Christopher K. Ober

POLYMER NANOSTRUCTURES, METHODS OF MAKING SAME, AND USES THEREOF

PATTERN-FORMING METHOD AND RADIATION-SENSITIVE COMPOSITION

RADIATION-SENSITIVE COMPOSITION, PATTERN-FORMING METHOD AND COMPOUND

RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHOD

RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHOD

Radiation-sensitive composition and pattern-forming method

Metal etchant compositions and methods of fabricating a semiconductor device using the same

Orthogonal processing of organic materials used in electronic and electrical devices

METAL ETCHANT COMPOSITIONS AND METHODS OF FABRICATING A SEMICONDUCTOR DEVICE USING THE SAME

METAL OXIDE NANOPARTICLES AND PHOTORESIST COMPOSITIONS

Orthogonal processing of organic materials used in electronic and electrical devices

Block copolymers and lithographic patterning using same

Methods of making patterned structures of materials, patterned structures of materials, and methods of using same

COATINGS TO PREVENT BIOFOULING OF SURFACES

Polymers and polymer coatings

Orthogonal processing of organic materials used in electronic and electrical devices

Non-aggregating nanoparticles and the use thereof

Photoacid generator compounds and compositions

POLYMERS CONTAINING QUATERNIZED NITROGEN

Photoacid generator compounds and compositions

Triblock polymers and polymer coatings

Photoacid generator compounds and compositions

Adamantane Based Molecular Glass Photoresists for Sub-200 Nm Lithography

ENVIRONMENTAL FRIENDLY PHOTOACID GENERATORS (PAGs) WITH NO PERFLUOROOCTYL SULFONATES

Molecular glass photoresists

Photosensitive resin composition having a high refractive index

Organoelement resists for EUV lithography and methods of making the same

Polymers containing quaternized nitrogen

Polymers and polymer coatings

Polymers with ether containing side chains and compositions thereof

Environmentally friendly photoacid generators (PAGs) with no perfluorooctyl sulfonates (PFOS)