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Inventor profile of:

Einstein Noel ABARRA

City:

Tokyo

Country:

Japan

Published Applications:

Last publication date:

2023-09-28

Top Assignees for applications by Einstein Noel ABARRA

The entities that hold a legal rights for patent applications filed by inventor ABARRA Einstein Noel:

TOKYO ELECTRON LIMITED 13 Tokyo, Japan
CANON ANELVA CORPORATION 10 Kawasaki-shi, Japan
TOKYO ELECTRON LIMTED 1 Tokyo, Japan
TDK CORPORATION 1 Tokyo, Japan
iZA CORPORATION 1 Tokyo, Japan

Recent patent applications by ABARRA Einstein Noel

Einstein Noel ABARRA from Tokyo, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2023-09-28

US20230304741A1

Mechanical engineering

Magnetic annealing equipment and method

#2 | 2023-02-16

US20230051311A1

Electricity

Conductive Superlattice Structures and Methods of Forming the Same

#3 | 2022-09-08

US20220285197A1

Electricity

Substrate processing apparatus and abnormality detection method

#4 | 2022-09-08

US20220285182A1

Electricity

SUBSTRATE PROCESSING APPARATUS AND ABNORMALITY DETECTION METHOD

#5 | 2022-07-28

US20220236202A1

Physics

HOLDER TEMPERATURE DETECTION METHOD, HOLDER MONITORING METHOD AND SUBSTRATE PROCESSING APPARATUS

#6 | 2022-06-30

US20220208534A1

Electricity

Sputtering apparatus and method of controlling sputtering apparatus

#7 | 2022-03-17

US20220081757A1

Chemistry; metallurgy

FILM FORMING APPARATUS, FILM FORMING SYSTEM, AND FILM FORMING METHOD

#8 | 2022-02-10

US20220044920A1

Electricity

Sputtering apparatus and film forming method

#9 | 2022-01-27

US20220025511A1

Chemistry; metallurgy

Apparatus and method for performing sputtering process

#10 | 2021-09-16

US20210285096A1

Chemistry; metallurgy

Film thickness measuring apparatus and film thickness measuring method, and film forming system and film forming method

#11 | 2021-08-19

US20210257198A1

Electricity

Cathode unit and film forming apparatus

#12 | 2021-04-22

US20210118653A1

Electricity

Film formation device and film formation method

#13 | 2021-03-18

US20210082777A1

Electricity

Film forming system, magnetization characteristic measuring device, and film forming method

#14 | 2021-01-21

US20210020419A1

Electricity

Target structure and film forming apparatus

#15 | 2020-03-19

US20200093027A1

Electricity

SUBSTRATE PLACEMENT MECHANISM, FILM FORMING APPARATUS, AND FILM FORMING METHOD

#16 | 2019-11-21

US20190352771A1

Chemistry; metallurgy

Film forming apparatus and film forming method

#17 | 2014-04-17

US20140105709A1

Electricity

Substrate processing apparatus

#18 | 2011-12-08

US20110297537A1

Electricity

Magnet unit and magnetron sputtering apparatus

#19 | 2011-11-10

US20110272278A1

Chemistry; metallurgy

Sputtering apparatus

#20 | 2011-06-16

US20110139998A1

Electricity

Ion beam generator

#21 | 2010-09-23

US20100239394A1

Electricity

Inline-type wafer conveyance device

#22 | 2010-08-26

US20100215460A1

Electricity

Inline-type wafer conveyance device

#23 | 2010-08-26

US20100213048A1

Chemistry; metallurgy

Magnetron sputtering cathode, magnetron sputtering apparatus, and method of manufacturing magnetic device

#24 | 2010-07-29

US20100189532A1

Electricity

INLINE-TYPE WAFER CONVEYANCE DEVICE

#25 | 2010-06-24

US20100155229A1

Chemistry; metallurgy

Sputtering apparatus and film deposition method

#26 | 2010-06-24

US20100155227A1

Chemistry; metallurgy

SPUTTERING APPARATUS AND FILM FORMING METHOD

#27 | 2010-06-03

US20100133090A1

Chemistry; metallurgy

Film forming method by sputtering and sputtering apparatus thereof

InventorID:

726760 ⎘