Shintaro Ueda

City:

Tama

Country:

Japan

Published Applications:

Last publication date:

2015-04-30

Top Assignees for applications by Shintaro Ueda

The entities that hold a legal rights for patent applications filed by inventor Ueda Shintaro:

Shintaro Ueda from Tama, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

Method for treating SiOCH film with hydrogen plasma

Method for forming SiOCH film using organoaminosilane annealing

Method for filling recesses using pre-treatment with hydrocarbon-containing gas

Atomic layer deposition for controlling vertical film growth

Method of depositing film by atomic layer deposition with pulse-time-modulated plasma

Method for depositing flowable material using alkoxysilane or aminosilane precursor

InventorID:

6290941 ⎘