ClassID:

177258

G03F9/703 - CPC Classification

Classification description:

Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography; Alignment type or strategy, e.g. leveling, global alignment; Aligning or positioning in direction perpendicular to substrate surface Gap setting, e.g. in proximity printer

Recent Application in this class:
#1
20260118783
2026-04-30

GAP DETECTION SYSTEM AND METHOD, AND FOCAL PLANE CORRECTION METHOD

#2
20250207911
2025-06-26

DEPOSITION APPARATUS, MASK FOR DEPOSITION APPARATUS, AND METHOD OF MEASURING GAP BETWEEN MASK FOR DEPOSITION APPARATUS AND SUBSTRATE

#3
20200241411
2020-07-30

Method in which alignment control of a member and a substrate is effected with respect to an in-plane direction of the substrate and an uncured material in a state of bringing a member and the uncured material on a substrate into contact

#4
20190250507
2019-08-15

Imprint apparatus, imprint method, and article manufacturing method

#5
20190204138
2019-07-04

Adjustable load transmitter

#6
20190146259
2019-05-16

Substrate and preparation method therefor, and display panel

#7
20190025715
2019-01-24

Method and apparatus for adjusting exposure gap

#8
20190017861
2019-01-17

Adjustable load transmitter

#9
20180011400
2018-01-11

Imprint method

#10
20170115560
2017-04-27

Imprinting apparatus for producing a member in which a mold contacts a pattern forming layer using alignment control in an in-plane direction of a substrate

#11
20170023864
2017-01-26

Method and apparatus for exposure pattern correction and exposure system

#12
20160377995
2016-12-29

Device and method for positioning a photolithography mask by a contactless optical method

#13
20160223918
2016-08-04

Imprint apparatus, imprint method, and article manufacturing method

#14
20160061590
2016-03-03

Method for controlling a distance between two objects, inspection apparatus and method

#15
20150294890
2015-10-15

Chuck, in particular for use in a mask aligner

#16
20140367875
2014-12-18

Imprint apparatus and method of manufacturing article

#17
20130196016
2013-08-01

Imprint apparatus in which alignment control of a mold and a substrate is effected

#18
20130141704
2013-06-06

Microlens exposure system

#19
20120262719
2012-10-18

Plasmon tomography

#20
20120026486
2012-02-02

Non-contacting aligning method for planes in three-dimensional environment

#21
20120015289
2012-01-19

Alignment method and method for manufacturing flat panel display

#22
20110063627
2011-03-17

Plasmon tomography

#23
20100278954
2010-11-04

Method of Concurrently Patterning a Substrate Having a Plurality of Fields and a Plurality of Alignment Marks

#24
20100270705
2010-10-28

Imprinting method and process for producing a member in which a mold contacts a pattern forming layer

#25
20100195102
2010-08-05

Imprint lithography

#26
20100148397
2010-06-17

Imprinting machine and device manufacturing method

#27
20090283938
2009-11-19

Imprint apparatus, imprint method, and mold for imprint

#28
20090108483
2009-04-30

Alignment method, imprint method, alignment apparatus, and position measurement method

#29
20090101037
2009-04-23

GAP MEASURING METHOD, IMPRINT METHOD, AND IMPRINT APPARATUS

#30
20090068765
2009-03-12

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE

#31
20090051920
2009-02-26

Plasmon tomography

#32
20080099941
2008-05-01

Imprint apparatus, imprint method, and mold for imprint

#33
20070228610
2007-10-04

Method of concurrently patterning a substrate having a plurality of fields and a plurality of alignment marks

#34
20070212488
2007-09-13

Pattern transfer method and pattern transfer apparatus

#35
20070200276
2007-08-30

Method for rapid printing of near-field and imprint lithographic features

#36
20070190639
2007-08-16

Plasmon tomography

#37
20070190638
2007-08-16

Plasmon tomography

#38
20070172967
2007-07-26

Pattern forming method and pattern forming system

#39
20070146680
2007-06-28

Exposure apparatus, exposure method, and exposure mask

#40
20070127037
2007-06-07

Position sensor, method for detecting horizontal and vertical position, alignment apparatus including position sensor, and method for horizontal and vertical alignment

#41
20070115471
2007-05-24

WAFER, EXPOSURE MASK, METHOD OF DETECTING MARK AND METHOD OF EXPOSURE

#42
20070076843
2007-04-05

Method for adjusting gap between two objects and exposure method using the same, gap adjusting apparatus, and exposure apparatus

#43
20060286193
2006-12-21

Imprint device and microstructure transfer method

#44
20060193432
2006-08-31

Method for adjusting gap between two objects and exposure method using the same, gap adjusting apparatus, and exposure apparatus

#45
20060157444
2006-07-20

Imprinting machine and device manufacturing method

#46
20060145400
2006-07-06

Method and apparatus for direct referencing of top surface of workpiece during imprint lithography

#47
20060139643
2006-06-29

Alignment method of using alignment marks on wafer edge

#48
20060126058
2006-06-15

Interferometric analysis for the manufacture of nano-scale devices

#49
20060029867
2006-02-09

Device and method for controlling close contact of near-field exposure mask, and near-field exposure mask for the same

#50
20060001889
2006-01-05

Positioning apparatus and photolithography apparatus including the same

#51
20050105093
2005-05-19

Microprocessing apparatus, semiconductor device manufacturing apparatus, and device manufacturing method

#52
15858324
2018-09-25

Adjustable load transmitter

#53
15795313
2018-12-04

Adjustable load transmitter