Rixensart
Belgium
19
2025-10-02
The entities that hold a legal rights for patent applications filed by inventor Schram Tom:
Tom Schram from Rixensart, BE has applied for patents for these inventions. The list has both pending applications and granted patents:
METHOD FOR FORMING A 2D CHANNEL FIELD-EFFECT TRANSISTOR DEVICE
#2 | 2025-10-02METHOD FOR FORMING A TMD LAYER STRUCTURE
#3 | 2023-06-15STATIC RANDOM-ACCESS MEMORY DEVICE WITH THREE-LAYERED CELL DESIGN
#4 | 2017-11-16Method of forming gate of semiconductor device and semiconductor device having same
#5 | 2016-12-15Method for manufacturing a dual work function semiconductor device and the semiconductor device made thereof
#6 | 2016-07-07Method for tuning the effective work function of a metal
#7 | 2015-12-10Method for manufacturing a semiconductor device comprising transistors each having a different effective work function
#8 | 2014-04-17Method for manufacturing a dual work function semiconductor device
#9 | 2011-12-01Scalable interpoly dielectric stacks with improved immunity to program saturation
#10 | 2010-12-16Substrate treating method and method of manufacturing semiconductor device using the same
#11 | 2010-09-02METHOD FOR MANUFACTURING A DUAL WORK FUNCTION SEMICONDUCTOR DEVICE AND THE SEMICONDUCTOR DEVICE MADE THEREOF
#12 | 2009-07-02Scalable interpoly dielectric stacks with improved immunity to program saturation
#13 | 2009-02-26Method for Modulating the Effective Work Function
#14 | 2008-12-18Method for Controlled Formation of a Gate Dielectric Stack
#15 | 2008-10-30Method for fabricating a high-K dielectric layer
#16 | 2008-07-10ELECTRONIC DEVICE AND PROCESS FOR MANUFACTURING THE SAME
#17 | 2007-11-29Method for Modulating the Effective Work Function
#18 | 2007-09-20SEMICONDUCTOR DEVICES HAVING SILICIDED ELECTRODES
#19 | 2005-07-07Method for fabricating semiconductor devices having silicided electrodes
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