Eindhoven
Netherlands
83
2025-06-12
The entities that hold a legal rights for patent applications filed by inventor CRAMER Hugo Augustinus Joseph:
Hugo Augustinus Joseph CRAMER from Eindhoven, NL has applied for patents for these inventions. The list has both pending applications and granted patents:
METHOD FOR CORRECTING MEASUREMENTS IN THE MANUFACTURE OF INTEGRATED CIRCUITS AND ASSOCIATED APPARATUSES
#2 | 2025-05-08METROLOGY METHOD AND ASSOCIATED METROLOGY DEVICE
#3 | 2025-02-20SUBSTRATE COMPRISING A TARGET ARRANGEMENT, ASSOCIATED PATTERNING DEVICE AND METROLOGY METHOD
#4 | 2024-12-12METROLOGY APPARATUS AND METROLOGY METHODS BASED ON HIGH HARMONIC GENERATION FROM A DIFFRACTIVE STRUCTURE
#5 | 2024-10-17METROLOGY METHOD AND METROLOGY DEVICE
#6 | 2024-06-06Metrology Apparatus
#7 | 2024-05-16DIGITAL HOLOGRAPHIC MICROSCOPE AND ASSOCIATED METROLOGY METHOD
#8 | 2024-01-11Method and apparatus to determine a patterning process parameter
#9 | 2023-10-26DARK FIELD DIGITAL HOLOGRAPHIC MICROSCOPE AND ASSOCIATED METROLOGY METHOD
#10 | 2023-05-11METHOD OF DETERMINING A SAMPLING SCHEME, ASSOCIATED APPARATUS AND COMPUTER PROGRAM
#11 | 2023-03-02METROLOGY METHOD AND DEVICE FOR MEASURING A PERIODIC STRUCTURE ON A SUBSTRATE
#12 | 2023-02-09SEPARATION OF CONTRIBUTIONS TO METROLOGY DATA
#13 | 2022-11-03A METHOD FOR FILTERING AN IMAGE AND ASSOCIATED METROLOGY APPARATUS
#14 | 2022-10-13Method for process metrology
#15 | 2022-08-18Metrology targets
#16 | 2022-04-21Metrology apparatus
#17 | 2021-12-09Method and apparatus to determine a patterning process parameter
#18 | 2021-10-28Method and apparatus to determine a patterning process parameter
#19 | 2021-10-21Metrology apparatus and method for determining a characteristic of one or more structures on a substrate
#20 | 2021-09-30Method for process metrology
#21 | 2021-02-04Method and apparatus to determine a patterning process parameter
#22 | 2020-10-08Metrology method and apparatus with increased bandwidth
#23 | 2020-09-10Substrate, metrology apparatus and associated methods for a lithographic process
#24 | 2020-07-23PATTERNING DEVICE, MANUFACTURING METHOD FOR A PATTERNING DEVICE, SYSTEM FOR PATTERNING A RETICLE, CALIBRATION METHOD OF AN INSPECTION TOOL, AND LITHOGRAPHIC APPARATUS
#25 | 2020-06-18Method of measuring a parameter of a lithographic process, metrology apparatus
#26 | 2020-06-11Method and apparatus to determine a patterning process parameter
#27 | 2020-04-23Method and apparatus to determine a patterning process parameter
#28 | 2020-04-09Method of calibrating a plurality of metrology apparatuses, method of determining a parameter of interest, and metrology apparatus
#29 | 2020-03-05Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method
#30 | 2020-01-09Method and apparatus to determine a patterning process parameter
#31 | 2019-12-19Metrology apparatus
#32 | 2019-08-29Metrology apparatus and method for determining a characteristic of one or more structures on a substrate
#33 | 2019-08-22Metrology method and apparatus with increased bandwidth
#34 | 2019-08-15Method and apparatus for measuring a parameter of interest using image plane detection techniques
#35 | 2019-08-08Method of determining an optimal focus height for a metrology apparatus
#36 | 2019-05-30Metrology method and apparatus, computer program and lithographic system
#37 | 2019-03-21Separation of contributions to metrology data
#38 | 2019-03-07Beat patterns for alignment on small metrology targets
#39 | 2019-02-28Substrate, metrology apparatus and associated methods for a lithographic process
#40 | 2018-11-22Method of measuring a target, metrology apparatus, lithographic cell, and target
#41 | 2018-06-21Method for monitoring a characteristic of illumination from a metrology apparatus
#42 | 2018-05-10Method and apparatus for measuring a parameter of a lithographic process, computer program products for implementing such methods and apparatus
#43 | 2017-09-07Method and apparatus to determine a patterning process parameter using a unit cell having geometric symmetry
#44 | 2017-09-07Method and apparatus to determine a patterning process parameter, associated with a change in a physical configuration, using measured pixel optical characteristic values
