Composition for forming underlayer and method for forming underlayer therewith

Film, film forming method, solid image pickup element, and infrared sensor

Photoacid generator and photoresist composition including the same

COMPOUND, RESIN, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, COMPOSITION FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, RESIST PATTERN FORMING METHOD, CIRCUIT PATTERN FORMING METHOD, AND PURIFICATION METHOD OF COMPOUND OR RESIN

PATTERN FORMING METHOD, RESIST PATTERN, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND COMPOSITION FOR FORMING UPPER LAYER FILM

Resist underlayer film composition, patterning process, method for forming resist underlayer film, and compound for resist underlayer film composition

Low temperature SC1 strippable oxysilane-containing coatings

Patterned stamp manufacturing method, patterned stamp and imprinting method

Composition for forming upper layer film, pattern forming method, resist pattern, and method for manufacturing electronic device

Composition for forming silicon-containing resist underlayer film removable by wet process

Transfer film, electrode protective film for electrostatic capacitance-type input device, laminate, method for manufacturing laminate, and electrostatic capacitance-type input device

RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD

Method for manufacturing conductive pattern forming member

Photosensitive resin composition, and film and printed circuit board using same

Composition for manufacturing semiconductor device and method of manufacturing semiconductor device using the composition

COMPOSITION FOR FORMING UPPER LAYER FILM, PATTERN FORMING METHOD USING THE SAME, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

Compound, resin, material for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and purification method

Underlying absorbing or conducting layer for Ebeam direct write (EBDW) lithography

Method for fine line manufacturing

Nanoimprint lithography adhesion layer

Phenolic hydroxyl-containing compound, composition containing the same, and cured film of the composition

Critical dimension control by use of photo-sensitized chemicals or photo-sensitized chemically amplified resist

Resist pattern-forming method

Photosensitive resin composition, planographic printing plate precursor, method for producing planographic printing plate, and polymer compound

Resist underlayer film forming composition for lithography containing hydrolyzable silane having halogen-containing carboxylic acid amide group

Lithographic printing plate precursor, method of producing same, and printing method using same

Resist underlayer film-forming composition containing polymer having arylene group

Carboxylic acid onium salt, chemically amplified resist composition, and pattern forming process

Substrate for display, color filter using the same and method for the production thereof, organic EL element and method for the production thereof, and flexible organic EL display

Method for forming organic film and method for manufacturing substrate for semiconductor apparatus

Methods and apparatuses for directed self-assembly

Method for producing electrical wiring member and electrical wiring member

Process for producing structured coatings

Monomer, polymer, resist composition, and patterning process

Coating liquid for resist pattern coating

Composition for forming touch panel electrode protective film, transfer film, transparent laminate, protective film for touch panel electrode and method for forming same, capacitive input device, and image display device

Coating compositions for photolithography

Fluorine-containing composition, substrate for pattern formation, photodegradable coupling agent, pattern formation method and transistor production method

Mask blank, method for manufacturing mask blank and transfer mask

Coating compositions for use with an overcoated photoresist

Substrate treating method

Material composition and methods thereof

All solution-process and product for transparent conducting film

Photosensitive resin composition, photosensitive element, method for producing substrate with resist pattern, and method for producing printed wiring board

Pre-patterned lithography templates, processes based on radiation patterning using the templates and processes to form the templates

Lithography patterning with a gas phase resist

Pattern trimming compositions and methods

DRY FILM STRUCTURE

Positive photosensitive resin composition, photo-curable dry film and method for producing the same, patterning process, and laminate

Composition for base, and directed self-assembly lithography method

Positive resist composition and pattern forming process

Block polyimide, block polyamide acid imide and use thereof

Photomask structure with an etch stop layer that enables repairs of detected defects therein and extreme ultraviolet(EUV) photolithograpy methods using the photomask structure

WATERLESS PRINTING PLATE PRECURSOR, AND METHOD FOR MANUFACTURING PRINTED MATTER USING WATERLESS PRINTING PLATE

Resist underlayer film-forming composition containing novolac resin reacted with aromatic methylol compound

