Assignee profile:

SHANGHAI MICRO ELECTRONICS EQUIPMENT CO., LTD.

City:

Shanghai

Country:

China

Published Applications:

28

Last publication date:

2017-11-30

Patent Grants:

26

Last grant date:

2020-05-19

Top Inventors for applications by SHANGHAI MICRO ELECTRONICS EQUIPMENT CO., LTD.

These are the the leading inventors for applications assigned to SHANGHAI MICRO ELECTRONICS EQUIPMENT CO., LTD.:

Recent patent applications by SHANGHAI MICRO ELECTRONICS EQUIPMENT CO., LTD.

SHANGHAI MICRO ELECTRONICS EQUIPMENT CO., LTD. based in Shanghai, CN has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:

#1 | 2017-11-30 ✅ Patent 10,658,214 granted on 2020-05-19
US20170345696A1
Electricity

Wafer processing device and method therefor

#2 | 2017-08-03 ✅ Patent 10,197,923 granted on 2019-02-05
US20170219935A1
Physics

Exposure device and out-of-focus and tilt error compensation method

#3 | 2017-01-19 ✅ Patent 9,760,022 granted on 2017-09-12
US20170017168A1
Physics

Lithography machine workpiece table and vertical position initialization method thereof

#4 | 2016-05-26 ✅ Patent 9,760,025 granted on 2017-09-12
US20160147163A1
Physics

Reticle shape regulation device and method, and exposure apparatus using same

#5 | 2015-12-24 ✅ Patent 9,752,643 granted on 2017-09-05
US20150369331A1
Mechanical engineering

Negative stiffness system for gravity compensation of micropositioner

#6 | 2015-12-10
US20150357217A1
Electricity

WARPED SILICON-CHIP ADSORPTION DEVICE AND ADSORPTION METHOD THEREOF

#7 | 2015-11-26 ✅ Patent 9,893,596 granted on 2018-02-13
US20150340931A1
Electricity

Magnetic alignment system and alignment method therefor

#8 | 2015-10-08 ✅ Patent 9,588,444 granted on 2017-03-07
US20150286154A1
Physics

Balance mass system shared by workpiece table and mask table, and lithography machine

#9 | 2015-09-17 ✅ Patent 9,448,488 granted on 2016-09-20
US20150261098A1
Physics

Off-axis alignment system and alignment method

#10 | 2015-09-03 ✅ Patent 9,933,703 granted on 2018-04-03
US20150248063A1
Physics

Photolithographic illuminator device enabling controlled diffraction

#11 | 2015-08-20 ✅ Patent 9,874,818 granted on 2018-01-23
US20150234288A1
Physics

Photolithographic illuminator that is telecentric in two directions

#12 | 2015-04-09 ✅ Patent 9,310,782 granted on 2016-04-12
US20150097508A1
Physics

Method for measuring displacement of planar motor rotor

#13 | 2015-02-05 ✅ Patent 9,455,164 granted on 2016-09-27
US20150037984A1
Electricity

Laser annealing apparatus and laser annealing method

#14 | 2015-01-08 ✅ Patent 9,766,054 granted on 2017-09-19
US20150012242A1
Physics

Planar motor rotor displacement measuring device and its measuring method

#15 | 2014-06-26 ✅ Patent 9,195,146 granted on 2015-11-24
US20140176925A1
Physics

Interference exposure device and method

#16 | 2014-06-12 ✅ Patent 9,036,154 granted on 2015-05-19
US20140160489A1
Physics

Four-axis four-subdividing interferometer

#17 | 2014-05-08 ✅ Patent 9,036,155 granted on 2015-05-19
US20140125989A1
Physics

Six-axis four-subdividing interferometer

#18 | 2014-03-13 ✅ Patent 9,519,231 granted on 2016-12-13
US20140074428A1
Physics

Method for measuring and calibrating centroid of coarse stage of photolithography tool

#19 | 2014-01-16 ✅ Patent 8,920,031 granted on 2014-12-30
US20140016886A1
Mechanical engineering

Split type aerostatic bearing

#20 | 2013-12-19 ✅ Patent 9,256,138 granted on 2016-02-09
US20130335718A1
Physics

Method for measuring distortion of projection objective

#21 | 2013-11-07
US20130293859A1
Physics

LARGE FIELD PROJECTION OBJECTIVE FOR LITHOGRAPHY

#22 | 2013-10-17 ✅ Patent 9,188,434 granted on 2015-11-17
US20130271750A1
Physics

Backside alignment apparatus and method

#23 | 2013-09-26 ✅ Patent 8,970,964 granted on 2015-03-03
US20130250434A1
Physics

Projection objective lens system

#24 | 2010-07-15 ✅ Patent 8,035,801 granted on 2011-10-11
US20100177294A1
Physics

Method for in-situ aberration measurement of optical imaging system in lithographic tools

#25 | 2010-02-25 ✅ Patent 8,134,689 granted on 2012-03-13
US20100045961A1
Physics

Dual stage positioning and switching system

#26 | 2009-11-05 ✅ Patent 8,130,365 granted on 2012-03-06
US20090273765A1
Physics

Immersion flow field maintenance system for an immersion lithography machine

#27 | 2009-09-03 ✅ Patent 8,027,028 granted on 2011-09-27
US20090219503A1
Physics

Precise positioning system for dual stage switching exposure

#28 | 2009-07-23 ✅ Patent 7,746,571 granted on 2010-06-29
US20090185290A1
Physics

Large-field unit-magnification projection optical system

Also check out Shanghai Micro Electronics Equipment Co., Ltd.'s (Shanghai, China) applicant profile with 21 patent applications submitted.

AssigneeID:

40255 ⎘