C09G1/02 - page 6 - CPC Classification Index

#1501

20120190201

2012-07-26

MULTI-SELECTIVE POLISHING SLURRY COMPOSITION AND A SEMICONDUCTOR ELEMENT PRODUCTION METHOD USING THE SAME

#1502

20120190199

2012-07-26

Silicon polishing compositions with improved PSD performance

#1503

20120187334

2012-07-26

Method for preparing chemical mechanical polishing slurry composition

#1504

20120187333

2012-07-26

Adjuvant for controlling polishing selectivity and chemical mechanical polishing slurry comprising the same

#1505

20120175550

2012-07-12

AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING AND CHEMICAL MECHANICAL POLISHING METHOD USING SAME

#1506

20120171936

2012-07-05

Polishing slurry including zirconia particles and a method of using the polishing slurry

#1507

20120164924

2012-06-28

COMPOSITIONS AND METHODS FOR REMOVING SCRATCHES FROM PLASTIC SURFACES

#1508

20120160804

2012-06-28

Polishing agent for copper polishing and polishing method using same

#1509

20120156874

2012-06-21

Chemical mechanical polishing slurry composition and method for producing semiconductor device using the same

#1510

20120153547

2012-06-21

Ceramic particulate material and processes for forming same

#1511

20120153218

2012-06-21

POLISHING COMPOSITION

#1512

20120145951

2012-06-14

Highly dilutable polishing concentrates and slurries

#1513

20120145950

2012-06-14

Ultrapure colloidal silica for use in chemical mechanical polishing applications

#1514

20120142258

2012-06-07

Polishing composition and polishing method using the same

#1515

20120142191

2012-06-07

Chemical mechanical planarization composition and method with low corrosiveness

#1516

20120142183

2012-06-07

Aluminum enhanced palladium CMP process

#1517

20120138851

2012-06-07

POLISHING COMPOSITION AND POLISHING METHOD

#1518

20120129346

2012-05-24

Polishing agent, concentrated one-pack type polishing agent, two-pack type polishing agent and method for polishing substrate

#1519

20120108064

2012-05-03

Polishing composition for silicon wafers

#1520

20120100718

2012-04-26

CMP fluid and method for polishing palladium

#1521

20120094491

2012-04-19

CMP polishing liquid and polishing method

#1522

20120094490

2012-04-19

Slurry for chemical mechanical polishing

#1523

20120094489

2012-04-19

CMP compositions and methods for suppressing polysilicon removal rates

#1524

20120094487

2012-04-19

COMPOSITIONS AND METHODS FOR MODIFYING A SURFACE SUITED FOR SEMICONDUCTOR FABRICATION

#1525

20120083188

2012-04-05

DISPERSION COMPRISING CERIUM OXIDE AND SILICON DIOXIDE

#1526

20120080775

2012-04-05

Method of polishing a silicon wafer

#1527

20120077422

2012-03-29

Polishing liquid composition

#1528

20120077419

2012-03-29

RASPBERRY-TYPE METAL OXIDE NANOSTRUCTURES COATED WITH CEO2 NANOPARTICLES FOR CHEMICAL MECHANICAL PLANARIZATION (CMP)

#1529

20120071074

2012-03-22

Grinding stone, manufacturing method of grinding stone, and manufacturing apparatus of grinding stone

#1530

20120070991

2012-03-22

Chemical mechanical polishing of silicon carbide comprising surfaces

#1531

20120070990

2012-03-22

Slurry composition having tunable dielectric polishing selectivity and method of polishing a substrate

#1532

20120070989

2012-03-22

Stabilized, concentratable chemical mechanical polishing composition and method of polishing a substrate

#1533

20120064721

2012-03-15

Polishing slurry and polishing method

#1534

20120058643

2012-03-08

Aqueous metal polishing agent comprising a polymeric abrasiv containing pendant functional groups and its use in a CMP process

#1535

20120058642

2012-03-08

Silicon polishing compositions with high rate and low defectivity

#1536

20120058641

2012-03-08

Aqueous polishing agent comprising solid polymer particles and two complexing agents and its use in a process for polishing patterned and unstructured metal surfaces

#1537

20120052682

2012-03-01

POLISHING SLURRY AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME

#1538

20120049107

2012-03-01

SLURRY COMPOSITION FOR CHEMICAL MECHANICAL POLISHING PROCESS AND METHOD OF FORMING PHASE CHANGE MEMORY DEVICE USING THE SAME

