120139 ⎘
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes; Coating on selected surface areas, e.g. using masks Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
Packaging for high purity solvents
#602Capped ALD films for doping fin-shaped channel regions of 3-D IC transistors
#603Method of processing substrate, substrate processing apparatus, recording medium, and method of manufacturing semiconductor device
#604Plasma resistant coating of porous body by atomic layer deposition
#605Plasma resistant coating of porous body by atomic layer deposition
#606Etching method
#607Thermal chemical vapor deposition coating
#608Pulsing RF power in etch process to enhance tungsten gapfill performance
#609Method of manufacturing ruthenium wiring
#610PLASMA GENERATING APPARATUS AND METHOD OF MANUFACTURING PATTERNED DEVICES USING SPATIALLY RESOLVED PLASMA PROCESSING
#611Reactors for plasma-assisted processes and associated methods
#612Selective deposition of metals, metal oxides, and dielectrics
#613Forming low resistivity fluorine free tungsten film without nucleation
#614Film deposition method and film deposition apparatus
#615Ultra-breathable and protective membranes with sub-5 nm carbon nanotube pores
#616Methods for forming a metallic film on a substrate by cyclical deposition and related semiconductor device structures
#617Directional deposition on patterned structures
#618Systems and methods for carbon-carbon materials incorporating yttrium and zirconium compounds
#619High conductivity graphene-metal composite and methods of manufacture
#620Metal foams and methods of manufacture
#621Method for depositing oxide film by thermal ALD and PEALD
#622Systems for modifying pressure differential in a chemical vapor process
#623Trilayer coated blood collection tube with low oxygen transmission rate
#624Techniques for filling a structure using selective surface modification
#625Liner and barrier applications for subtractive metal integration
#626Method of manufacturing semiconductor device
#627Silicon chalcogenate precursors comprising a chemical formula of si(XR1)nR24-n and methods of forming the silicon chalcogenate precursors
#628Technique to deposit sidewall passivation for high aspect ratio cylinder etch
#629Sequential infiltration synthesis apparatus
#630Sequential infiltration synthesis apparatus and a method of forming a patterned structure
#631Method of depositing a thin film
#632High conductivity graphene-metal composite
#633Semiconductor manufacturing method and semiconductor manufacturing apparatus
#634Method of manufacturing semiconductor device and apparatus of manufacturing semiconductor device
#635COMPOSITE MATERIAL AND METHOD FOR MAKING
#636Self-aligned multi-patterning process flow with ALD gapfill spacer mask
#637Selective inhibition in atomic layer deposition of silicon-containing films
#638APPARATUS FOR DEPOSITING A COBALT LAYER USING A CAROUSEL BATCH DEPOSITION REACTOR
#639Method of manufacturing semiconductor device
#640Gas-barrier plastic molded product and method for manufacturing same
#641Process to chemically modify polymeric materials by static, low-pressure infiltration of reactive gaseous molecules
#642COATING SYSTEM AND METHOD FOR COATING INTERIOR FLUID WETTED SURFACES OF A COMPONENT OF A SEMICONDUCTOR SUBSTRATE PROCESSING APPARATUS
#643Precursors and flowable CVD methods for making low-k films to fill surface features
#644Method of subatmospheric plasma-enhanced ALD using capacitively coupled electrodes with narrow gap
#645Controlling the uniformity of PECVD deposition
#646Ceramic matrix composite reinforced material
#647Film forming method
#648Thin metal coating methods for high conductivity graphane-metal composites and methods of manufacture
#649Thin metal coating methods for high conductivity graphene and stanene metal composites and methods of manufacture
#650Film forming apparatus
#651Manufacturing method of nickel wiring
#652Film forming apparatus
#653Film forming method and film forming system
#654Borane mediated dehydrogenation process from silane and alkylsilane species for spacer and hardmask application
#655Method of filling recesses in substrate with tungsten
#656Deposition of SiN
#657Precursors and flowable CVD methods for making low-K films to fill surface features
#658Slotted seal plates and slotted preforms for chemical vapor deposition densification
#659Swirled flow chemical vapor deposition
#660Process for manufacturing SiC composite ceramics
#661Cu wiring forming method and semiconductor device manufacturing method
#662Formation of a transition metal nitride
#663Film forming apparatus and gas injection member used therefor
#664CONTAINER PLASMA TREATMENT PROCESS COMPRISING A THERMAL IMAGING PHASE
#665Additive for ALD deposition profile tuning in gap features
#666Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
#667Gas supply apparatus and gas supply method
#668Vibration assisted densification of a carbon fiber preform
#669Method and apparatus for filling a gap
#670Method and apparatus for filling a gap
#671Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
#672Systems and methods for chemical vapor infiltration and densification of porous substrates
#673CERAMIC MATRIX COMPOSITE TURBINE COMPONENT WITH ENGINEERED SURFACE FEATURES RETAINING A THERMAL BARRIER COAT
