83987 ⎘
Manufacture or treatment of devices or systems in or on a substrate; Shaping materials, i.e. techniques for structuring the substrate or the layers on the substrate; Achieving a desired geometry, i.e. controlling etch rates, anisotropy or selectivity; Avoid or control over-etching Avoid or control under-cutting
METHOD OF FABRICATING MICRO-ELECTRO-MECHANICAL SYSTEM (MEMS) DEVICE
#2DOUBLE NOTCH ETCH TO REDUCE UNDER CUT OF MICRO ELECTRO-MECHANICAL SYSTEM (MEMS) DEVICES
#3MICRO-ELECTRO-MECHANICAL SYSTEM (MEMS) DEVICES AND FABRICATION METHODS THEREOF
#4METHOD FOR PRODUCING A BONDING PAD FOR A MICROMECHANICAL SENSOR ELEMENT
#5Method of manufacturing a microelectromechanical systems (MEMS) device
#6Sidewall stopper for MEMS device
#7Sidewall stopper for MEMS device
#8MEMS ISOLATION STRUCTURES
#9MEMS isolation structures
#10Field emission devices and methods of making thereof
#11MEMS structure and method of fabricating the same
#12Method of manufacturing high aspect ratio structure and method of manufacturing ultrasonic probe
#13MEMS isolation structures
#14Method of making a semiconductor device package with dummy gate
#15MEMS microphone structure and method of manufacturing the same
#16Vacuum-cavity-insulated flow sensors
#17Micro-electro-mechanical-system device with guard ring and method for making same
#18Material quality, suspended material structures on lattice-mismatched substrates
#19Inertial sensor and method of manufacturing the same
#20Method of making a semiconductor device package
#21Vacuum cavity-insulated flow sensors
#22Electrical routing
#23Field emission devices and methods of making thereof
#24Method for producing MEMS structures, and MEMS structure
#25Electrical routing
#26Guard trench
#27MEMS isolation structures
#28Wafer level packaging of micro-electro-mechanical systems (MEMS) and complementary metal-oxide-semiconductor (CMOS) substrates
#29Microstructure with an enhanced anchor
#30Microstructure device with an improved anchor
#31Etching technique for creation of thermally-isolated microstructures
#32Inertial sensor and method of manufacturing the same
#33Method of forming an undercut microstructure
#34Wet metal-etching method and apparatus for MEMS device fabrication
#35Micro-electro-mechanical-system device with guard ring and method for making same
#36Method of Manufacturing a Semiconductor Microstructure
#37SYSTEM AND METHOD FOR OBTAINING ANISOTROPIC ETCHING OF PATTERNED SUBSTRATES
#38Etching technique for creation of thermally-isolated microstructures
#39High aspect ratio via etch
#40METHOD OF DEEP ETCHING
#41MEMS structure and method of fabricating the same
#42Methods for minimizing mask undercuts and notches for plasma processing system
#43Silicon substrate comprising positive etching profiles with a defined slope angle, and production method
#44Method of manufacturing a wiring board
#45Layer system comprising a silicon layer and a passivation layer, method for production a passivation layer on a silicon layer and the use of said system and method
#46Method for structuring of silicon substrates for microsystem technological device elements and associated silicon substrate
#47Layer and system with a silicon layer and a passivation layer, method for production of a passivation layer on a silicon layer and use thereof
#48Method of double-sided etching
#49Corner compensation method for fabricating MEMS and structure thereof