#1539

20120048830

2012-03-01

Abrasive liquid for metal and method for polishing

#1540

20120045970

2012-02-23

Oxidizing particles based slurry for nobel metal including ruthenium chemical mechanical planarization

#1541

20120042575

2012-02-23

CMP SLURRY RECYCLING SYSTEM AND METHODS

#1542

20120034851

2012-02-09

Easy rinsing polishing composition for polymer-based surfaces

#1543

20120028467

2012-02-02

Polishing fluid and polishing method

#1544

20120028466

2012-02-02

Method for chemical mechanical planarization of a tungsten-containing substrate

#1545

20120024818

2012-02-02

Polishing agent for copper polishing and polishing method using same

#1546

20120021675

2012-01-26

SYNTHETIC QUARTZ GLASS SUBSTRATE POLISHING SLURRY AND MANUFACTURE OF SYNTHETIC QUARTZ GLASS SUBSTRATE USING THE SAME

#1547

20120009441

2012-01-12

Method of manufacturing perpendicular magnetic recording medium substrate and perpendicular magnetic recording medium substrate manufactured by the same

#1548

20120007018

2012-01-12

SLURRY COMPOSITIONS FOR SELECTIVELY POLISHING SILICON NITRIDE RELATIVE TO SILICON OXIDE, METHODS OF POLISHING A SILICON NITRIDE LAYER AND METHODS OF MANUFACTURING A SEMICONDUCTOR DEVICE USING THE SAME

#1549

20120003901

2012-01-05

Composition for advanced node front-and back-end of line chemical mechanical polishing

#1550

20120003834

2012-01-05

Method Of Polishing Chalcogenide Alloy

#1551

20120001118

2012-01-05

Polishing slurry for chalcogenide alloy

#1552

20110318929

2011-12-29

CMP polishing solution and polishing method

#1553

20110318928

2011-12-29

Polymeric Barrier Removal Polishing Slurry

#1554

20110312251

2011-12-22

Abrasive, method of polishing target member and process for producing semiconductor device

#1555

20110312182

2011-12-22

METHOD AND APPARATUS FOR CHEMICAL-MECHANICAL PLANARIZATION

#1556

20110312181

2011-12-22

Method for chemical mechanical planarization of a copper-containing substrate

#1557

20110306211

2011-12-15

Stabilized chemical mechanical polishing composition and method of polishing a substrate

#1558

20110300778

2011-12-08

Abrading agent and abrading method

#1559

20110300710

2011-12-08

Method for forming through-base wafer vias for fabrication of stacked devices

#1560

20110294404

2011-12-01

Tunable polish rates by varying dissolved oxygen content

#1561

20110275285

2011-11-10

Polishing solution for CMP and polishing method using the polishing solution

#1562

20110275282

2011-11-10

HAND-POWERED POLISHING APPARATUS AND KIT WITH DIAMOND ABRASIVE AND METHOD

#1563

20110275217

2011-11-10

Polishing solution for CMP and polishing method using the polishing solution

#1564

20110275168

2011-11-10

Single step CMP for polishing three or more layer film stacks

#1565

20110271873

2011-11-10

Solvent-Free Organosilane Quaternary Ammonium Compositions, Method of Making and Use

#1566

20110269312

2011-11-03

Chemical mechanical polishing (CMP) polishing solution with enhanced performance

#1567

20110268994

2011-11-03

GLASS SUBSTRATE FOR INFORMATION RECORDING MEDIUM, POLISHING COLLOIDAL SILICA SLURRY FOR MANUFACTURING THE SAME AND INFORMATION RECORDING MEDIUM

#1568

20110250756

2011-10-13

AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING, CHEMICAL MECHANICAL POLISHING METHOD, KIT FOR CHEMICAL MECHANICAL POLISHING, AND KIT FOR PREPARING AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING

#1569

20110250755

2011-10-13

METHOD OF POLISHING WAFER SURFACE ON WHICH COPPER AND SILICON ARE EXPOSED

#1570

20110250754

2011-10-13

Polishing Composition and Polishing Method

#1571

20110247996

2011-10-13

DILUTABLE CMP COMPOSITION CONTAINING A SURFACTANT

#1572

20110244685

2011-10-06

Method of chemical mechanical polishing a substrate with polishing composition adapted to enhance silicon oxide removal