#674Selective deposition of tungsten
#675Method of manufacturing semiconductor device
#676Functionalized foams
#677Apparatus and method for deposition and etch in gap fill
#678SiC-coated carbon composite material
#679Methods for the continuous, large-scale manufacture of functional nanostructures
#680Method of densifying films in semiconductor device
#681Deposition of SiN
#682Atomic layer deposition passivation for via
#683Tungsten feature fill with nucleation inhibition
#684Amorphous, porous silicon materials and related methods
#685Systems and methods for forming a composite structure
#686Atomic layer deposition of tungsten for enhanced fill and reduced substrate attack
#687Method for ceramic matrix composite with carbon coating for wetting
#688Casting mold and methods for production
#689Manganese barrier and adhesion layers for cobalt
#690Filling a cavity in a substrate using sputtering and deposition
#691Gapfill of variable aspect ratio features with a composite PEALD and PECVD method
#692Apparatus and methods for depositing ALD films with enhanced chemical exchange
#693Deposition of boron and carbon containing materials
#694Superhydrophobic compositions and coating process for the internal surface of tubular structures
#695PET containers with enhanced silicon dioxide barrier coating
#696Method and apparatus for forming silicon film and storage medium
#697Tungsten feature fill
#698Gas jetting apparatus for film formation apparatus
#699Film forming method and film forming apparatus
#700System and method for enhancing a diffusion limited CVI/CVD process
#701Method and apparatus for decreasing the radial temperature gradient in CVI/CVD furnaces
#702Plasma assisted atomic layer deposition metal oxide for patterning applications
#703Selective deposition of silicon nitride films for spacer applications
#704Recess filling method and processing apparatus
#705Batch-processing method for super-high aspect ratio diffractive optics
#706Method of growing crystal in recess and processing apparatus used therefor
#707SUBSTRATE PROCESSING APPARATUS
#708Methods for modifying pressure differential in a chemical vapor process
#709Fluororesin tube
#710Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
#711Porous materials comprising two-dimensional nanomaterials
#712Methods of forming material layer
#713Carbon-carbon composite including hydrophobic coating
#714Method and apparatus for depositing cobalt in a feature
#715Techniques for controlling ion/neutral ratio of a plasma source
#716Film deposition method and film deposition apparatus
#717Antistatic coatings for plastic vessels
#718Packaging for high purity solvents
#719Technique to deposit metal-containing sidewall passivation for high aspect ratio cylinder etch
#720In-situ film annealing with spatial atomic layer deposition
#721Silicon-nitride-containing thermal chemical vapor deposition coating
#722Separator for secondary cell having excellent heat resistance and shutdown properties
#723Susceptor and method for manufacturing same
#724Apparatus and techniques for filling a cavity using angled ion beam
#725Methods for forming low-resistance contacts through integrated process flow systems
#726Plasma activated conformal dielectric film deposition
#727High conductivity graphane-metal and graphene-metal composite and methods of manufacture
#728High conductivity graphene-metal composite and methods of manufacture
#729Method to protect features during repair cycle
#730Techniques for filling a structure using selective surface modification
#731Low vapor pressure aerosol-assisted CVD
#732Apparatus for UV flowable dielectric
#733Syringe with PECVD lubricity layer, apparatus and method for transporting a vessel to and from a PECVD processing station, and double wall plastic vessel
#734Method of forming low resistivity fluorine free tungsten film without nucleation
#735NbMC layers
#736Bottom-up gap-fill by surface poisoning treatment
#737Deposition Of Conformal And Gap-Fill Amorphous Silicon Thin-Films
#738Method for depositing dielectric film in trenches by PEALD
#739Articles with enhanced temperature capability
#740Cutting insert manufacturing method
#741Protecting an interior of a hollow body with an ALD coating
#742Method and system for three-dimensional (3D) structure fill
#743Apparatus for coating a film in a container and method for coating the film
#744Pulsing RF power in etch process to enhance tungsten gapfill performance
#745Method of densifying films in semiconductor device
#746Rapid ceramic matrix composite production method
#747Forming a ceramic matrix composite having a silicide layer
#748Methods of forming material layer
#749METHOD FOR COATING OR FILLING A POROUS MATERIAL
#750Method of growing a nanotube including passing a carbon-based gas through first and second openings of a tube
#751Ceramic matrix composite structures with controlled microstructures fabricated using chemical vapor infiltration (CVI)
#752Process for producing shaped bodies of carbon fiber reinforced carbon
#753Metal coated polymembrane and method of electrofiltration and electrosorption using a metal coated polymembrane
#754Selective deposition of silicon oxide films
