Fairfield, Connecticut
United States
11
2017-10-26
The entities that hold a legal rights for patent applications filed by inventor Schuster Mark Josef:
Mark Josef Schuster from Fairfield, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Patterning device support, lithographic apparatus, and method of controlling patterning device temperature
#2 | 2017-06-08Patterning device support, lithographic apparatus, and method of controlling patterning device temperature
#3 | 2017-03-09Lithographic apparatus
#4 | 2015-12-10Gas flow optimization in reticle stage environment
#5 | 2015-10-22Patterning device support, lithographic apparatus, and method of controlling patterning device temperature
#6 | 2015-10-01Patterning device manipulating system and lithographic apparatuses
#7 | 2015-10-01Patterning device support and lithographic apparatus
#8 | 2015-08-27Reticle cooling system in a lithographic apparatus
#9 | 2015-08-06Real-time reticle curvature sensing
#10 | 2015-06-18Lithographic apparatus
#11 | 2014-10-16Determining position and curvature information directly from a surface of a patterning device
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