#1573

20110244684

2011-10-06

Polishing liquid and polishing method

#1574

20110240594

2011-10-06

Polishing liquid composition for magnetic-disk substrate

#1575

20110237079

2011-09-29

METHOD FOR EXPOSING THROUGH-BASE WAFER VIAS FOR FABRICATION OF STACKED DEVICES

#1576

20110230050

2011-09-22

Method of polishing a substrate comprising polysilicon and at least one of silicon oxide and silicon nitride

#1577

20110230049

2011-09-22

Method of polishing a substrate comprising polysilicon and at least one of silicon oxide and silicon nitride

#1578

20110230048

2011-09-22

Method of polishing a substrate comprising polysilicon, silicon oxide and silicon nitride

#1579

20110225897

2011-09-22

Liquid suspensions and powders of cerium oxide particles and preparation and polishing applications thereof

#1580

20110223840

2011-09-15

Polishing Composition and Polishing Method Using The Same

#1581

20110223764

2011-09-15

Chemical-mechanical polishing compositions and methods of making and using the same

#1582

20110219704

2011-09-15

Method for recycling cerium oxide abrasive

#1583

20110217845

2011-09-08

Polishing Composition and Polishing Method Using The Same

#1584

20110212621

2011-09-01

Abrasive composition and method for manufacturing semiconductor integrated circuit device

#1585

20110207327

2011-08-25

ABRASIVE, POLISHING METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE

#1586

20110207326

2011-08-25

Slurry for polishing and planarization method of insulating layer using the same

#1587

20110204027

2011-08-25

SLURRY MANUFACTURING METHOD, SLURRY AND POLISHING METHOD AND APPARATUS USING SLURRY

#1588

20110203188

2011-08-25

Abrasive molten grains

#1589

20110203186

2011-08-25

POLISHING LIQUID COMPOSITION FOR MAGNETIC DISK SUBSTRATE

#1590

20110203185

2011-08-25

PAINTED SURFACE TREATING COMPOSITION, A PAINTED SURFACE TREATING METHOD AND A PAINTED SURFACE PATCHING METHOD

#1591

20110198531

2011-08-18

COMPOSITION FOR POLISHING SILICON NITRIDE AND METHOD OF CONTROLLING SELECTIVITY USING SAME

#1592

20110189386

2011-08-04

Compositions and methods for restoring aircraft windows and other plastic surfaces

#1593

20110186542

2011-08-04

SLURRY CONTAINING MULTI-OXIDIZER AND MIXED NANO-ABRASIVES FOR TUNGSTEN CMP

#1594

20110186086

2011-08-04

Oxidizing aqueous cleaner for the removal of post-etch residues

#1595

20110183581

2011-07-28

Polishing composition and polishing method using the same

#1596

20110180511

2011-07-28

Polishing composition and polishing method using the same

#1597

20110177690

2011-07-21

Polishing solution for CMP, and method for polishing substrate using the polishing solution for CMP

#1598

20110175018

2011-07-21

Polishing liquid and polishing method

#1599

20110171832

2011-07-14

Chemical-mechanical polishing formulation and methods of use

#1600

20110171415

2011-07-14

Glass substrate for a magnetic disk and magnetic disk

#1601

20110165777

2011-07-07

Method and Slurry for Tuning Low-K Versus Copper Removal Rates During Chemical Mechanical Polishing

#1602

20110162873

2011-07-07

Forming conductive features of electronic devices

#1603

20110159785

2011-06-30

Preparation of synthetic quartz glass substrates

#1604

20110155951

2011-06-30

Process for the production of metal oxide and metalloid oxide dispersions

#1605

20110136344

2011-06-09

Composition and method for polishing polysilicon

#1606

20110132868

2011-06-09

Polishing composition for polishing silver and alumina, and polishing method using the same

#1607

20110124195

2011-05-26

Chemical Mechanical Polishing Composition Containing Polysilicon Polish Finisher

#1608

20110123831

2011-05-26

METHOD FOR MANUFACTURING GLASS SUBSTRATE FOR MAGNETIC DISK

#1609

20110121224

2011-05-26

Polishing composition

#1610

20110117821

2011-05-19

Chemical mechanical polishing aqueous dispersion, chemical mechanical polishing method using the same, and method of recycling chemical mechanical polishing aqueous dispersion

