Inventor profile of:

Bo H. Vanderberg

City:

Gloucester, Massachusetts

Country:

United States

Published Applications:

36

Last publication date:

2018-07-31

Top Assignees for applications by Bo H. Vanderberg

The entities that hold a legal rights for patent applications filed by inventor Vanderberg Bo H.:

Recent patent applications by Vanderberg Bo H.

Bo H. Vanderberg from Gloucester, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2018-07-31
US15637538
Electricity

Ion implantation system having beam angle control in drift and deceleration modes

#2 | 2016-06-30
US20160189928A1
Electricity

System and method to improve productivity of hybrid scan ion beam implanters

#3 | 2016-06-30
US20160189926A1
Electricity

Beam profiling speed enhancement for scanned beam implanters

#4 | 2016-06-30
US20160189917A1
Electricity

SYSTEMS AND METHODS FOR BEAM ANGLE ADJUSTMENT IN ION IMPLANTERS WITH BEAM DECELARATION

#5 | 2016-06-30
US20160189912A1
Electricity

Combined electrostatic lens system for ion implantation

#6 | 2013-07-18
US20130181139A1
Electricity

Beam line design to reduce energy contamination

#7 | 2013-06-13
US20130146760A1
Electricity

System and method for ion implantation with improved productivity and uniformity

#8 | 2013-01-31
US20130026356A1
Electricity

System and method for ion implantation with improved productivity and uniformity

#9 | 2012-10-04
US20120248326A1
Electricity

Uniformity of a scanned ion beam

#10 | 2010-12-09
US20100308215A1
Electricity

System and method for ion implantation with improved productivity and uniformity

#11 | 2010-07-22
US20100181499A1
Electricity

Enhanced low energy ion beam transport in ion implantation

#12 | 2010-04-08
US20100084576A1
Electricity

Hybrid scanning for ion implantation

#13 | 2010-03-18
US20100065761A1
Electricity

ADJUSTABLE DEFLECTION OPTICS FOR ION IMPLANTATION

#14 | 2010-01-21
US20100012861A1
Electricity

Method and apparatus for measurement of beam angle in ion implantation

#15 | 2009-12-31
US20090321625A1
Electricity

Ion implanter having combined hybrid and double mechanical scan architecture

#16 | 2009-05-07
US20090114815A1
Electricity

Plasma electron flood for ion beam implanter

#17 | 2009-02-05
US20090032726A1
Electricity

Ion implanter having combined hybrid and double mechanical scan architecture

#18 | 2008-10-30
US20080265866A1
Electricity

Method and system for ion beam profiling

#19 | 2008-06-26
US20080149857A1
Electricity

System and method for two-dimensional beam scan across a workpiece of an ion implanter

#20 | 2008-04-03
US20080078954A1
Electricity

Beam line architecture for ion implanter

#21 | 2008-03-20
US20080067444A1
Electricity

Ion beam scanning control methods and systems for ion implantation uniformity

#22 | 2008-03-20
US20080067442A1
Electricity

Beam angle adjustment in ion implanters

#23 | 2008-03-20
US20080067436A1
Electricity

System for magnetic scanning and correction of an ion beam

#24 | 2008-03-20
US20080067412A1
Electricity

Ion source

#25 | 2008-03-13
US20080061228A1
Electricity

Systems and methods for beam angle adjustment in ion implanters

#26 | 2008-02-14
US20080035862A1
Electricity

Throughput enhancement for scanned beam ion implanters

#27 | 2007-06-05
US11520190
-

Systems and methods for beam angle adjustment in ion implanters

#28 | 2007-05-31
US20070120075A1
Electricity

Beam current stabilization utilizing gas feed control loop

#29 | 2007-05-31
US20070120067A1
Electricity

Means to establish orientation of ion beam to wafer and correct angle errors

#30 | 2006-06-15
US20060124867A1
Electricity

Method and apparatus for ion beam profiling

#31 | 2006-04-04
US11047238
-

Biased electrostatic deflector

#32 | 2006-02-16
US20060033046A1
Electricity

Scanning systems and methods for providing ions from an ion beam to a workpiece

#33 | 2006-01-26
US20060017010A1
Electricity

Magnet for scanning ion beams

#34 | 2005-06-07
US10865061
-

Ion beam scanning systems and methods for improved ion implantation uniformity

#35 | 2005-04-12
US10600775
-

Thin magnetron structures for plasma generation in ion implantation systems

#36 | 2005-02-03
US20050023487A1
Electricity

Method and system for ion beam containment using photoelectrons in an ion beam guide

InventorID:

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