176982 ⎘
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Photosensitive materials; Azides; Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides
PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN
#2Photoresist composition and method of forming photoresist pattern
#3PATTERN FORMING METHOD, RESIST MATERIAL, AND PATTERN FORMING APPARATUS
#4Photoresist composition and method of forming photoresist pattern
#5Heat-sensitive recording material
#6Photosensitive compositions, color filter and microlens derived therefrom
#7Resist composition, method of forming resist pattern, compound, and acid generator
#8Curable composition for permanent resist films, and permanent resist film
#9Method for direct photopatterning of molecules on surfaces
#10Photosensitive compound, photosensitive resin, and photosensitive composition
#11Benzocyclobutene based polymer formulations and methods for processing such formulations in oxidative environments
#12Photo-sensitive composition