deceleration modes
#2 | 2016-06-30System and method to improve productivity of hybrid scan ion beam implanters
#3 | 2016-06-30Beam profiling speed enhancement for scanned beam implanters
#4 | 2016-06-30SYSTEMS AND METHODS FOR BEAM ANGLE ADJUSTMENT IN ION IMPLANTERS WITH BEAM DECELARATION
#5 | 2016-06-30Combined electrostatic lens system for ion implantation
#6 | 2013-07-18Beam line design to reduce energy contamination
#7 | 2013-06-13System and method for ion implantation with improved productivity and uniformity
#8 | 2013-01-31System and method for ion implantation with improved productivity and uniformity
#9 | 2012-10-04Uniformity of a scanned ion beam
#10 | 2010-12-09System and method for ion implantation with improved productivity and uniformity
#11 | 2010-07-22Enhanced low energy ion beam transport in ion implantation
#12 | 2010-04-08Hybrid scanning for ion implantation
#13 | 2010-03-18ADJUSTABLE DEFLECTION OPTICS FOR ION IMPLANTATION
#14 | 2010-01-21Method and apparatus for measurement of beam angle in ion implantation
#15 | 2009-12-31Ion implanter having combined hybrid and double mechanical scan architecture
#16 | 2009-05-07Plasma electron flood for ion beam implanter
#17 | 2009-02-05Ion implanter having combined hybrid and double mechanical scan architecture
#18 | 2008-10-30Method and system for ion beam profiling
#19 | 2008-06-26System and method for two-dimensional beam scan across a workpiece of an ion implanter
#20 | 2008-04-03Beam line architecture for ion implanter
#21 | 2008-03-20Ion beam scanning control methods and systems for ion implantation uniformity
#22 | 2008-03-20Beam angle adjustment in ion implanters
#23 | 2008-03-20System for magnetic scanning and correction of an ion beam
#24 | 2008-03-20Ion source
#25 | 2008-03-13Systems and methods for beam angle adjustment in ion implanters
#26 | 2008-02-14Throughput enhancement for scanned beam ion implanters
#27 | 2007-06-05Systems and methods for beam angle adjustment in ion implanters
#28 | 2007-05-31Beam current stabilization utilizing gas feed control loop
#29 | 2007-05-31Means to establish orientation of ion beam to wafer and correct angle errors
#30 | 2006-06-15Method and apparatus for ion beam profiling
#31 | 2006-04-04Biased electrostatic deflector
#32 | 2006-02-16Scanning systems and methods for providing ions from an ion beam to a workpiece
#33 | 2006-01-26Magnet for scanning ion beams
#34 | 2005-06-07Ion beam scanning systems and methods for improved ion implantation uniformity
#35 | 2005-04-12Thin magnetron structures for plasma generation in ion implantation systems
#36 | 2005-02-03Method and system for ion beam containment using photoelectrons in an ion beam guide
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