#45 | 2017-09-07Method and apparatus to determine a patterning process parameter using an asymmetric optical characteristic distribution portion
#46 | 2017-09-07Method and apparatus to determine a patterning process parameter
#47 | 2017-09-07Method and apparatus to determine a patterning process parameter
#48 | 2017-06-22Process flagging and cluster detection without requiring reconstruction
#49 | 2017-06-08Statistical hierarchical reconstruction from metrology data
#50 | 2017-03-02Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method
#51 | 2017-01-12Method of determining edge placement error, inspection apparatus, patterning device, substrate and device manufacturing method
#52 | 2016-04-28Method of determining critical-dimension-related properties, inspection apparatus and device manufacturing method
#53 | 2016-01-28Method of determining dose, inspection apparatus, patterning device, substrate and device manufacturing method
#54 | 2015-10-15Method of determining dose and focus, inspection apparatus, patterning device, substrate and device manufacturing method
#55 | 2015-06-25Inspection method and apparatus, lithographic system and device manufacturing method
#56 | 2014-09-04Lithographic focus and dose measurement using a 2-D target
#57 | 2014-07-31Inspection apparatus, lithographic apparatus, lithographic processing cell and inspection method
#58 | 2014-05-22Methods and scatterometers, lithographic systems, and lithographic processing cells
#59 | 2012-05-17Method and apparatus for measuring a structure on a substrate, computer program products for implementing such methods and apparatus
#60 | 2012-02-23Inspection method for lithography
#61 | 2011-12-15Scatterometry method and measurement system for lithography
#62 | 2011-12-01Calibration method, inspection method and apparatus, lithographic apparatus, and lithographic processing cell
#63 | 2011-10-13Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
#64 | 2011-10-13Lithographic focus and dose measurement using a 2-D target
#65 | 2011-09-22Inspection Apparatus and Associated Method and Monitoring and Control System
#66 | 2011-04-14Method, inspection apparatus and substrate for determining an approximate structure of an object on a substrate
#67 | 2011-02-03Methods and scatterometers, lithographic systems, and lithographic processing cells
#68 | 2011-02-03Method of assessing a model of a substrate, an inspection apparatus and a lithographic apparatus
#69 | 2010-08-12Inspection apparatus, lithographic apparatus, lithographic processing cell and inspection method
#70 | 2009-05-28Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method for determining a parameter of a target pattern
#71 | 2009-04-09Method of optimizing a model, a method of measuring a property, a device manufacturing method, a spectrometer and a lithographic apparatus
#72 | 2008-12-02Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
#73 | 2008-11-13Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
#74 | 2008-10-02Method of forming a substrate for use in calibrating a metrology tool, calibration substrate and metrology tool calibration method
#75 | 2008-07-17Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
#76 | 2008-04-17Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
#77 | 2008-01-24Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
#78 | 2007-09-27Method to determine the value of process parameters based on scatterometry data
#79 | 2007-04-26Method of depositing a metal layer onto a substrate and a method for measuring in three dimensions the topographical features of a substrate
#80 | 2007-03-01Method of verifying consistent measurement between a plurality of CD metrology tools
#81 | 2006-09-26Device inspection method and apparatus using an asymmetric marker
#82 | 2005-08-25Method to determine the value of process parameters based on scatterometry data
#83 | 2005-06-23Lithographic apparatus and methods, patterning structure and method for making a patterning structure, device manufacturing method, and device manufactured thereby
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