Assignee profile:

NOVA MEASURING INSTRUMENTS INC.

City:

Fremont, California

Country:

United States

Published Applications:

20

Last publication date:

2026-04-09

Patent Grants:

13

Last grant date:

2025-04-22

Top Inventors for applications by NOVA MEASURING INSTRUMENTS INC.

These are the the leading inventors for applications assigned to NOVA MEASURING INSTRUMENTS INC.:

Recent patent applications by NOVA MEASURING INSTRUMENTS INC.

NOVA MEASURING INSTRUMENTS INC. based in Fremont, US has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:

#1 | 2026-04-09
US20260098824A1
Physics

A HIGH BRIGHTNESS PRIMARY X-RAY SOURCE FOR IN-LINE XPS AND XRF METROLOGY

#2 | 2026-03-19
US20260079122A1
Physics

SYSTEM AND METHOD FOR MEASURING A SAMPLE BY X-RAY REFLECTANCE SCATTEROMETRY

#3 | 2026-01-29
US20260029359A1
Physics

ADAPTIVE COUNT RATE MODULATION TO INCREASE DEPTH PROFILE DYNAMIC RANGE IN SECONDARY ION MASS SPECTROSCOPY

#4 | 2025-10-09
US20250314487A1
Physics

CHARACTERIZING AND MEASURING IN SMALL BOXES USING XPS WITH MULTIPLE MEASUREMENTS

#5 | 2025-02-27
US20250067691A1
Physics

PRODUCTION SOLUTIONS FOR HIGH-THROUGHPUT/PRECISION XPS METROLOGY USING UNSUPERVISED MACHINE LEARNING

#6 | 2025-02-13
US20250052704A1
Physics

METHOD AND SYSTEM FOR NON-DESTRUCTIVE METROLOGY OF THIN LAYERS

#7 | 2025-01-02
US20250006451A1
Electricity

PATTERNED X-RAY EMITTING TARGET

#8 | 2024-12-05 ✅ Patent 12,281,893 granted on 2025-04-22
US20240401940A1
Physics

Characterizing and measuring in small boxes using XPS with multiple measurements

#9 | 2024-10-17 ✅ Patent 12,360,063 granted on 2025-07-15
US20240345006A1
Physics

SYSTEM AND METHOD FOR MEASURING A SAMPLE BY X-RAY REFLECTANCE SCATTEROMETRY

#10 | 2024-03-14 ✅ Patent 12,165,863 granted on 2024-12-10
US20240087869A1
Electricity

Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometry

#11 | 2024-02-08 ✅ Patent 12,158,437 granted on 2024-12-03
US20240044825A1
Physics

XPS metrology for process control in selective deposition

#12 | 2023-12-21 ✅ Patent 12,066,391 granted on 2024-08-20
US20230408430A1
Physics

Method and system for non-destructive metrology of thin layers

#13 | 2023-09-14 ✅ Patent 11,988,502 granted on 2024-05-21
US20230288196A1
Physics

Characterizing and measuring in small boxes using XPS with multiple measurements

#14 | 2022-12-08 ✅ Patent 11,996,259 granted on 2024-05-28
US20220390395A1
Physics

Patterned x-ray emitting target

#15 | 2022-07-14 ✅ Patent 11,823,883 granted on 2023-11-21
US20220223395A1
Electricity

Mass spectrometer detector and system and method using the same

#16 | 2022-05-19 ✅ Patent 11,852,467 granted on 2023-12-26
US20220155064A1
Physics

Method and system for monitoring deposition process

#17 | 2021-12-02 ✅ Patent 11,733,035 granted on 2023-08-22
US20210372787A1
Physics

Feed-forward of multi-layer and multi-process information using XPS and XRF technologies

#18 | 2021-06-03 ✅ Patent 11,874,237 granted on 2024-01-16
US20210164924A1
Physics

System and method for measuring a sample by x-ray reflectance scatterometry

#19 | 2021-01-28 ✅ Patent 11,346,795 granted on 2022-05-31
US20210025839A1
Physics

XPS metrology for process control in selective deposition

#20 | 2020-06-18 ✅ Patent 11,668,663 granted on 2023-06-06
US20200191734A1
Physics

Method and system for non-destructive metrology of thin layers

Also check out NOVA MEASURING INSTRUMENTS, INC.'s (Fremont, United States) applicant profile with 10 patent applications submitted.

AssigneeID:

350899 ⎘