ClassID:

84077

B81C2201/0121 - CPC Classification

Classification description:

Manufacture or treatment of microstructural devices or systems in or on a substrate; Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning; Processes for the planarization of structures involving addition of material followed by removal of parts of said material, i.e. subtractive planarization

Recent Application in this class:
#1
20260035236
2026-02-05

MEMS SENSOR ARRANGEMENT AND METHOD FOR MANUFACTURING A MEMS SENSOR ARRANGEMENT

#2
20250187901
2025-06-12

MICRO-ELECTRO-MECHANICAL SYSTEMS (MEMS) HAVING VERTICAL STOPS AND ANCHOR STRUCTURES

#3
20250109014
2025-04-03

Method For Manufacturing Vibration Device

#4
20240400375
2024-12-05

STRAIN SENSOR SWITCH FOR TIMING BASED SENSING

#5
20210354983
2021-11-18

Method for manufacturing semiconductor structure and planarization process thereof

#6
20200180949
2020-06-11

Process for forming inkjet nozzle devices

#7
20190263657
2019-08-29

Process for filling etched holes using first and second polymers

#8
20180330961
2018-11-15

Method for forming a planarization structure

#9
20180201503
2018-07-19

Micro-electro-mechanical system (MEMS) structures and design structures

#10
20180201502
2018-07-19

Micro-electro-mechanical system (MEMS) structures and design structures

#11
20180179052
2018-06-28

Micro-electro-mechanical system (MEMS) structures and design structures

#12
20170349431
2017-12-07

Process for filling etched holes using photoimageable thermoplastic polymer

#13
20170271171
2017-09-21

Method of processing surface of polysilicon and method of processing surface of substrate assembly

#14
20170140921
2017-05-18

Method of reverse tone patterning

#15
20160264410
2016-09-15

Micro-electro-mechanical system (MEMS) structures and design structures

#16
20160264406
2016-09-15

Micro-electro-mechanical system (MEMS) structures and design structures

#17
20160264405
2016-09-15

Micro-Electro-Mechanical System (MEMS) structures and design structures

#18
20160236930
2016-08-18

Process for filling etched holes

#19
20150368090
2015-12-24

Micro-electro-mechanical system (MEMS) structures and design structures

#20
20150253283
2015-09-10

Semiconductor arrangement and formation thereof

#21
20150175845
2015-06-25

Process for the manufacture of semiconductor devices comprising the chemical mechanical polishing (CMP) of III-V material in the presence of a CMP composition comprising a specific non-ionic surfactant

#22
20140308771
2014-10-16

Method for forming micro-electro-mechanical system (MEMS) beam structure

#23
20120295371
2012-11-22

Process for reconditioning semiconductor surface to facilitate bonding

#24
20090215213
2009-08-27

Microelectromechanical device having a common ground plane and method for making aspects thereof

#25
20060166463
2006-07-27

Method of producing a device with a movable portion

#26
20060125031
2006-06-15

Microelectromechanical device having a common ground plane layer and a set of contact teeth and method for making aspects thereof

#27
20050184836
2005-08-25

Method of fabricating semiconductor devices employing at least one modulation doped quantum well structure and one or more etch stop layers for accurate contact formation

#28
20050183938
2005-08-25

Head electrode region for a reliable metal-to-metal contact micro-relay MEMS switch

#29
20050032379
2005-02-10

Method for registering a deposited material with channel plate channels