Composition for forming underlayer film for lithography, underlayer film for lithography and pattern forming method

Resin composition for forming color filter underlayer film

SURFACE-MODIFIED STRUCTURE AND MODIFYING METHOD THEREOF

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE FILM, PATTERN SUBSTRATE, PHOTOSENSITIVE CONDUCTIVE FILM, AND CONDUCTIVE PATTERN SUBSTRATE

Advanced cross-linkable layer over a substrate

Exposure activated chemically amplified directed self-assembly (DSA) for back end of line (BEOL) pattern cutting and plugging

Composition for forming a resist upper-layer film and method for producing a semiconductor device using the composition

Method for manufacturing master, transfer copy, and replica master

Pattern forming method, resist pattern, and process for producing electronic device

PATTERN FORMING METHOD, RESIST PATTERN, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

Methods of forming patterns using compositions for an underlayer of photoresist

Pattern forming method, etching method and method for producing capacitance-type input device

Planographic printing plate precursor, method of producing same, and printing method using same

Methods and techniques to use with photosensitized chemically amplified resist chemicals and processes

Planographic printing plate precursor, method of producing same, and printing method using same

Pattern forming method, resist pattern, and method for manufacturing electronic device

PATTERN FORMING METHOD, COMPOSITION FOR FORMING UPPER LAYER FILM, RESIST PATTERN, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

Pattern forming method and manufacturing method of semiconductor device

Resist composition, pattern forming process, polymer, and monomer

Pattern forming method, composition for forming protective film, method for manufacturing electronic device, and electronic device

Polymer, organic layer composition, and method of forming patterns

Materials containing metal oxides, processes for making same, and processes for using same

Photosensitive resin composition, planographic printing plate precursor, method for producing planographic printing plate, and polymer compound

Pattern treatment methods

Photosensitive material and method of lithography

Silicon-containing resist underlayer film-forming composition having halogenated sulfonylalkyl group

Mask blank with resist film and method for manufacturing the same and method for manufacturing transfer mask

Spacer wafer for wafer-level camera and method for manufacturing same

Resin composition for flattened film or microlens

UPPER LAYER-FORMING COMPOSITION AND RESIST PATTERNING METHOD

Method for preparing graphene/PEDOT:PSS solution and method for preparing substrate having graphene/PEDOT:PSS composite transparent conductive film

Silicon-containing condensate, composition for forming a silicon-containing resist under layer film, and patterning process

Method for forming resist pattern, method for manufacturing printed wiring board, photosensitive resin composition for projection exposure and photosensitive element

Silicon-containing resist underlayer film-forming composition having organic group having aliphatic polycyclic structure

Resist underlayer film-forming composition

PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING SAME

Resin composition for underlayer film formation, layered product, method for forming pattern, imprint forming kit and process for producing device

Silicon-containing resists underlayer film-forming composition having phenyl group-containing chromophore

Coloring composition, cured film, color filter, method of manufacturing color filter, solid image pickup element, and image display apparatus

Material for forming film for lithography, composition for forming film for lithography, film for lithography, pattern forming method and purification method

Ordering block copolymers

PHOTOSENSITIVE REFRACTIVE INDEX-ADJUSTING TRANSFER FILM

COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER FILM, AND PRODUCTION METHOD OF PATTERNED SUBSTRATE

Phenolic hydroxyl group-containing resin, production method therefor, photosensitive composition, resist material, coating film, curable composition and cured product thereof, and resist underlayer film

Acid diffusion control agent, radiation-sensitive resin composition, resist pattern-forming method, compound, and production method

METHOD FOR PERFORATING CARBON NANOMATERIAL AND METHOD FOR PRODUCING FILTER MOLDED ARTICLE

Coating compositions for use with an overcoated photoresist

Block copolymers and pattern treatment compositions and methods

Color developing composition, lithographic printing plate precursor, plate making method for lithographic printing plate, and color developer

Thermal acid generators and photoresist pattern trimming compositions and methods

Stripper composition for removing photoresists and method for stripping photoresists using the same

