177043 ⎘
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
Printing form precursor having elastomeric cap layer and a method of preparing a printing form from the precursor
#1202Topcoat compositions and photolithographic methods
#1203Composition for forming silicon-containing resist underlayer film having cyclic diester group
#1204Resist underlayer film-forming composition comprising carbonyl-containing polyhydroxy aromatic ring novolac resin
#1205Method of preparing and using photosensitive material
#1206Aromatic resins for underlayers
#1207PHOTORESIST COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID DIFFUSION CONTROL AGENT, AND COMPOUND
#1208Monomer, hard mask composition comprising said monomer, and method for forming pattern using said hard mask composition
#1209Monomer for hardmask composition, hardmask composition including said monomer, and method for forming pattern using said hardmask composition
#1210Method of producing structure containing phase-separated structure and method of forming top coat film
#1211Process for manufacturing resist composition and patterning process
#1212SUBSTRATE FOR HIGH-RESOLUTION ELECTRONIC LITHOGRAPHY AND CORRESPONDING LITHOGRAPHY METHOD
#1213Monomer, hardmask composition including monomer, and method for forming pattern by using hardmask composition
#1214Monomer for hardmask composition, hardmask composition including the monomer, and method of forming patterns using the hardmask composition
#1215Method of forming pattern and laminate
#1216Ordering block copolymers
#1217Pattern forming method, resist pattern formed by the method, method for manufacturing electronic device using the same, and electronic device
#1218Composition for forming fine resist pattern and pattern formation method using same
#1219Resist underlayer film forming composition containing silicon containing cyclic organic group having hetero atom
#1220Resist overlayer film forming composition for lithography and method for manufacturing semiconductor device using the same
#1221Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic device
#1222Chemical amplification methods and techniques for developable bottom anti-reflective coatings and dyed implant resists
#1223DOUBLE COATED NEGATIVE-WORKING DRY-FILM PHOTORESIST
#1224Photosensitive Resin Laminate for Flexographic Plate with Infrared Ablation Layer
#1225Resist top-coat composition and patterning process
#1226Resin composition for forming protective film, protective film, pattern forming method, method for manufacturing electronic device, and electronic device
#1227Photosensitive transfer material, pattern formation method, and etching method
#1228Resist underlayer film forming composition
#1229Ionic thermal acid generators for low temperature applications
#1230Silicon-containing EUV resist underlayer film-forming composition containing onium sulfonate
#1231Method of producing structure containing phase-separated structure, method of forming pattern and method of forming fine pattern
#1232Photo-curable and thermo-curable resin composition and dry film solder resist
#1233LITHOGRAPHIC PRINTING PLATE PRECURSOR AND PLATE MAKING METHOD
#1234Composition for forming resist underlayer film
#1235Method of manufacturing semiconductor device using organic underlayer film forming composition for solvent development lithography process
#1236Hardmask composition and method of forming patterns using the hardmask composition
#1237Base film-forming composition, and directed self-assembly lithography method
#1238Method of using a vaporizing spray system to perform a trimming process
#1239Photolithographic methods
#1240Composition for forming a resist underlayer film, and pattern-forming method
#1241Resist underlayer film forming composition that contains novolac resin having polynuclear phenol
#1242Pattern-forming method, and radiation-sensitive composition
#1243Resist film and method of forming pattern
#1244Lithographic printing plate precusor
#1245Pattern forming method, method for manufacturing electronic device, and electronic device
#1246Pattern forming method, and, method for producing electronic device and electronic device, each using the same
#1247Photoresist overcoat compositions and methods of forming electronic devices
#1248Curable composition and patterning method using the same
#1249Composition for forming topcoat layer and resist pattern formation method employing the same
#1250Electroless plating method using non-reducing agent
#1251Electroless plating method using halide
#1252Actinic ray-sensitive or radiation-sensitive resin composition, resist film, using the same, pattern forming method, manufacturing method of electronic device, and electronic device
#1253Pattern forming method, and, electronic device producing method and electronic device, each using the same
#1254Forming conductive metal pattern using reactive polymers
#1255Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, manufacturing method of electronic device, and electronic device
#1256Composition for forming resist underlayer
#1257Method for manufacturing semiconductor device
#1258Pattern forming method and actinic ray-sensitive or radiation-sensitive resin composition for use in the method
