Robert B. Ogle

Non-volatile memory device with improved erase speed

Method for forming memory array bitlines comprising epitaxially grown silicon and related structure

Scanning laser thermal annealing

Localized halo implant region formed using tilt pre-amorphization implant and laser thermal anneal

End-of-range defect minimization in semiconductor device

Laser thermal annealing methods for flash memory devices

Low-temperature post-dopant activation process

Polysilicon tilting to prevent geometry effects during laser thermal annealing

Method of making a memory cell with polished insulator layer

Oxidizing pretreatment of ONO layer for flash memory

Preparation of composite high-K/standard-K dielectrics for semiconductor devices