Inventor profile of:

Walter Franken

City:

Eschweiler

Country:

Germany

Published Applications:

13

Last publication date:

2017-11-02

Top Assignees for applications by Walter Franken

The entities that hold a legal rights for patent applications filed by inventor Franken Walter:

Recent patent applications by Franken Walter

Walter Franken from Eschweiler, DE has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2017-11-02
US20170314134A1
Chemistry; metallurgy

CVD or PVD reactor for coating large-area substrates

#2 | 2016-03-17
US20160079104A1
Electricity

Transport module for a semiconductor fabrication device or coupling device

#3 | 2013-02-14
US20130040054A1
Chemistry; metallurgy

COATING DEVICE AND METHOD FOR OPERATING A COATING DEVICE HAVING A SHIELDING PLATE

#4 | 2011-07-21
US20110174217A1
Chemistry; metallurgy

Shadow mask held magnetically on a substrate support

#5 | 2010-07-08
US20100170435A1
Chemistry; metallurgy

Device for the temperature control of the surface temperatures of substrates in a CVD reactor

#6 | 2009-07-23
US20090183682A1
Chemistry; metallurgy

SOURCE CONTAINER OF A VPE REACTOR

#7 | 2009-04-30
US20090110805A1
Chemistry; metallurgy

Apparatus and Method for Controlling the Surface Temperature of a Substrate in a Process Chamber

#8 | 2008-10-16
US20080251020A1
Chemistry; metallurgy

Cvd-Reactor with Slidingly Mounted Susceptor Holder

#9 | 2007-04-05
US20070074661A1
Chemistry; metallurgy

CVD reactor with stabilized process chamber height

#10 | 2006-06-15
US20060124055A1
Electricity

Mask-retaining device

#11 | 2006-06-06
US10269157
-

Reaction chamber with at least one HF feedthrough

#12 | 2005-05-05
US20050092246A1
Chemistry; metallurgy

Device for depositing thin layers with a wireless detection of process parameters

#13 | 2005-01-06
US20050000441A1
Chemistry; metallurgy

Process and device for depositing in particular crystalline layers on in particular crystalline substrates

InventorID:

89573 ⎘