Method of producing layer structure, and method of forming patterns

Resin composition, resist pattern-forming method and polymer

DISPERSION COMPOSITION, CURABLE COMPOSITION USING THE SAME, TRANSPARENT FILM, MICROLENS AND SOLID-STATE IMAGING DEVICE

(Ethylene, vinyl acetal) copolymers and their use in lithographic printing plate precursors

Polymer, organic layer composition, and method of forming patterns

Additive and resist underlayer film-forming composition containing the same

Coating compositions suitable for use with an overcoated photoresist

RESIST PATTERNING METHOD, LATENT RESIST IMAGE FORMING DEVICE, AND RESIST MATERIAL

Resist underlayer film-forming composition containing novolac resin to which aromatic vinyl compound is added

Method for producing polymer

Top-layer membrane formation composition and method for forming resist pattern using same

Overcoat compositions and methods for photolithography

BASE FILM-FORMING COMPOSITION, AND DIRECTED SELF-ASSEMBLY LITHOGRAPHY METHOD

Pattern forming method

Resist pattern-forming method

A METHOD FOR MAKING A LITHOGRAPHIC PRINTING PLATE PRECURSOR

Photopolymer composition for holographic recording

Self-organization material and pattern formation method

Composition for forming liquid immersion upper layer film, and polymer

Compound, resin, material for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and method for purifying the compound or resin

Composition for manufacturing semiconductor device and method of manufacturing semiconductor device using the composition

Coating composition for use with an overcoated photoresist

Resist underlayer film-forming composition and method for forming resist pattern using the same

Resist underlayer film-forming composition for lithography containing polymer having acrylamide structure and acrylic acid ester structure

Resist underlayer film-forming composition for lithography containing polymer having blocked isocyanate structure

Resist underlayer film-forming composition containing copolymer that has triazine ring and sulfur atom in main chain

Block copolymer and associated photoresist composition and method of forming an electronic device

Resist underlayer film composition, patterning process, and compound

Composition for forming resist underlayer film and patterning process

Polymer for preparing resist underlayer film, resist underlayer film composition containing the polymer and method for manufacturing semiconductor device using the composition

Polymer for preparing resist underlayer film, resist underlayer film composition containing the polymer and method for manufacturing semiconductor device using the composition

Resist overlayer film forming composition and method for producing semiconductor device including the same

Photoresist composition for extreme ultraviolet and method of forming photoresist pattern using the same

Monomer, organic layer composition, organic layer, and method of forming patterns

Pattern-forming method, resin, and composition

Elastomer-Assisted Manufacturing

Methods of forming a mask for substrate patterning

Photoresist composition, compound, and production method thereof

Method for manufacturing laminated resin black-matrix substrate

Polymer with a good heat resistance and storage stability, underlayer film composition containing the polymer and process for forming underlayer film using the composition

Polymer-containing coating liquid applied to resist pattern

Patterning process

Polymer, organic layer composition, organic layer, and method of forming patterns

Electron beam resist underlayer film-forming composition containing lactone-structure-containing polymer

Methods of forming patterns using photoresists

Resist under layer film composition and patterning process

Compositions and methods for pattern treatment

Compositions and methods for pattern treatment

Pattern treatment methods

Method for imparting water repellency to surface of member

Organic layer composition and method of forming patterns

Imaging on substrates with alkaline strippable UV blocking compositions and aqueous soluble UV transparent films

Composition and method of forming pattern using composition

Resin laminate and relief printing original plate

Film forming composition containing fluorine-containing surfactant

Active light sensitive or radiation sensitive resin composition, pattern forming method, method for manufacturing electronic device, and electronic device

Resist under layer film composition and patterning process

Organic film composition, process for forming organic film, patterning process, and compound

LITHOGRAPHY STACK AND METHOD

PHOTORESIST TOPCOAT COMPOSITIONS AND METHODS OF PROCESSING PHOTORESIST COMPOSITIONS

Pattern forming method, treating agent, electronic device, and method for manufacturing the same

Positive resist composition and patterning process

Resist underlayer film-forming composition containing novolac polymer having secondary amino group