#755HEAT-RESISTANT TURBINE BLADE MADE FROM OXIDE CERAMIC
#756CVI densification installation including a high capacity preheating zone
#757Method of forming borides in carbon composites
#758Method and apparatus for gap fill using deposition and etch processes
#759CAPPED ALD FILMS FOR DOPING FIN-SHAPED CHANNEL REGIONS OF 3-D IC TRANSISTORS
#760Interconnect integration for sidewall pore seal and via cleanliness
#761Protecting an interior of a gas container with an ALD coating
#762Machinable CMC insert
#763Machinable CMC insert
#764Tungsten films having low fluorine content
#765Method of forming metal film
#766Feature fill with multi-stage nucleation inhibition
#767Plasma assisted atomic layer deposition of multi-layer films for patterning applications
#768Slotted seal plates and slotted preforms for chemical vapor deposition densification
#769Multilayered carbon-carbon composite
#770Inhibitor plasma mediated atomic layer deposition for seamless feature fill
#771Heat-resistant composite material production method and production device
#772PROCESS FOR COATING A CYLINDER OF AN INTERNAL COMBUSTION ENGINE AND ENGINE CYLINDER/LINER
#773Heat-resistant composite material production method and production device
#774Plasma assisted atomic layer deposition titanium oxide for patterning applications
#775Process of filling the high aspect ratio trenches by co-flowing ligands during thermal CVD
#776Preliminary treatment method for workpiece
#777Method for rapid and efficient chemical vapor infiltration and densification of carbon fiber preforms, porous substrates and close packed particulates
#778Carbon-coating-film cleaning method and device
#779Technique to deposit sidewall passivation for high aspect ratio cylinder etch
#780Technique to deposit sidewall passivation for high aspect ratio cylinder etch
#781Substrate processing method including supplying a fluorine-containing gas on a surface of a substrate
#782Method for fabricating shallow trench isolation and semiconductor structure using the same
#783Methods for forming ceramic matrix composite articles
#784Ceramic matrix composite articles and methods for forming same
#785Cyclic sequential processes for forming high quality thin films
#786Isothermal warm wall CVD reactor
#787Advanced process flow for high quality FCVD films
#788Li-ion battery with alumina coated porous silicon anode
#789Abrasive tips for ceramic matrix composite blades and methods for making the same
#790Method of selective gas phase film deposition on a substrate by modifying the surface using hydrogen plasma
#791Plasma assisted atomic layer deposition titanium oxide for conformal encapsulation and gapfill applications
#792Turbine engine components with chemical vapor infiltrated isolation layers
#793Process for forming silicon-filled openings with a reduced occurrence of voids
#794Method for making pet containers with enhanced silicon dioxide barrier coating
#795Recess filling method and processing apparatus
#796Low temperature tungsten film deposition for small critical dimension contacts and interconnects
#797Gapfill of variable aspect ratio features with a composite PEALD and PECVD method
#798Controlled coating apparatus, systems, and methods
#799Facilitating pitch stabilization in densified carbon fiber preforms
#800Coating apparatus with half open loop
#801Methods of vapor deposition with multiple vapor sources
#802Method of manufacturing semiconductor device and semiconductor manufacturing apparatus
#803Feature fill with nucleation inhibition
#804Deposition of SiN
#805Protecting a target pump interior with an ALD coating
#806Tungsten feature fill with nucleation inhibition
#807Film deposition method and an apparatus
#808Method for generating plasma uniformly on dielectric material
#809Method for void-free cobalt gap fill
#810Method for selectively sealing ultra low-k porous dielectric layer using flowable dielectric film formed from vapor phase dielectric precursor
#811Superhydrophobic coating material and method for manufacturing the same
#812Enhanced low friction coating for medical leads and methods of making
#813Polycrystalline diamond compact cutting elements and earth-boring tools including polycrystalline diamond cutting elements
#814Methods and apparatus for depositing a cobalt layer using a carousel batch deposition reactor
#815Bottom-up PEALD proces
#816Carbon nanotube sponge and method for making the same
#817Method for the production of a curved ceramic sound attenuation panel
#818Liner and barrier applications for subtractive metal integration
#819Method for making microstructure on substrate
#820Plasma process chambers employing distribution grids having focusing surfaces thereon enabling angled fluxes to reach a substrate, and related methods
#821Apparatus and method for intraluminal polymer deposition
#822Fluid ejection chip including hydrophilic and hydrophopic surfaces and methods of forming the same
#823Coating apparatus for resin container, and resin container manufacturing system
#824Depositing material into high aspect ratio structures
#825Superhydrophobic compositions and coating process for the internal surface of tubular structures
#826Apparatus and method for carrying out a plasma deposition process
