Daegu
South Korea
5
2025-07-17
The entities that hold a legal rights for patent applications filed by inventor KIM Yong-Dae:
Yong-Dae KIM from Daegu, KR has applied for patents for these inventions. The list has both pending applications and granted patents:
REVERSE PHOTOMASK THAT PHASE SHIFT FILM PATTERN IS USED FOR REFLECTIVE PATTERN, AND BLANKMASK FOR MANUFACTURING THE SAME
#2 | 2025-04-17PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY WITH ABSORBING FILM OF CrSb
#3 | 2024-10-03PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY
#4 | 2024-04-18PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY
#5 | 2024-04-18PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY
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