Infrared-sensitive color developing composition, lithographic printing plate precursor, plate making method for lithographic printing plate, and infrared-sensitive color developer

Resist underlayer film forming composition for lithography containing polyether structure-containing resin

Overcoat compositions and methods for photolithography

Resist composition and patterning process

Onium salt, resist composition, and patterning process

Method for producing composition for forming coating film for lithography and patterning process

Method for film formation, and pattern-forming method

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, method for manufacturing electronic device, and electronic device

Photosensitive polyimide compositions

Polymer for preparing resist underlayer film, resist underlayer film composition containing the polymer and method for forming resist underlayer film using the composition

Organic layer composition, organic layer, and method of forming patterns

Negative resist pattern-forming method, and composition for upper layer film formation

Photomask blank, resist pattern forming process, and method for making photomask

Organic layer composition, organic layer, and method of forming patterns

Hardmask composition and method of forming pattern using the hardmask composition

Laminated structure

Photosensitive transfer material, pattern formation method, and etching method

Polymer for resist under layer film composition, resist under layer film composition, and patterning process

Hardmask composition and method of forming pattern using the same

Spin-on layer for directed self assembly with tunable neutrality

Mask blank and transfer mask

Substrate comprising an electrical circuit pattern, method and system for providing same

Method of forming resist pattern

Polymers for hard masks, hard mask compositions including the same, and methods for forming a pattern of a semiconductor device using a hard mask composition

Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, method for manufacturing electronic device, and electronic device

Composition for forming a resist underlayer film, and pattern-forming method

Photoresist and method of formation and use

COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER FILM, AND PRODUCTION METHOD OF PATTERNED SUBSTRATE

Lithographic resist with floating protectant

Metal-containing resist underlayer film-forming composition containing polyacid

Laminate, kit for manufacturing organic semiconductor, and resist composition for manufacturing organic semiconductor

Methods of forming patterns

High-sensitivity multilayer resist film and method of increasing photosensitivity of resist film

Resist underlayer film formation composition and method for forming resist pattern using the same

Photoresist additive for outgassing reduction and out-of-band radiation absorption

Polymer, organic layer composition, organic layer, and method of forming patterns

Metal hardmask composition and processes for forming fine patterns on semiconductor substrates

Silicon-containing polymer, silicon-containing compound, composition for forming a resist under layer film, and patterning process

Coating compositions for photolithography

Conductive polymer composition, coated article, patterning process and substrate

ACTIVE LIGHTRAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD

Polymer and composition including same, and adhesive composition

Composition for forming underlayer film of self-assembled film including aliphatic polycyclic structure

Semiconductor device and method of manufacturing the same

Aromatic resins for underlayers

Hard mask composition for spin-coating

Radiation-sensitive resin composition and resist pattern-forming method

Polymer and composition containing same

Coating compositions for use with an overcoated photoresist

COMPOSITION AND PATTERN-FORMING METHOD

RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD AND POLYMER

PECVD films for EUV lithography

Laminate body

Photosensitive resin composition for projection exposure, photosensitive element, method for forming resist pattern, process for producing printed wiring board and process for producing lead frame

Shrink material and pattern forming process

Compound containing phenolic hydroxy group, photosensitive composition, composition for resists, resist coating film, curable composition, composition for resist underlayer films, and resist underlayer film

Anti-reflective layer and method

Method for manufacturing semiconductor device

Rinse solution for pattern formation and pattern forming process

Rinse solution for pattern formation and pattern forming process

Polyether compound, method for preparing same and photoresist composition

Pattern formation method, pattern, and etching method, electronic device manufacturing method, and electronic device using same

Additive for resist underlayer film-forming composition and resist underlayer film-forming composition containing the same

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTANING PYRROLE NOVOLAC RESIN

Positive resist composition and patterning process

Forming conductive metal patterns using thiosulfate copolymers

Resist underlayer film-forming composition containing substituted crosslinkable compound