#1259Resist composition and patterning process
#1260Composition for forming resist underlayer film for nanoimprint
#1261Composition for forming a silicon-containing resist under layer film and patterning process
#1262Mask forming imageable material and use
#1263Radiation-sensitive resin composition and resist pattern-forming method
#1264Resist underlayer film-forming composition
#1265Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, and electronic device
#1266Coating compositions
#1267Photoresist and method of formation and use
#1268Polymer compound, chemically amplified negative resist composition, photo-curable dry film and production method thereof, layered product, patterning process, and substrate
#1269Developable bottom antireflective coating composition and pattern forming method using thereof
#1270Method for forming pattern, and polysiloxane composition
#1271Method of forming patterns
#1272Lithographic printing plate precursors and processes for preparing lithographic printing plates
#1273ACIDIC TREATMENT-SUBJECTED MONOALKYLNAPHTHALENE FORMALDEHYDE RESIN
#1274Composition for forming highly adhesive resist underlayer film
#1275Resist top coat composition and patterning process
#1276Photoimageable compositions and processes for fabrication of relief patterns on low surface energy substrates
#1277Film-forming composition and ion implantation method
#1278Composition for forming fine resist pattern and pattern forming method using same
#1279Resist underlayer film-forming composition containing copolymer resin having heterocyclic ring
#1280Resist pattern-forming method and photoresist composition
#1281Meta-photoresist for lithography
#1282Composition for forming antistatic film and oligomer compound
#1283Monomer for hardmask composition, hardmask composition including monomer, and pattern forming method using hardmask composition
#1284Methods and structures for protecting one area while processing another area on a chip
#1285Composition for forming a coating type BPSG film, substrate formed a film by said composition, and patterning process using said composition
#1286Photoresist composition, compound, and production method thereof
#1287Photoresist composition, resist pattern-forming method, acid diffusion control agent, and compound
#1288Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same
#1289Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patterns
#1290Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition
#1291Method for manufacturing semiconductor device using silicon-containing resist underlayer film forming composition for solvent development
#1292Composition for forming liquid immersion upper layer film, resist pattern-forming method, polymer, and compound
#1293Pattern-forming method, and composition for forming resist underlayer film
#1294Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, photomask blank and method of forming pattern
#1295Underlayer film-forming composition and pattern forming process
#1296Underlayer film-forming composition and pattern forming process
#1297Underlayer film-forming composition and pattern forming process
#1298Underlayer film-forming composition and pattern forming process
#1299Photoresist composition, resist pattern-forming method, compound, acid generating agent, and photodegradable base
#1300Color-forming composition, color-forming curable composition, lithographic printing plate precursor and plate making method, and color-forming compound
#1301Composition for forming tungsten oxide film and method for producing tungsten oxide film using same
#1302Actinic-ray- or radiation-sensitive resin composition, actinic-ray-or radiation-sensitive film therefrom, method of forming pattern, process for manufacturing semiconductor device, semiconductor device and compound
#1303Manufacturing method of semiconductor device
#1304Radiation-sensitive resin composition, resist pattern-forming method, acid generator and compound
#1305Method for forming a resist under layer film and patterning process
#1306Underlayer composition and method of imaging underlayer composition
#1307Method for producing resist composition
#1308Phenol monomer, polymer for forming a resist underlayer film including same, and composition for a resist underlayer film including same
#1309Mask forming imageable material and use
#1310Method for improving print performance in flexographic printing plates
#1311Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, and electronic device
#1312Method of manufacturing graphene, carbon nanotubes, fullerene, graphite or a combination thereof having a position specifically regulated resistance
#1313Epoxy formulations and processes for fabrication of relief patterns on low surface energy substrates
#1314Compositions and processes for photolithography
#1315Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same
#1316Process for dry-coating flexographic surfaces
#1317Additive for resist underlayer film-forming composition and resist underlayer film-forming composition containing the same
#1318Actinic ray-sensitive or radiation-sensitive resin composition, and, resist film, pattern forming method, electronic device manufacturing method, and electronic device, each using the composition
