Schenectady, New York
United States
53
2025-02-20
The entities that hold a legal rights for patent applications filed by inventor Colburn Matthew E.:
Matthew E. Colburn from Schenectady, US has applied for patents for these inventions. The list has both pending applications and granted patents:
SELF ALIGNED PATTERN FORMATION POST SPACER ETCHBACK IN TIGHT PITCH CONFIGURATIONS
#2 | 2024-03-21Self aligned pattern formation post spacer etchback in tight pitch configurations
#3 | 2021-09-09Self aligned pattern formation post spacer etchback in tight pitch configurations
#4 | 2020-03-05Self aligned pattern formation post spacer etchback in tight pitch configurations
#5 | 2019-12-26Self-aligned quadruple patterning (SAQP) for routing layouts including multi-track jogs
#6 | 2018-12-06Self aligned pattern formation post spacer etchback in tight pitch configurations
#7 | 2018-08-16Self aligned conductive lines with relaxed overlay
#8 | 2018-08-16Self-aligned quadruple patterning (SAQP) for routing layouts including multi-track jogs
#9 | 2018-07-12Self aligned pattern formation post spacer etchback in tight pitch configurations
#10 | 2018-04-03Self aligned pattern formation post spacer etchback in tight pitch configurations
#11 | 2018-01-25Aligning conductive vias with trenches
#12 | 2018-01-04Self aligned conductive lines with relaxed overlay
#13 | 2017-12-14Self aligned conductive lines
#14 | 2017-12-07Self-aligned quadruple patterning (SAQP) for routing layouts including multi-track jogs
#15 | 2017-10-03Method and structure for cut material selection
#16 | 2017-09-26Aligning conductive vias with trenches
#17 | 2017-03-28Self aligned conductive lines with relaxed overlay
#18 | 2016-11-03Graphoepitaxy directed self-assembly process for semiconductor fin formation
#19 | 2016-11-03Method to harden photoresist for directed self-assembly processes
#20 | 2016-09-29Fin trimming in a double sit process
#21 | 2016-06-09Self-aligned quadruple patterning process
#22 | 2016-03-10Self-aligned quadruple patterning process
#23 | 2015-06-18Integration of dense and variable pitch fin structures
#24 | 2015-02-12Integration of dense and variable pitch fin structures
#25 | 2015-02-12Integration of dense and variable pitch fin structures
#26 | 2014-10-30Grapho-epitaxy DSA process with dimension control of template pattern
#27 | 2014-10-23Grapho-epitaxy DSA process with dimension control of template pattern
#28 | 2014-09-11DSA grapho-epitaxy process with etch stop material
#29 | 2014-05-22Methods of forming nanoparticles using semiconductor manufacturing infrastructure
#30 | 2014-04-10Simultaneous photoresist development and neutral polymer layer formation
#31 | 2013-07-18WAFER FILL PATTERNS AND USES
#32 | 2013-07-11TONE INVERSION WITH PARTIAL UNDERLAYER ETCH FOR SEMICONDUCTOR DEVICE FORMATION
#33 | 2013-01-31Method of fabricating dual damascene structures using a multilevel multiple exposure patterning scheme
#34 | 2012-11-08Sidewall image transfer process employing a cap material layer for a metal nitride layer
#35 | 2012-05-24Tone inversion with partial underlayer etch for semiconductor device formation
#36 | 2012-05-24Method of forming a semiconductor device having a cut-way hole to expose a portion of a hardmask layer
#37 | 2012-02-21Mask and etch process for pattern assembly
#38 | 2011-10-20Method and material for a thermally crosslinkable random copolymer
#39 | 2011-08-25Method of fabricating dual damascene structures using a multilevel multiple exposure patterning scheme
#40 | 2011-06-23Methods of directed self-assembly, and layered structures formed therefrom
#41 | 2011-02-24Functionalized carbosilane polymers and photoresist compositions containing the same
#42 | 2010-07-15Method for reducing tip-to-tip spacing between lines
#43 | 2009-12-17Chemical trim of photoresist lines by means of a tuned overcoat material
#44 | 2009-10-01Method for removing residues from a patterned substrate
#45 | 2009-09-17Method for fabricating self-aligned nanostructure using self-assembly block copolymers, and structures fabricated therefrom
#46 | 2009-08-13Gate patterning scheme with self aligned independent gate etch
#47 | 2009-07-23Method and material for a thermally crosslinkable random copolymer
#48 | 2009-04-23Process of multiple exposures with spin castable film
#49 | 2009-03-26FUNCTIONALIZED CARBOSILANE POLYMERS AND PHOTORESIST COMPOSITIONS CONTAINING THE SAME
#50 | 2009-03-26Functionalized carbosilane polymers and photoresist compositions containing the same
#51 | 2009-03-26Functionalized carbosilane polymers and photoresist compositions containing the same
#52 | 2009-03-26FUNCTIONALIZED CARBOSILANE POLYMERS AND PHOTORESIST COMPOSITIONS CONTAINING THE SAME
#53 | 2009-03-26Integrated circuits and methods of design and manufacture thereof
61387 ⎘