Zichron Ya'akov
Israel
31
2024-08-01
The entities that hold a legal rights for patent applications filed by inventor Adel Michael E.:
Michael E. Adel from Zichron Ya'akov, IL has applied for patents for these inventions. The list has both pending applications and granted patents:
Method of Dispositioning and Control of a Semiconductor Manufacturing Process
#2 | 2019-02-14Determining the impacts of stochastic behavior on overlay metrology data
#3 | 2018-06-07Process compatibility improvement by fill factor modulation
#4 | 2018-01-25Analyzing root causes of process variation in scatterometry metrology
#5 | 2015-10-22On-product derivation and adjustment of exposure parameters in a directed self-assembly process
#6 | 2014-10-23On-device metrology
#7 | 2013-03-05Enhanced OVL dummy field enabling “on-the-fly” OVL measurement methods
#8 | 2011-03-03Substrate matrix to decouple tool and process effects
#9 | 2010-03-02Cross hatched metrology marks and associated method of use
#10 | 2010-01-07Apparatus and methods for determining overlay and uses of same
#11 | 2009-12-10Enhanced OVL dummy field enabling “on-the-fly” OVL measurement methods
#12 | 2009-11-19Apparatus and methods for detecting overlay errors using scatterometry
#13 | 2009-10-27Apparatus and methods for determining overlay and uses of same
#14 | 2009-07-28Feature printability optimization by optical tool
#15 | 2009-07-07Apparatus and methods for optically monitoring the fidelity of patterns produced by photolitographic tools
#16 | 2008-06-10Apparatus and methods for detecting overlay errors using scatterometry
#17 | 2008-05-27Apparatus and methods for detecting overlay errors using scatterometry
#18 | 2008-03-27Method and system for optimizing alignment performance in a fleet of exposure tools
#19 | 2008-03-18Apparatus and methods for providing in-chip microtargets for metrology or inspection
#20 | 2008-02-28Apparatus and methods for detecting overlay errors using scatterometry
#21 | 2008-01-31Apparatus and methods for detecting overlay errors using scatterometry
#22 | 2007-12-06Order selected overlay metrology
#23 | 2007-11-27Apparatus and methods for detecting overlay errors using scatterometry
#24 | 2007-11-20Apparatus and methods for detecting overlay errors using scatterometry
#25 | 2007-10-30Apparatus and methods for detecting overlay errors using scatterometry
#26 | 2007-10-09Apparatus and methods for detecting overlay errors using scatterometry
#27 | 2007-07-10Apparatus and methods for detecting overlay errors using scatterometry
#28 | 2007-05-03Methods and apparatus for designing and using micro-targets in overlay metrology
#29 | 2006-09-07Target acquisition and overlay metrology based on two diffracted orders imaging
#30 | 2006-05-18System method and structure for determining focus accuracy
#31 | 2005-09-08Continuously varying offset mark and methods of determining overlay
946903 ⎘