#1319Anti-reflective layer and method
#1320Composition for forming titanium-containing resist underlayer film and patterning process
#1321Chemi-epitaxy in directed self-assembly applications using photo-decomposable agents
#1322Pattern-forming method
#1323Resist overlayer film forming composition for lithography
#1324Patterning process and resist composition
#1325Composition, resist pattern-forming method, compound, method for production of compound, and polymer
#1326Actinic ray- or radiation-sensitive resin composition, actinic ray- or radiation-sensitive film and method of forming pattern
#1327Semiconductor device structures comprising a polymer bonded to a base material and methods of fabrication
#1328Patterning process and resist composition
#1329Lithographic printing plate precursors and use
#1330Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, manufacturing method of electronic device, and electronic device
#1331Resist underlayer film-forming composition which contains alicyclic skeleton-containing carbazole resin
#1332Pattern forming process
#1333Photo resist (PR) profile control
#1334Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic device
#1335Silicon-containing EUV resist underlayer film forming composition
#1336Functional film, liquid immersion member, method of manufacturing liquid immersion member, exposure apparatus, and device manufacturing method
#1337Negative resist composition and pattern forming method using the same
#1338Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern
#1339Pattern forming method and manufacturing method of semiconductor device
#1340Pattern forming method
#1341Photolithographic methods
#1342Pattern forming method, electron beam-sensitive or extreme ultraviolet-sensitive composition, resist film, method for manufacturing electronic device using the same, and electronic device
#1343High resolution, solvent resistant, thin elastomeric printing plates
#1344Near-infrared absorbing film compositions
#1345Coating composition for DUV filtering, method of forming photoresist pattern using the same and method of fabricating semiconductor device by using the method
#1346Patterning process, resist composition, polymer, and monomer
#1347Phenolic resin and material for forming underlayer film for lithography
#1348Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition
#1349Radiation-sensitive resin composition, polymer, compound, and method for producing compound
#1350Hardmask composition and method of forming patterns and semiconductor integrated circuit device including the patterns
#1351METHOD FOR PRODUCING PLANOGRAPHIC PRINTING PLATE AND PLANOGRAPHIC PRINTING PLATE
#1352Resist underlayer film-forming composition for EUV lithography containing condensation polymer
#1353Polyimide precursor, polyimide, and coating solution for under layer film for image formation
#1354Lithographic printing plate precursors and processes for preparing lithographic printing plates
#1355Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device and electronic device
#1356Patterning process and chemical amplified photoresist composition
#1357Method of forming a photoresist pattern
#1358Composition for forming resist underlayer film for EUV lithography
#1359Composition for forming liquid immersion upper layer film, resist pattern-forming method, polymer, and compound
#1360Printing form precursor having indicia and a method for preparing a printing form from the precursor
#1361Resist protective film-forming composition and patterning process
#1362Lithographic printing plate precursor and plate making method thereof
#1363Resist composition and patterning process
#1364Resist composition and patterning process
#1365Resist composition and patterning process
#1366Positive-working lithographic printing plate precursor for infrared laser and process for making lithographic printing plate
#1367Negative-working lithographic printing plate precursors and use
#1368Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device and electronic device
#1369Polymer-containing developer
#1370Water-dispersible electrically conductive fluorine-containing polyaniline compositions for lithography
#1371Upper surface antireflective film forming composition and pattern forming method using same
#1372Multilayer resist process pattern-forming method and multilayer resist process inorganic film-forming composition
#1373Primer and pattern forming method for layer including block copolymer
#1374Resist pattern-forming method, resist pattern-forming radiation-sensitive resin composition, and resist film
#1375Lithography process and structures
#1376High resolution, solvent resistant, thin elastomeric printing plates
#1377Resin composition, resist underlayer film, resist underlayer film-forming method and pattern-forming method
#1378Lithographic printing plate precursor and method of preparing lithographic printing plate
#1379High resolution, solvent resistant, thin elastomeric printing plates
#1380Developable bottom antireflective coating composition and pattern forming method using thereof
#1381Lithographic printing plate precursors and processes for preparing lithographic printing plates
