C30B31/16 - CPC Classification Index

ClassID:

121367 ⎘

C30B31/16 - CPC Classification

Classification description:

Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state Feed and outlet means for the gases; Modifying the flow of the gases

Sub-classes:

C30B31/165 » {Diffusion sources} 2

Recent Application in this class:

20180266017

Substrate treating apparatus

20170268128

System based on low-pressure chemical vapor deposition for fabricating perovskite film from organic halide compound and metal halide compound

20170081761

Atomic layer deposition method

20160068956

Inject insert for EPI chamber

20150275369

Gas supply pipe, and gas treatment equipment

20140154414

Atomic layer deposition apparatus and method

20130025539

Device for doping, deposition or oxidation of semiconductor material at low pressure

20080295963

Gas supply system and gas supply accumulation unit of semiconductor manufacturing apparatus

20080292430

DEVICE FOR DOPING, DEPOSITION OR OXIDATION OF SEMICONDUCTOR MATERIAL AT LOW PRESSURE

20080038524

Selective Doping of a Material

20070231757

Thermal processing furnace, gas delivery system therefor, and methods for delivering a process gas thereto

20070218290

Method for Doping Material and Doped Material