Moshe E. Preil

Stochastic reticle defect dispositioning

Stochastically-aware metrology and fabrication

Multi-column spacing for photomask and reticle inspection and wafer print check verification

METHODS AND CONTROLLERS FOR CONTROLLING FOCUS OF ULTRAVIOLET LIGHT FROM A LITHOGRAPHIC IMAGING SYSTEM, AND APPARATUSES FOR FORMING AN INTEGRATED CIRCUIT EMPLOYING THE SAME

Sidewall image templates for directed self-assembly materials

Methods for improved monitor and control of lithography processes

Chemical and physical templates for forming patterns using directed self-assembly materials

Optimizing lithographic processes using laser annealing techniques

Asymmetric templates for forming non-periodic patterns using directed self-assembly materials

Photo-mask and wafer image reconstruction

Process window signature patterns for lithography process control

Process window signature patterns for lithography process control

Photo-mask and wafer image reconstruction

Photo-mask and wafer image reconstruction

Photo-mask and wafer image reconstruction

Photo-mask and wafer image reconstruction

Photo-mask and wafer image reconstruction

Photo-mask and wafer image reconstruction

Photo-Mask and Wafer Image Reconstruction

Method for identifying and using process window signature patterns for lithography process control

Methods and systems for detecting defects in a reticle design pattern

System and method for measuring and analyzing lithographic parameters and determining optimal process corrections

Method for detecting, sampling, analyzing, and correcting marginal patterns in integrated circuit manufacturing

Computer-implemented methods for detecting defects in reticle design data

Methods, systems, and carrier media for evaluating reticle layout data

Method and application of metrology and process diagnostic information for improved overlay control