#1611

20110117720

2011-05-19

Method for preparing cerium oxide, cerium oxide prepared therefrom and CMP slurry comprising the same

#1612

20110114872

2011-05-19

Process For Polishing A Silicon Surface By Means Of A Cerium Oxide-Containing Dispersion

#1613

20110111595

2011-05-12

Chemical mechanical polishing composition and methods relating thereto

#1614

20110107680

2011-05-12

Method for preparing cerium carbonate

#1615

20110104992

2011-05-05

Polishing solution for metal films and polishing method using the same

#1616

20110100956

2011-05-05

Metal-passivating CMP compositions and methods

#1617

20110089143

2011-04-21

Highly dilutable polishing concentrates and slurries

#1618

20110081780

2011-04-07

AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING AND CHEMICAL MECHANICAL POLISHING METHOD

#1619

20110076833

2011-03-31

Method of manufacturing semiconductor device

#1620

20110070745

2011-03-24

POLISHING METHOD, POLISHING APPARATUS, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

#1621

20110070737

2011-03-24

Method for preparing of cerium oxide powder for chemical mechanical polishing and method for preparing of chemical mechanical polishing slurry using the same

#1622

20110070736

2011-03-24

Method for polishing through-silicon via (TSV) wafers and a polishing composition used in the method

#1623

20110070735

2011-03-24

Method and composition for chemical mechanical planarization of a metal-containing substrate

#1624

20110065364

2011-03-17

Metal cations for initiating polishing

#1625

20110064966

2011-03-17

LIPOSOMAL COMPOSITIONS AND METHODS FOR USE

#1626

20110062376

2011-03-17

Composition and method for polishing bulk silicon

#1627

20110062374

2011-03-17

CMP slurry for metallic film, polishing method and method of manufacturing semiconductor device

#1628

20110062115

2011-03-17

Composition and method for polishing bulk silicon

#1629

20110059683

2011-03-10

Polishing composition

#1630

20110059680

2011-03-10

Aqueous dispersion for chemical mechanical polishing and chemical mechanical polishing method

#1631

20110053462

2011-03-03

Aqueous dispersion for chemical mechanical polishing and chemical mechanical polishing method

#1632

20110045741

2011-02-24

Auto-Stopping Abrasive Composition for Polishing High Step Height Oxide Layer

#1633

20110045671

2011-02-24

Composition for polishing surfaces of silicon dioxide

#1634

20110045654

2011-02-24

Germanium layer polishing

#1635

20110039475

2011-02-17

Polishing agent and method for polishing substrate using the polishing agent

#1636

20110039412

2011-02-17

Chemical mechanical polishing slurry composition including non-ionized, heat activated nano-catalyst and polishing method using the same

#1637

20110028073

2011-02-03

CMP polishing slurry and polishing method

#1638

20110027997

2011-02-03

POLISHING LIQUID FOR CMP AND POLISHING METHOD

#1639

20110027996

2011-02-03

SLURRY COMPOSITION FOR A CHEMICAL MECHANICAL POLISHING PROCESS, METHOD OF POLISHING AN OBJECT LAYER AND METHOD OF MANUFACTURING A SEMICONDUCTOR MEMORY DEVICE USING THE SLURRY COMPOSITION

#1640

20110027994

2011-02-03

POLISHING SLURRY FOR CMP

#1641

20110009033

2011-01-13

Polishing slurry for metal films and polishing method

#1642

20110008967

2011-01-13

CMP slurry and a polishing method using the same

#1643

20110008966

2011-01-13

Planarization method using hybrid oxide and polysilicon CMP

#1644

20110006251

2011-01-13

Cerium salt, producing method thereof, cerium oxide and cerium based polishing slurry

#1645

20110005143

2011-01-13

POLISHING OIL SLURRY FOR POLISHING HARD CRYSTAL SUBSTRATE

#1646

20100330884

2010-12-30

Diatomaceous Earth-Containing Slurry Composition And Method For Polishing Organic Polymer-Based Ophthalmic Substrates Using The Same

