Aalen
Germany
43
2021-06-17
The entities that hold a legal rights for patent applications filed by inventor Geuppert Bernhard:
Bernhard Geuppert from Aalen, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
Supporting an optical element
#2 | 2019-10-10Lithography system and method
#3 | 2019-07-18Projection exposure apparatus, and method for reducing deformations, resulting from dynamic accelerations, of components of the projection exposure apparatus
#4 | 2019-05-02PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY WITH A MEASUREMENT DEVICE
#5 | 2019-03-28Optical imaging arrangement with a piezoelectric device
#6 | 2018-09-27Optical imaging arrangement with actively adjustable metrology support units
#7 | 2018-09-13Optical Projection System
#8 | 2018-01-25Projection exposure system for microlithography with a measurement device
#9 | 2017-08-03Optical projection system
#10 | 2017-03-23Microlithographic projection exposure apparatus and measuring device for a projection lens
#11 | 2016-01-07Lithographic apparatus and device manufacturing method
#12 | 2015-11-12Optical projection system
#13 | 2015-07-30Projection exposure system for microlithography with a measurement device
#14 | 2015-06-18LITHOGRAPHY APPARATUS WITH RESTRICTED MOVEMENT RELATIVE TO FLOOR AND RELATED METHOD
#15 | 2014-12-11Method for replacing objective parts
#16 | 2014-02-13Arrangement for actuating an element in a microlithographic projection exposure apparatus
#17 | 2014-01-23LITHOGRAPHY APPARATUS AND METHOD
#18 | 2013-11-28Arrangement for mounting an optical element, in particular in an EUV projection exposure apparatus
#19 | 2013-10-24Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations
#20 | 2013-05-16Exposure apparatus and measuring device for a projection lens
#21 | 2013-02-21Optical projection system
#22 | 2012-12-20Projection exposure apparatus with multiple sets of piezoelectric elements moveable in different directions and related method
#23 | 2012-08-02Optical element
#24 | 2012-06-21Lithographic apparatus and device manufacturing method
#25 | 2011-01-20Projection exposure system for microlithography with a measurement device
#26 | 2010-06-10Exposure apparatus and measuring device for a projection lens
#27 | 2009-10-22METHOD AND DEVICE FOR REPLACING OBJECTIVE PARTS
#28 | 2009-10-01Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations
#29 | 2009-09-10Projection exposure apparatus and optical system
#30 | 2009-07-09Optical apparatus and method for modifying the imaging behavior of such apparatus
#31 | 2008-12-18MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND MEASURING DEVICE FOR A PROJECTION LENS
#32 | 2008-11-20Vibration damping for photolithographic lens mount
#33 | 2008-11-13Optical Element
#34 | 2008-08-28Optical module with minimized overrun of the optical element
#35 | 2008-08-12Focusing-device for the radiation from a light source
#36 | 2008-02-21Collector with fastening devices for fastening mirror shells
#37 | 2007-08-02Lithographic apparatus, device manufacturing method and exchangeable optical element
#38 | 2007-07-19Structure for use in a projection exposure system for manufacturing semiconductors
#39 | 2007-03-29MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND MEASURING DEVICE FOR A PROJECTION LENS
#40 | 2006-12-28Collector with fastening devices for fastening mirror shells
#41 | 2006-08-15Collector with fastening devices for fastening mirror shells
#42 | 2006-06-15Device for receiving an optical module in an imaging unit
#43 | 2005-10-13Method of manufacturing an optical component
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