Patents-Review.com
🔗 Permalink
Assignee profile:

TOKYO ELECTRON LIMTED

City:

Tokyo

Country:

Japan

Published Applications:

11

Last publication date:

2021-09-16

Patent Grants:

8

Last grant date:

2024-03-26

Top Inventors for applications by TOKYO ELECTRON LIMTED

These are the the leading inventors for applications assigned to TOKYO ELECTRON LIMTED:

Recent patent applications by TOKYO ELECTRON LIMTED

TOKYO ELECTRON LIMTED based in Tokyo, JP has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:

#1 | 2021-09-16 ✅ Patent 11,939,665 granted on 2024-03-26
US20210285096A1
Chemistry; metallurgy

Film thickness measuring apparatus and film thickness measuring method, and film forming system and film forming method

 #2 | 2018-07-12 ✅ Patent 11,674,225 granted on 2023-06-13
US20180195173A1
Chemistry; metallurgy

Substrate processing apparatus

 #3 | 2013-09-12 ✅ Patent 8,692,208 granted on 2014-04-08
US20130234035A1
Electricity

Ion supply device and workpiece processing system provided with the same

 #4 | 2013-08-15
US20130206460A1
Electricity

CIRCUIT BOARD FOR SEMICONDUCTOR DEVICE INSPECTION APPARATUS AND MANUFACTURING METHOD THEREOF

 #5 | 2011-12-22 ✅ Patent 8,845,262 granted on 2014-09-30
US20110311340A1
Electricity

Substrate processing apparatus, substrate processing method and storage medium storing substrate processing program

 #6 | 2011-12-01 ✅ Patent 8,674,607 granted on 2014-03-18
US20110291568A1
Electricity

Plasma processing apparatus and processing gas supply structure thereof

 #7 | 2011-09-08
US20110217796A1
Electricity

ETCHING METHOD AND APPARATUS

 #8 | 2010-09-30 ✅ Patent 8,030,632 granted on 2011-10-04
US20100243860A1
Physics

Controlling angle of incidence of multiple-beam optical metrology tools

 #9 | 2010-08-12
US20100200162A1
Electricity

SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD

 #10 | 2008-09-25 ✅ Patent 7,839,156 granted on 2010-11-23
US20080231300A1
Physics

Method for detecting tip position of probe, alignment method, apparatus for detecting tip position of probe and probe apparatus

 #11 | 2007-04-05 ✅ Patent 7,405,168 granted on 2008-07-29
US20070077781A1
Electricity

Plural treatment step process for treating dielectric films

Also check out Tokyo Electron Limted's (Tokyo, Japan) applicant profile with 1 patent applications submitted.

AssigneeID:

34335 ⎘