#1647

20100330809

2010-12-30

POLISHING LIQUID FOR METALS

#1648

20100327219

2010-12-30

Solution for forming polishing slurry, polishing slurry and related methods

#1649

20100323586

2010-12-23

Methods for producing and processing semiconductor wafers

#1650

20100323584

2010-12-23

Polishing liquid for metal film and polishing method

#1651

20100314576

2010-12-16

Compositions for CMP of semiconductor materials

#1652

20100308258

2010-12-09

DISPERSION COMPRISING CERIUM OXIDE AND SHEET SILICATE

#1653

20100308016

2010-12-09

Polishing composition for nickel-phosphorous memory disks

#1654

20100307068

2010-12-09

DISPERSION COMPRISING CERIUM OXIDE AND COLLOIDAL SILICON DIOXIDE

#1655

20100301265

2010-12-02

POLISHING SLURRY AND METHOD OF POLISHING

#1656

20100301263

2010-12-02

Slurry composition for a chemical mechanical polishing process and method of manufacturing a semiconductor device using the slurry composition

#1657

20100301014

2010-12-02

Polishing composition and polishing method using the same

#1658

20100294983

2010-11-25

Polishing composition

#1659

20100279507

2010-11-04

Method for chemical mechanical polishing a substrate

#1660

20100279506

2010-11-04

Polishing silicon carbide

#1661

20100276392

2010-11-04

CMP SYSTEM UTILIZING HALOGEN ADDUCT

#1662

20100267315

2010-10-21

Polishing composition

#1663

20100264360

2010-10-21

Use of oxidants for the processing of semiconductor wafers, use of a composition and composition therefore

#1664

20100258528

2010-10-14

Chemical mechanical polishing of silicon carbide comprising surfaces

#1665

20100255681

2010-10-07

Slurry composition and method of fabricating damascene structure using the same

#1666

20100248593

2010-09-30

POLISHING SLURRY, PROCESS FOR PRODUCING THE SAME, POLISHING METHOD AND PROCESS FOR PRODUCING GLASS SUBSTRATE FOR MAGNETIC DISK

#1667

20100248592

2010-09-30

Buffing composition and method of finishing a surface of a material

#1668

20100248480

2010-09-30

CHEMICAL MECHANICAL POLISHING COMPOSITIONS FOR COPPER AND ASSOCIATED MATERIALS AND METHOD OF USING SAME

#1669

20100248479

2010-09-30

CMP method

#1670

20100248478

2010-09-30

Method of processing a surface of group III nitride crystal and group III nitride crystal substrate

#1671

20100243950

2010-09-30

POLISHING AGENT FOR SYNTHETIC QUARTZ GLASS SUBSTRATE

#1672

20100243471

2010-09-30

COMPOSITION, METHOD AND PROCESS FOR POLISHING A WAFER

#1673

20100242374

2010-09-30

Polishing Composition and Polishing Method

#1674

20100236288

2010-09-23

GLASS POWDERS, METHODS FOR PRODUCING GLASS POWDERS AND DEVICES FABRICATED FROM SAME

#1675

20100233880

2010-09-16

Chemical mechanical planarization using nanodiamond

#1676

20100233392

2010-09-16

DISPERSION OF ALUMINIUM OXIDE, COATING COMPOSITION AND INK-ABSORBING MEDIUM

#1677

20100230841

2010-09-16

AEROSOL METHOD AND APPARATUS, PARTICULATE PRODUCTS, AND ELECTRONIC DEVICES MADE THEREFROM

#1678

20100227532

2010-09-09

METHOD OF SURFACE TREATMENT OF GROUP III NITRIDE CRYSTAL FILM, GROUP III NITRIDE CRYSTAL SUBSTRATE, GROUP III NITRIDE CRYSTAL SUBSTRATE WITH EPITAXIAL LAYER, AND SEMICONDUCTOR DEVICE

#1679

20100221982

2010-09-02

KIT HAVING TWO TYPES OF CLAY

#1680

20100221918

2010-09-02

AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING AND METHOD FOR PREPARING THE SAME, KIT FOR PREPARING AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING, AND CHEMICAL MECHANICAL POLISHING METHOD FOR SEMICONDUCTOR DEVICE

#1681

20100216309

2010-08-26

CMP POLISHING LIQUID AND METHOD FOR POLISHING SUBSTRATE USING THE SAME

#1682

20100210185

2010-08-19

Conductive hydrocarbon fluid

#1683

20100210184

2010-08-19

CPM slurry for silicon film polishing and polishing method

#1684

20100210109

2010-08-19

CMP polishing slurry and method of polishing substrate

#1685

20100209742

2010-08-19

METHOD OF MANUFACTURING A GLASS SUBSTRATE FOR A MAGNETIC RECORDING MEDIUM, A GLASS SUBSTRATE FOR A MAGNETIC RECORDING MEDIUM MANUFACTURED BY THE METHOD, AND A PERPENDICULAR MAGNETIC RECORDING MEDIUM