#1382Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process
#1383Norbornene-type polymers, compositions thereof and lithographic process using such compositions
#1384Photosensitive material and method of lithography
#1385Methods for forming resist features and arrays of aligned, elongate resist features
#1386Composition for forming resist underlayer film, containing silicon that bears diketone-structure-containing organic group
#1387Polyester film and photosensitive resin structure
#1388Coating and developing apparatus, coating film forming method, and storage medium storing program for performing the method
#1389Radiation-sensitive resin composition and compound
#1390Pattern-forming method, resist underlayer film, and composition for forming resist underlayer film
#1391Photoacid generating polymers containing a urethane linkage for lithography
#1392Printing form precursor having elastomeric cap layer and a method of preparing a printing form from the precursor
#1393Polymer compound, and resist-protecting film composition including same for a liquid immersion exposure process
#1394Photoresist overcoat compositions and methods of forming electronic devices
#1395Method for producing flexographic printing plates using UV-LED irradiation
#1396Composition for forming resist underlayer film, and pattern-forming method
#1397Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process
#1398Pattern-forming method, and radiation-sensitive composition
#1399Clean flexographic printing plate and method of making the same
#1400Pattern-forming method, and radiation-sensitive resin composition
#1401Composition for forming liquid immersion upper layer film, and polymer
#1402Composition for forming upper layer film for immersion exposure, upper layer film for immersion exposure, and method of forming photoresist pattern
#1403Liquid-repellent film and production method therefor, and fine structure using the liquid-repellent film and production method therefor
#1404Silicon-containing surface modifier, resist underlayer film composition containing this, and patterning process
#1405Silicon-containing surface modifier, resist lower layer film-forming composition containing the same, and patterning process
#1406Composition for forming resist overlayer film for EUV lithography
#1407Surface treatment agent and surface treatment method
#1408Resist underlayer coating forming composition for forming photo-crosslinking cured resist underlayer coating
#1409Polymerizable tertiary ester compound, polymer, resist composition, and patterning process
#1410Radiation-sensitive resin composition
#1411Resist underlayer film composition, method for producing polymer for resist underlayer film, and patterning process using the resist underlayer film composition
#1412Additive for resist and resist composition comprising same
#1413RESIN COMPOSITION, RESIST UNDERLAYER FILM, RESIST UNDERLAYER FILM-FORMING METHOD AND PATTERN-FORMING METHOD
#1414Chemically amplified negative resist composition, photo-curable dry film, making method, pattern forming process, and electric/electronic part protecting film
#1415Resist-protective film-forming composition and patterning process
#1416Resist-protective film-forming composition and patterning process
#1417Method of forming polymeric compound, resist composition and method of forming resist pattern
#1418Assist layers for EUV lithography
#1419Methods for adhering materials, for enhancing adhesion between materials, and for patterning materials, and related semiconductor device structures
#1420Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film
#1421Spacer Wafer For Wafer-Level Camera And Method For Manufacturing Same
#1422Methods of forming photolithographic patterns by negative tone development
#1423Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and method of forming pattern
#1424Topcoat compositions and photolithographic methods
#1425Patterning process and resist composition
#1426Method for forming resist pattern, and composition for forming resist underlayer film
#1427POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
#1428RADIATION-SENSITIVE RESIN COMPOSITION
#1429Resist top coat composition and patterning process
#1430Photoresist composition and resist pattern-forming method
#1431Resist underlayer film composition and patterning process using the same
#1432METHOD OF PRODUCING ORGANIC ELECTROLUMINESCENCE DISPLAY DEVICE
#1433COMPOSITION FOR FORMING LIQUID IMMERSION UPPER LAYER FILM AND METHOD FOR FORMING RESIST PATTERN
#1434Resist protective film-forming composition and patterning process
#1435Pattern forming method, electron beam-sensitive or extreme ultraviolet-sensitive composition, resist film, manufacturing method of electronic device, and electronic device
#1436Resist underlayer film forming composition containing silicon having anion group
#1437Radiation-sensitive resin composition, method for forming resist pattern, acid generating agent and compound
#1438PHOTORESIST COMPOSITION, METHOD FOR PRODUCING PHOTORESIST COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN
#1439Method of forming pattern and laminate
