Nesher
Israel
36
2026-06-18
The entities that hold a legal rights for patent applications filed by inventor Negri Daria:
Daria Negri from Nesher, IL has applied for patents for these inventions. The list has both pending applications and granted patents:
MULTIWAVELENGTH MEASUREMENTS FOR SCANNING OVERLAY METROLOGY
#2 | 2026-03-05SYSTEMS AND METHODS FOR DUAL-CONJUGATE IMAGING FOR OVERLAY METROLOGY
#3 | 2026-01-01SCANNING DIFFRACTION-BASED OVERLAY SCATTEROMETRY
#4 | 2025-10-02SINGLE GRAB PUPIL LANDSCAPE VIA OUTSIDE THE OBJECTIVE LENS BROADBAND ILLUMINATION
#5 | 2025-09-25SCANNING DIFFRACTION BASED OVERLAY SCATTEROMETRY
#6 | 2025-08-14METROLOGY MEASUREMENTS ON SMALL TARGETS WITH CONTROL OF ZERO-ORDER SIDE LOBES
#7 | 2025-05-01MASSIVE MEASUREMENT SAMPLING USING MULTIPLE CHUCKS AND OPTICAL COLUMNS
#8 | 2024-10-10SYSTEM AND METHOD FOR TRACKING REAL-TIME POSITION FOR SCANNING OVERLAY METROLOGY
#9 | 2024-10-10SYSTEM AND METHOD FOR DETERMINING OVERLAY MEASUREMENT OF A SCANNING TARGET
#10 | 2024-10-10PARALLEL SCANNING OVERLAY METROLOGY WITH OPTICAL META-SURFACES
#11 | 2024-10-03IMAGING OVERLAY WITH MUTUALLY COHERENT OBLIQUE ILLUMINATION
#12 | 2024-05-23SYSTEM AND METHOD FOR SUPPRESSION OF TOOL INDUCED SHIFT IN SCANNING OVERLAY METROLOGY
#13 | 2024-04-11Targets for diffraction-based overlay error metrology
#14 | 2024-02-29MULTI-PITCH GRID OVERLAY TARGET FOR SCANNING OVERLAY METROLOGY
#15 | 2024-02-15Scatterometry overlay metrology with orthogonal fine-pitch segmentation
#16 | 2023-12-26Systems and methods for metrology with layer-specific illumination spectra
#17 | 2023-12-14Enhancing performance of overlay metrology
#18 | 2023-08-17Imaging overlay with mutually coherent oblique illumination
#19 | 2023-07-06Scanning overlay metrology using overlay targets having multiple spatial frequencies
#20 | 2023-06-22Systems and methods for correction of impact of wafer tilt on misregistration measurements
#21 | 2022-09-29Systems and methods for measurement of misregistration and amelioration thereof
#22 | 2022-06-02Method of measuring misregistration in the manufacture of topographic semiconductor device wafers
#23 | 2022-01-20Wavelet system and method for ameliorating misregistration and asymmetry of semiconductor devices
#24 | 2021-07-01Method of measuring misregistration in the manufacture of topographic semiconductor device wafers
#25 | 2021-06-24System and method for measuring misregistration of semiconductor device wafers utilizing induced topography
#26 | 2019-04-11Nano-structured non-polarizing beamsplitter
#27 | 2018-10-11Systems and methods for metrology with layer-specific illumination spectra
#28 | 2016-10-20Spectral control system
#29 | 2016-03-24Metrology imaging targets having reflection-symmetric pairs of reflection-asymmetric structures
#30 | 2015-02-05Metrology systems and methods
#31 | 2014-06-19Spectral control system
#32 | 2014-04-24Phase characterization of targets
#33 | 2013-09-05Metrology systems and methods
#34 | 2013-02-21Overlay metrology by pupil phase analysis
#35 | 2012-02-09Optics symmetrization for metrology
#36 | 2011-03-24Metrology systems and methods
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