#1686

20100207058

2010-08-19

POLISHING COMPOSITION

#1687

20100207057

2010-08-19

POLISHING COMPOSITION

#1688

20100203729

2010-08-12

COMPOSITION FOR CHEMICAL MECHANICAL POLISHING

#1689

20100200802

2010-08-12

Oxidation-stabilized CMP compositions and methods

#1690

20100197201

2010-08-05

Polishing liquid for metal and method of polishing

#1691

20100193728

2010-08-05

Chemical Mechanical Polishing Composition

#1692

20100193470

2010-08-05

Polishing composition for nickel-phosphorous memory disks

#1693

20100192472

2010-08-05

Abrasive compounds for semiconductor planarization

#1694

20100190413

2010-07-29

POLISHING COMPOSITION

#1695

20100190339

2010-07-29

COMPOSITIONS AND METHODS FOR CHEMICAL-MECHANICAL POLISHING OF PHASE CHANGE MATERIALS

#1696

20100184359

2010-07-22

Method for fabricating semiconductor device

#1697

20100184292

2010-07-22

SYSTEMS, METHODS AND SLURRIES FOR CHEMICAL-MECHANICAL ROUGH POLISHING OF GAAS WAFERS

#1698

20100184291

2010-07-22

AQUEOUS SLURRY COMPOSITION FOR CHEMICAL MECHANICAL POLISHING AND CHEMICAL MECHANICAL POLISHING METHOD

#1699

20100181525

2010-07-22

Compositions comprising silane modified metal oxides

#1700

20100180513

2010-07-22

Polymer particles having improved mechanical properties and applications of same

#1701

20100178767

2010-07-15

Chemical-mechanical polishing composition comprising metal-organic framework materials

#1702

20100178765

2010-07-15

Metal polishing slurry and method of polishing a film to be polished

#1703

20100176335

2010-07-15

CMP Slurry Composition for Copper Damascene Process

#1704

20100171069

2010-07-08

DISPERSION COMPRISING CERIUM OXIDE, SILICON DIOXIDE AND AMINO ACID

#1705

20100167547

2010-07-01

Polishing liquid

#1706

20100167546

2010-07-01

Method and composition for chemical mechanical planarization of a metal or a metal alloy

#1707

20100167545

2010-07-01

Method and composition for chemical mechanical planarization of a metal

#1708

20100164106

2010-07-01

CMP Slurry Composition for Barrier Polishing for Manufacturing Copper Interconnects, Polishing Method Using the Composition, and Semiconductor Device Manufactured by the Method

#1709

20100163787

2010-07-01

POLISHING COMPOSITION

#1710

20100163786

2010-07-01

Polishing composition for semiconductor wafer

#1711

20100163785

2010-07-01

DISPERSION COMPRISING CERIUM OXIDE, SILICON DIOXIDE AND AMINO ACID

#1712

20100159807

2010-06-24

Polymeric barrier removal polishing slurry

#1713

20100159698

2010-06-24

Combination, method, and composition for chemical mechanical planarization of a tungsten-containing substrate

#1714

20100155655

2010-06-24

POLISHING COMPOSITION

#1715

20100155654

2010-06-24

Polishing composition

#1716

20100151684

2010-06-17

SLURRY COMPOSITION FOR PRIMARY CHEMICAL MECHANICAL POLISHING AND CHEMICAL MECHANICAL POLISHING METHOD

#1717

20100151683

2010-06-17

Chemical mechanical polishing composition and methods relating thereto

#1718

20100147799

2010-06-17

Chemical mechanical polishing method

#1719

20100144149

2010-06-10

Method to selectively polish silicon carbide films

#1720

20100130013

2010-05-27

SLURRY COMPOSITION FOR GST PHASE CHANGE MEMORY MATERIALS POLISHING

#1721

20100130012

2010-05-27

Method for polishing a semiconductor wafer with a strained-relaxed SiGelayer

#1722

20100120250

2010-05-13

Metal polishing slurry and polishing method

#1723

20100117024

2010-05-13

Lapping composition and method using same

#1724

20100112906

2010-05-06

Chemical mechanical polishing composition and methods relating thereto

#1725

20100105595

2010-04-29

COMPOSITION COMPRISING CHELATING AGENTS CONTAINING AMIDOXIME COMPOUNDS

#1726

20100102268

2010-04-29

DISPERSION COMPRISING CERIUM OXIDE AND COLLOIDAL SILICON DIOXIDE

#1727

20100101448

2010-04-29

Polishing slurry for copper films

#1728

20100099260

2010-04-22

Aqueous dispersion for chemical mechanical polishing and chemical mechanical polishing method for semiconductor device

