Inventor profile of:

Hiroshi Yasuda

City:

Tokyo

Country:

Japan

Published Applications:

14

Last publication date:

2024-11-14

Top Assignees for applications by Hiroshi Yasuda

The entities that hold a legal rights for patent applications filed by inventor Yasuda Hiroshi:

Recent patent applications by Yasuda Hiroshi

Hiroshi Yasuda from Tokyo, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2024-11-14
US20240376300A1
Chemistry; metallurgy

RESIN COMPOSITION, MOLDED OBJECT, MULTILAYERED OBJECT, METHOD FOR PRODUCING POLY(ARYLENE ETHER), AND POLY(ARYLENE ETHER)

#2 | 2022-02-17
US20220051866A1
Electricity

Electron gun device

#3 | 2014-08-21
US20140231668A1
Electricity

Electron beam lithography device and lithographic method

#4 | 2011-09-22
US20110226967A1
Electricity

Electron beam lithography apparatus and electron beam lithography method

#5 | 2011-06-23
US20110148297A1
Electricity

Multi-column electron beam exposure apparatus and magnetic field generation device

#6 | 2010-01-28
US20100019648A1
Electricity

Electron gun minimizing sublimation of electron source and electron beam exposure apparatus using the same

#7 | 2010-01-28
US20100019172A1
Performing operations; transporting

Multi-column electron beam exposure apparatus and multi-column electron beam exposure method

#8 | 2008-12-25
US20080315089A1
Electricity

Electron gun, electron beam exposure apparatus, and exposure method

#9 | 2008-09-04
US20080211376A1
Electricity

Electron gun, electron beam exposure apparatus, and exposure method

#10 | 2008-07-17
US20080169433A1
Electricity

Electron beam exposure apparatus and method for cleaning the same

#11 | 2007-08-09
US20070181829A1
Electricity

Electron-beam exposure system

#12 | 2006-06-01
US20060115745A1
Electricity

Electron beam exposure mask, electron beam exposure method, and electron beam exposure system

#13 | 2006-04-13
US20060076491A1
Performing operations; transporting

Mask inspection apparatus, mask inspection method, and electron beam exposure system

#14 | 2005-06-07
US10424888
-

Electron beam exposure apparatus, electron beam method, semiconductor device manufacturing method, mask, and mask manufacturing method

InventorID:

876355 ⎘