Photoresist overcoat compositions and methods of forming electronic devices

TOPCOAT COMPOSITIONS AND PHOTOLITHOGRAPHIC METHODS

Pattern forming process and shrink agent

Photoresist overcoat compositions

Method for forming resist film and charged particle beam writing method

UPPER LAYER-FORMING COMPOSITION AND RESIST PATTERNING METHOD

Photoresist compositions and methods of forming photolithographic patterns

Photosensitive material and method of lithography

Silicone skeleton-containing polymer compound and method for producing same, chemically amplified negative resist composition, photo-curable dry film and method for producing same, patterning process, layered product, and substrate

Composition for forming a coating type BPSG film, substrate, and patterning process

Composition for forming a coating type silicon-containing film, substrate, and patterning process

Conductive polymer composition, coated article, patterning process, and substrate

Method for forming resist pattern, resist pattern splitting agent, split pattern improving agent, resist pattern splitting material, and positive resist composition for forming split pattern

Polymer, organic layer composition, organic layer, and method of forming patterns

Composition for film formation, resist underlayer film and forming method thereof, pattern-forming method and compound

Methods of forming patterns

Photosensitive element, photosensitive element roll, method for producing resist pattern, and electronic component

Chemically amplified positive resist dry film, dry film laminate and method of preparing laminate

High resolution, solvent resistant, thin elastomeric printing plates

Photoresist with top-coating photo-decomposable base for photolithography

Method for producing a composition for forming an organic film

Sulfonamide-containing topcoat and photoresist additive compositions and methods of use

Ultraviolet absorber, composition for forming a resist under layer film, and patterning process

Pattern forming method, composition kit and resist film, manufacturing method of electronic device using these, and electronic device

Pattern forming method and manufacturing method of semiconductor device

Resist underlayer composition, method of forming patterns, and semiconductor integrated circuit device including the pattern

Photolithographic methods

Silicone structure-bearing polymer, negative resist composition, photo-curable dry film, patterning process, and electric/electronic part-protecting film

Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process

Hardmask composition and method of forming patterning by using the hardmask composition

Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process

Pattern forming method, composition kit and resist film, and method for producing electronic device using them, and electronic device

Hardmask composition and method of forming patterns using the hardmask composition

Resins for underlayers

Photoresist layer and method

Method of manufacturing substrate and substrate and mask film

Composition, method for producing patterned substrate, film and forming method thereof, and compound

Hardmask composition and method of forming pattern using the hardmask composition

Composition for forming topcoat layer and resist pattern formation method employing the same

Composition for forming fine resist pattern, and pattern formation method using same

Under layer film-forming composition for imprints and method for forming pattern

Method of forming patterns

Photoresist and method of manufacture

Composition for forming resist protection film for lithography and method for forming pattern of semiconductor device using the same

Photo acid generator, chemically amplified resist composition, and patterning process

Functional film

Photosensitive dry film and process for producing printed wiring board using the same

Resist underlayer film-forming composition containing aryl sulfonate salt having hydroxyl group

Compositions for controlled assembly and improved ordering of silicon-containing block copolymers

Compound, material for forming underlayer film for lithography, underlayer film for lithography and pattern forming method

Compound, material for forming underlayer film for lithography, underlayer film for lithography and pattern forming method

Pattern forming method, electron beam- or extreme ultraviolet-sensitive resin composition, resist film using the same, method of manufacturing electronic device, and electronic device

Positive photosensitive resin composition, photo-curable dry film and method for producing same, layered product, patterning process, and substrate

Aromatic resins for underlayers

Inorganic film-forming composition for multilayer resist processes, and pattern-forming method

Resist underlayer film-forming composition

Monomer, hardmask composition comprising monomer, and pattern forming method using hardmask composition

COMPOSITION FOR SILICON-CONTAINING FILM FORMATION, PATTERN-FORMING METHOD, AND POLYSILOXANE COMPOUND

Photoresist comprising nitrogen-containing compound

Imaging on substrates with aqueous alkaline soluble UV blocking compositions and aqueous soluble UV transparent films

Pattern forming process and shrink agent

Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, pattern forming method, process for manufacturing electronic device and electronic device

Resist underlayer film-forming composition

Composition for forming overlay film, and resist pattern formation method employing the same