#1729

20100099259

2010-04-22

POLISHING COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE

#1730

20100096584

2010-04-22

Polishing Composition and Polishing Method Using the Same

#1731

20100096360

2010-04-22

COMPOSITIONS AND METHODS FOR BARRIER LAYER POLISHING

#1732

20100090159

2010-04-15

Semiconductor polishing composition

#1733

20100087065

2010-04-08

STABILIZATION OF POLYMER-SILICA DISPERSIONS FOR CHEMICAL MECHANICAL POLISHING SLURRY APPLICATIONS

#1734

20100083584

2010-04-08

DISPERSION COMPRISING CERIUM OXIDE AND SHEET SILICATE

#1735

20100081281

2010-04-01

Abrasive compositions for chemical mechanical polishing and methods for using same

#1736

20100081279

2010-04-01

Method for Forming Through-base Wafer Vias in Fabrication of Stacked Devices

#1737

20100075500

2010-03-25

Metal polishing slurry and chemical mechanical polishing method

#1738

20100072418

2010-03-25

Polishing slurry

#1739

20100072417

2010-03-25

Liquid suspensions and powders of cerium oxide particles and polishing applications thereof

#1740

20100068883

2010-03-18

CMP slurry composition for forming metal wiring line

#1741

20100063164

2010-03-11

TRANSPARENT ZINC SULPHIDE HAVING A HIGH SPECIFIC SURFACE AREA

#1742

20100056026

2010-03-04

Polishing liquid composition

#1743

20100055909

2010-03-04

SEMICONDUCTOR POLISHING COMPOUND, PROCESS FOR ITS PRODUCTION AND POLISHING METHOD

#1744

20100044625

2010-02-25

Method for preparing cerium oxide powder using organic solvent and CMP slurry comprising the same

#1745

20100038584

2010-02-18

Polishing Composition and Polishing Method Using the Same

#1746

20100035433

2010-02-11

POLISHING AGENT COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE

#1747

20100029181

2010-02-04

Methods and compositions for polishing silicon-containing substrates

#1748

20100029080

2010-02-04

Aqueous cerium oxide dispersion

#1749

20100029079

2010-02-04

Chemical mechanical polishing composition and methods relating thereto

#1750

20100025623

2010-02-04

Additive for polishing composition

#1751

20100025373

2010-02-04

Pyrogenic silica produced in a production facility with high capacity

#1752

20100015807

2010-01-21

Chemical Mechanical Polishing Composition for Copper Comprising Zeolite

#1753

20100015806

2010-01-21

CMP POLISHING SLURRY, ADDITIVE LIQUID FOR CMP POLISHING SLURRY, AND SUBSTRATE-POLISHING PROCESSES USING THE SAME

#1754

20100009539

2010-01-14

Cerium oxide powder, method for preparing the same, and CMP slurry comprising the same

#1755

20100009538

2010-01-14

Silicon nitride polishing liquid and polishing method

#1756

20100009537

2010-01-14

Method of polishing nickel-phosphorous

#1757

20100003897

2010-01-07

METHODS OF POLISHING AN OBJECT USING SLURRY COMPOSITIONS

#1758

20100003821

2010-01-07

Wetting agent for semiconductors, and polishing composition and polishing method employing it

#1759

20100001229

2010-01-07

CMP SLURRY FOR SILICON FILM

#1760

20090325383

2009-12-31

CHEMICAL MECHANICAL POLISHING AQUEOUS DISPERSION AND CHEMICAL MECHANICAL POLISHING METHOD FOR SEMICONDUCTOR DEVICE

#1761

20090325323

2009-12-31

AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING, PRODUCTION METHOD THEREOF, AND CHEMICAL MECHANICAL POLISHING METHOD