#827Controlling the uniformity of PECVD deposition on medical syringes, cartridges, and the like
#828Methods of preparing tungsten and tungsten nitride thin films using tungsten chloride precursor
#829MAGNETIC MATERIAL AND METHOD THEREFOR
#830Method and system for controlling coating in non-line-of-sight locations
#831Conformal deposition of silicon carbide films
#832Methods for forming metal organic tungsten for middle of the line (MOL) applications
#833Resin container coating device
#834Trilayer coated pharmaceutical packaging with low oxygen transmission rate
#835Deposition of boron and carbon containing materials
#836Method for producing ultra-thin tungsten layers with improved step coverage
#837Thin film forming method
#838Capped ALD films for doping fin-shaped channel regions of 3-D IC transistors
#839Plasma assisted atomic layer deposition titanium oxide for conformal encapsulation and gapfill applications
#840AIRCRAFT BRAKE DISC AND METHOD FOR MAKING THE SAME
#841Method for making aircraft brake disc
#842Hermetic CVD-cap with improved step coverage in high aspect ratio structures
#843Method for etching organic film
#844Integration of ALD barrier layer and CVD Ru liner for void-free Cu filling
#845Chemical vapour infiltration apparatus having a high loading capacity
#846Selective deposition of metals, metal oxides, and dielectrics
#847Torch system for depositing protective coatings on interior walls and recesses present on the flat surface of an object
#848Plasma activated conformal dielectric film deposition
#849Methods for forming a cobalt-ruthenium liner layer for interconnect structures
#850Coating system and method for coating interior fluid wetted surfaces of a component of a semiconductor substrate processing apparatus
#851Method for depositing extremely low resistivity tungsten
#852Method of forming a pattern and substrate processing system
#853Method for manufacturing heat-resistant composite material
#854Loader device and an installation for densifying stackable frustoconical porous preforms
#855Chemical vapor infiltration apparatus and process
#856Optical device and manufacture thereof
#857Shaped composite material
#858Methods for preferential growth of cobalt within substrate features
#859Components with an atomic layer deposition coating and methods of producing the same
#860Low-k dielectric damage repair by vapor-phase chemical exposure
#861Deposition of boron and carbon containing materials
#862Deposition of boron and carbon containing materials
#863Method and system for three-dimensional (3D) structure fill
#864Plating method, plating system and storage medium
#865Optimized method for fabricating patterns of III-V semiconductor material on a semiconductor substrate
#866Device for loading porous substrates of three-dimensional shape in order to be densified by directed flow chemical vapor infiltration
#867Tungsten feature fill
#868Tungsten deposition with tungsten hexafluoride (WF6) etchback
#869Method and apparatus for forming silicon film
#870Silicon film forming method, thin film forming method and cross-sectional shape control method
#871Metal-dielectric-CNT nanowires for surface-enhanced Raman spectroscopy
#872Metallated metal-organic frameworks
#873Method for manufacturing semiconductor device for forming metal element-containing layer on insulating layer in which concave portion is formed, semiconductor device including insulating layer in which concave portion is formed, and semiconductor layer on insulating layer in which concave portion is formed
#874Passivation, pH protective or lubricity coating for pharmaceutical package, coating process and apparatus
#875Substrate processing method and control apparatus
#876Suspended Thin Films on Low-Stress Carbon Nanotube Support Structures
#877Apparatus for forming thin film
#878Method for forming film by plasma-assisted deposition using two-frequency combined pulsed RF power
#879Film deposition method
#880Film-forming method of an osmium film
#881Pipe Centralizer Having Low-Friction Coating
#882Apparatus and method for transporting a vessel to and from a PECVD processing station
#883Ruthenium film formation method and storage medium
#884Method for preparing a coating for protecting a part against oxidation
#885PEALD of films comprising silicon nitride
#886Trilayer coated pharmaceutical packaging
#887Method for fabricating semiconductor device
#888Method and system for plasma-assisted ion beam processing
#889Multiple anode plasma for CVD in a hollow article
#890ALD reactor for coating porous substrates
#891Plasma activated conformal dielectric film deposition
#892Plasma activated conformal film deposition
#893Low tempature tungsten film deposition for small critical dimension contacts and interconnects
#894Tungsten deposition process using germanium-containing reducing agent
#895Method and apparatus capable of synthesizing high-density wires in pores and on surface of porous material
#896Controlling the uniformity of PECVD deposition
#897Conformal film deposition for gapfill
#898Plasma enhanced atomic layer deposition with pulsed plasma exposure
#899Gapfill of variable aspect ratio features with a composite PEALD and PECVD method
#900Method for the plasma treatment of workpieces and workpiece with a gas barrier layer