ClassID:

84111

B81C2201/0169 - CPC Classification

Classification description:

Manufacture or treatment of microstructural devices or systems in or on a substrate; Controlling physical properties of the material; Controlling internal stress of deposited layers by post-annealing

Recent Application in this class:
#1
20260097953
2026-04-09

Forming a Bonded Interface Using Plasma-Activated Surfaces

#2
20230348258
2023-11-02

MEMS STRUCTURE INCLUDING A BURIED CAVITY WITH ANTISTICTION PROTUBERANCES, AND MANUFACTURING METHODS THEREOF

#3
20210300752
2021-09-30

Method for Fabricating a Microfluidic Device

#4
20210147220
2021-05-20

STICTION-AIDED FABRICATION OF FLAT NANOMEMBRANES FOR MICROELECTRONICS APPLICATIONS

#5
20210087056
2021-03-25

MEMS structure and manufacturing method thereof

#6
20180222748
2018-08-09

Method for frequency trimming a microelectromechanical resonator

#7
20160289060
2016-10-06

Device and method of manufacturing the same

#8
20160107880
2016-04-21

Substrate for diaphragm-type resonant MEMS devices, diaphragm-type resonant MEMS device and method for manufacturing same

#9
20160016792
2016-01-21

Methods of forming microstructure and electronic device having moveable component

#10
20150274517
2015-10-01

METHOD TO IMPROVE SURFACE ROUGHNESS AND ELIMINATE SHARP CORNERS ON AN ACTUATOR LAYER OF A MEMS DEVICE

#11
20150054096
2015-02-26

Reducing MEMS stiction by introduction of a carbon barrier

#12
20150008788
2015-01-08

Low temperature ceramic Microelectromechanical structures

#13
20140167188
2014-06-19

Reducing MEMS stiction by introduction of a carbon barrier

#14
20130052421
2013-02-28

Monocrystalline epitaxially aligned nanostructures and related methods

#15
20130032904
2013-02-07

Coated Capacitive Sensor

#16
20120161573
2012-06-28

Microstructure and electronic device

#17
20120056308
2012-03-08

Method of forming an electromechanical transducer device

#18
20110284995
2011-11-24

MICROMECHANICAL MEMBRANES AND RELATED STRUCTURES AND METHODS

#19
20110111545
2011-05-12

Low temperature ceramic microelectromechanical structures

#20
20100032812
2010-02-11

Method for forming silicon germanium layers at low temperatures, layers formed therewith and structures comprising such layers

#21
20090176064
2009-07-09

Membrane structure element and method for manufacturing same

#22
20090042372
2009-02-12

Polysilicon deposition and anneal process enabling thick polysilicon films for MEMS applications

#23
20070066052
2007-03-22

Semiconductor device having three-dimensional construction and method for manufacturing the same

#24
20060166403
2006-07-27

Fabrication of advanced silicon-based MEMS devices

#25
20050194662
2005-09-08

Semiconductor component and micromechanical structure

#26
15265340
2018-12-04

Trimming method for microresonators and microresonators made thereby