#1762

20090321390

2009-12-31

CHEMICAL MECHANICAL POLISHING OF MOISTURE SENSITIVE SURFACES AND COMPOSITIONS THEREOF

#1763

20090317974

2009-12-24

POLISHING COMPOSITION FOR SILICON WAFER, POLISHING COMPOSITION KIT FOR SILICON WAFER AND METHOD OF POLISHING SILICON WAFER

#1764

20090314744

2009-12-24

CMP method for metal-containing substrates

#1765

20090311947

2009-12-17

Polishing Composition for Silicon Wafer and Polishing Method of Silicon Wafer

#1766

20090311864

2009-12-17

Polishing slurry

#1767

20090308836

2009-12-17

Dihydroxy enol compounds used in chemical mechanical polishing compositions having metal ion oxidizers

#1768

20090302266

2009-12-10

AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING, CHEMICAL MECHANICAL POLISHING METHOD, AND KIT FOR PREPARING AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING

#1769

20090298290

2009-12-03

Polishing liquid and polishing method

#1770

20090298289

2009-12-03

Chemical Mechanical Polishing Composition for Copper Comprising Zeolite

#1771

20090291620

2009-11-26

Chemical mechanical polishing aqueous dispersion, chemical mechanical polishing method, and chemical mechanical polishing aqueous dispersion preparation kit

#1772

20090291559

2009-11-26

Stable, high rate silicon slurry

#1773

20090289217

2009-11-26

POLISHING COMPOSITION

#1774

20090289033

2009-11-26

Polishing composition containing polyether amine

#1775

20090283715

2009-11-19

POLISHING SLURRY FOR CMP

#1776

20090280724

2009-11-12

Method for Polishing Semiconductor Layers

#1777

20090278080

2009-11-12

Polishing slurry

#1778

20090275188

2009-11-05

Slurry for polishing phase change material and method for patterning polishing phase change material using the same

#1779

20090267020

2009-10-29

Adjuvant for controlling polishing selectivity and chemical mechanical polishing slurry

#1780

20090261291

2009-10-22

Chemical-mechanical planarization composition having benzenesulfonic acid and per-compound oxidizing agents, and associated method for use

#1781

20090258493

2009-10-15

SEMICONDUCTOR DEVICE MANUFACTURING METHOD

#1782

20090255903

2009-10-15

Compositions for chemical-mechanical planarization of noble-metal-featured substrates, associated methods, and substrates produced by such methods

#1783

20090255189

2009-10-15

ALUMINUM OXIDE PARTICLES

#1784

20090253355

2009-10-08

CMP abrasive, method for polishing substrate and method for manufacturing semiconductor device using the same, and additive for CMP abrasive

#1785

20090253354

2009-10-08

POLISHING COMPOSITIONS AND USE THEREOF

#1786

20090250656

2009-10-08

Free Radical-Forming Activator Attached to Solid and Used to Enhance CMP Formulations

#1787

20090250433

2009-10-08

Slurry composition and method for chemical mechanical polishing of copper integrated with tungsten based barrier metals

#1788

20090246957

2009-10-01

POLISHING LIQUID AND POLISHING METHOD

#1789

20090246956

2009-10-01

Metal polishing composition and chemical mechanical polishing method

#1790

20090239380

2009-09-24

Polishing liquid for metal and polishing method using the same

#1791

20090239373

2009-09-24

Chemical mechanical polishing method and method of manufacturing semiconductor device

#1792

20090236559

2009-09-24

Compositions for polishing aluminum/copper and titanium in damascene structures

#1793

20090230351

2009-09-17

Particulate silica

#1794

20090229189

2009-09-17

METHOD FOR PREPARING A POLISHING SLURRY HAVING HIGH DISPERSION STABILITY

#1795

20090224200

2009-09-10

POLISHING SLURRIES FOR CHEMICAL-MECHANICAL POLISHING

#1796

20090223136

2009-09-10

Polishing compound for semiconductor wafer polishing and polishing method

#1797

20090221213

2009-09-03

Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing method for semiconductor device

#1798

20090221145

2009-09-03

Metal polishing slurry and chemical mechanical polishing method

#1799

20090215658

2009-08-27

Oxidizing aqueous cleaner for the removal of post-etch residues

#1800

20090215271

2009-08-27

Polishing composition and method for high silicon nitride to silicon oxide removal rate ratios