Dresden
Germany
12
2019-11-28
The entities that hold a legal rights for patent applications filed by inventor Habets Boris:
Boris Habets from Dresden, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
Method and apparatus for simulation of lithography overlay
#2 | 2019-08-15Process control method for lithographically processed semiconductor devices
#3 | 2019-08-08Method and apparatus for fabricating wafer by calculating process correction parameters
#4 | 2018-11-29Method for processing of a further layer on a semiconductor wafer
#5 | 2017-08-24Method of manufacturing semiconductor devices by using sampling plans
#6 | 2017-08-03Method and apparatus of evaluating a semiconductor manufacturing process
#7 | 2017-02-23Method for assessing the usability of an exposed and developed semiconductor wafer
#8 | 2015-01-15Method and apparatus for simulation of lithography overlay
#9 | 2014-07-31Method and apparatus for fabricating wafer by calculating process correction parameters
#10 | 2010-02-04Alignment calculation
#11 | 2009-10-01Systems and methods of alternative overlay calculation
#12 | 2008-07-31Method and system for determining deformations on a substrate
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