Eindhoven
Netherlands
7
2015-07-23
The entities that hold a legal rights for patent applications filed by inventor Tenner Manfred Gawein:
Manfred Gawein Tenner from Eindhoven, NL has applied for patents for these inventions. The list has both pending applications and granted patents:
Deformation pattern recognition method, pattern transferring method, processing device monitoring method, and lithographic apparatus
#2 | 2014-07-10Alignment target contrast in a lithographic double patterning process
#3 | 2012-08-30METHOD OF CALCULATING MODEL PARAMETERS OF A SUBSTRATE, A LITHOGRAPHIC APPARATUS AND AN APPARATUS FOR CONTROLLING LITHOGRAPHIC PROCESSING BY A LITHOGRAPHIC APPARATUS
#4 | 2011-03-31Method and system for increasing alignment target contrast
#5 | 2010-12-02Improving alignment target contrast in a lithographic double patterning process
#6 | 2009-08-06Alignment mark and a method of aligning a substrate comprising such an alignment mark
#7 | 2009-03-19Method of measuring the overlay error, an inspection apparatus and a lithographic apparatus
830701 ⎘