#1440Actinic ray-sensitive or radiation-sensitive resin composition, and, resist film, pattern forming method, electronic device manufacturing method, and electronic device, each using the same
#1441Actinic-ray-sensitive or radiation-sensitive resin composition, and resist film using the same, pattern forming method, electronic device manufacturing method, and electronic device, each using the same
#1442Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for preparing electronic device, and electronic device
#1443Actinic ray-sensitive or radiation-sensitive resin composition, and resist film, pattern forming method, method for preparing electronic device, and electronic device, each using the same
#1444RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
#1445Patterning process and resist composition
#1446PATTERNING PROCESS AND RESIST COMPOSITION
#1447Method for forming resist pattern and composition for forming protective film
#1448Manufacturing method of semiconductor device
#1449Lithographic printing plate precursors for on-press development
#1450Lithographic printing plate precursor and method of preparing lithographic printing plate using the same
#1451LITHOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD OF MANUFACTURING LITHOGRAPHIC PRINTING PLATE
#1452SOLUTION PROCESSED THIN FILMS AND LAMINATES, DEVICES COMPRISING SUCH THIN FILMS AND LAMINATES, AND METHOD FOR THEIR USE AND MANUFACTURE
#1453Aluminum substrates and lithographic printing plate precursors
#1454PHOTORESIST COMPOSITION AND METHOD OF FORMING A FINE PATTERN USING THE SAME
#1455Composition for forming a silicon-containing resist underlayer film and patterning process using the same
#1456Positive resist composition and patterning process
#1457POLYMER, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
#1458Pattern forming method and actinic-ray- or radiation-sensitive resin composition
#1459CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION FOR ArF IMMERSION LITHOGRAPHY AND PATTERN FORMING PROCESS
#1460PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PRODUCTION METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
#1461Semiconductor device manufacturing method and semiconductor device manufacturing apparatus
#1462POLYMER, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
#1463Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the same
#1464Patterning process and resist composition
#1465Compositions and processes for photolithography
#1466Lithographic printing plate precursor and method of producing thereof
#1467Polymerizable ester compound, polymer, resist composition, and patterning process
#1468Developer for processing lithographic printing plate precursor, method for manufacturing lithographic printing plate by using the developer, and printing method
#1469Coating compositions for use with an overcoated photoresist
#1470Making a microfluidic device with improved adhesion
#1471UNDER COAT FILM MATERIAL AND METHOD OF FORMING MULTILAYER RESIST PATTERN
#1472Coating compositions for use with an overcoated photoresist
#1473Actinic-ray-sensitive or radiation-sensitive resin composition, resist film and pattern forming method each using the composition, method for preparing electronic device, and electronic device
#1474Method of producing polymeric compound, resist composition, and method of forming resist pattern
#1475Patterning process and resist composition
#1476POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
#1477Photosensitive resin composition and circuit formation substrate using the same
#1478Pattern forming method and resist composition
#1479Salt, photoresist composition and method for producing photoresist pattern
#1480Polymer, chemically amplified resist composition, and patterning process using said chemically amplified resist composition
#1481Patterning process and resist composition
#1482Methods of making patterned structures of fluorine-containing polymeric materials and fluorine-containing polymers
#1483Shaping a Phase Change Layer in a Phase Change Memory Cell
#1484Radiation-sensitive resin composition
#1485Radiation-sensitive resin composition, polymer and method for forming a resist pattern
#1486Flexographic printing plate assembly
#1487RESIST COMPOSITION AND PATTERNING PROCESS
#1488COLOR FILTER SUBSTRATE CAPABLE OF POLARIZING AND MANUFACTURING METHOD THEREOF
#1489Pattern-forming method, and composition for forming resist underlayer film
#1490Photoresist underlayer composition and method of manufacturing semiconductor device by using the same
#1491Immersion upper layer film forming composition and method of forming photoresist pattern
#1492Patterning
#1493Patterning process
#1494Method of forming resist pattern and negative tone-development resist composition
#1495Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern using the composition
#1496RESIST UNDERLAYER COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICES USING THE SAME
#1497Resist underlayer composition and process of producing integrated circuit devices using the same
#1498Resist composition for negative development and method of forming resist pattern
#1499Method of making radiation-sensitive sol-gel materials
#1500Compositions and processes for photolithography