G03F9/7023 - CPC Classification Index

ClassID:

177256 ⎘

G03F9/7023 - CPC Classification

Classification description:

Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography; Alignment type or strategy, e.g. leveling, global alignment Aligning or positioning in direction perpendicular to substrate surface

Sub-classes:

G03F9/7026 » {Focusing} 358
G03F9/703 » {Gap setting, e.g. in proximity printer} 49
G03F9/7034 » {Leveling} 247

Recent Application in this class:

20260104652

2026-04-16

EXPOSURE METHOD AND EXPOSURE APPARATUS

20250271784

2025-08-28

COMBINATION OF INLINE METROLOGY AND ON TOOL METROLOGY FOR ADVANCED PACKAGING

20240201605

2024-06-20

COMBINATION OF INLINE METROLOGY AND ON TOOL METROLOGY FOR ADVANCED PACKAGING

20230236519

2023-07-27

LITHOGRAPHIC PRE-ALIGNMENT IMAGING SENSOR WITH BUILD-IN COAXIAL ILLUMINATION

20230185208

2023-06-15

MEASUREMENT APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD

20230168594

2023-06-01

Method of wafer alignment using at resolution metrology on product features

20230152089

2023-05-18

METHOD AND DEVICE FOR DETERMINING AN ALIGNMENT OF A PHOTOMASK ON A SAMPLE STAGE WHICH IS DISPLACEABLE ALONG AT LEAST ONE AXIS AND ROTATABLE ABOUT AT LEAST ONE AXIS

20230076566

2023-03-09

EXPOSURE METHOD AND EXPOSURE APPARATUS

20230049521

2023-02-16

IMPRINT APPARATUS AND METHOD OF MANUFACTURING ARTICLE

#10

20230024673

2023-01-26

Method for calibrating alignment of wafer and lithography system

#11

20220146927

2022-05-12

Tag coordinate determination method and apparatus, computer-readable medium and electronic device

#12

20220075282

2022-03-10

System and method for optimizing a lithography exposure process

#13

20210263432

2021-08-26

Position measurement apparatus, overlay inspection apparatus, position measurement method, imprint apparatus, and article manufacturing method

#14

20200379361

2020-12-03

Exposure method and exposure apparatus

#15

20200285159

2020-09-10

Imprint apparatus and method of manufacturing article

#16

20200272061

2020-08-27

Lithographic method

#17

20200241411

2020-07-30

Method in which alignment control of a member and a substrate is effected with respect to an in-plane direction of the substrate and an uncured material in a state of bringing a member and the uncured material on a substrate into contact

#18

20200233320

2020-07-23

System and method for optimizing a lithography exposure process

#19

20200081356

2020-03-12

Lithographic method

#20

20190384183

2019-12-19

Lens control for lithography tools

#21

20190294060

2019-09-26

Method of determining a height profile, a measurement system and a computer readable medium

#22

20190279889

2019-09-12

Position detection device, position detection method, imprint apparatus, and method for manufacturing article

#23

20190250524

2019-08-15

Alignment system and method

#24

20190146359

2019-05-16

Exposure apparatus and method of manufacturing article

#25

20190146351

2019-05-16

Exposure method and exposure apparatus

#26

20190129315

2019-05-02

Metrology apparatus, method of measuring a structure, device manufacturing method

#27

20190025711

2019-01-24

Light-spot distribution structure, surface shape measurement method, and method for calculating exposure field-of-view control value

#28

20190002657

2019-01-03

PROCESS FOR REDUCING DEFECTS IN AN ORDERED FILM OF BLOCK COPOLYMERS

#29

20180356733

2018-12-13

Imager for lithographic reproduction

#30

20180299786

2018-10-18

Condensing point position detecting method

#31

20180231900

2018-08-16

Lithographic apparatus and device manufacturing method

#32

20180074414

2018-03-15

Exposure apparatus and method of manufacturing article

#33

20180061627

2018-03-01

Encoder head with birefringent elements for forming imperfect retroreflection and exposure system utilizing the same

#34

20180011400

2018-01-11

Imprint method

#35

20170115560

2017-04-27

Imprinting apparatus for producing a member in which a mold contacts a pattern forming layer using alignment control in an in-plane direction of a substrate

#36

20160240420

2016-08-18

Device and method for aligning substrates

#37

20160211185

2016-07-21

Method of aligning substrate-scale mask with substrate

#38

20150042969

2015-02-12

Lithography apparatus, and article manufacturing method

#39

20140367875

2014-12-18

Imprint apparatus and method of manufacturing article

#40

20130329209

2013-12-12

Mask, exposure apparatus and device manufacturing method

#41

20130120733

2013-05-16

Position measurement apparatus and exposure apparatus which measure position of object using reference mark, and method of manufacturing device

#42

20120268725

2012-10-25

Lithography system for processing a target, such as a wafer, and a method for operating a lithography system for processing a target, such as a wafer

#43

20120268724

2012-10-25

Lithography system for processing a target, such as a wafer, a method for operating a lithography system for processing a target, such as a wafer and a substrate for use in such a lithography system

#44

20120086928

2012-04-12

Lithographic apparatus and device manufacturing method

#45

20100270705

2010-10-28

Imprinting method and process for producing a member in which a mold contacts a pattern forming layer

#46

20100141915

2010-06-10

Lithographic apparatus and device manufacturing method

#47

20100092882

2010-04-15

Exposure apparatus and device fabrication method

#48

20090170014

2009-07-02

Mask, exposure apparatus and device manufacturing method

#49

20090040484

2009-02-12

EXPOSURE EQUIPMENT, EXPOSURE METHOD, AND MANUFACTURING METHOD FOR A SEMICONDUCTOR DEVICE

#50

20090000354

2009-01-01

Method and system for operating an air gauge at programmable or constant standoff

#51

20070206168

2007-09-06

Systems and methods for determination of focus and telecentricity, amelioration of metrology induced effects and application to determination of precision bossung curves

#52