Patents-Review.com
ClassID:

177264 ⎘

G03F9/7053 - CPC Classification

Classification description:

Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography; Technique, e.g. interferometric Non-optical, e.g. mechanical, capacitive, using an electron beam, acoustic or thermal waves

Sub-classes:
Recent Application in this class:
#1
20260050227
2026-02-19

ON TOOL METROLOGY SCHEME FOR ADVANCED PACKAGING

 #2
20240377763
2024-11-14

FIRST HOLDING APPARATUS, THIRD HOLDING APPARATUS, FIFTH HOLDING APPARATUS, TRANSPORT SYSTEM, EXPOSURE SYSTEM, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD

 #3
20210239654
2021-08-05

Sensor apparatus for lithographic measurements

 #4
20200348589
2020-11-05

Configuring optical layers in imprint lithography processes

 #5
20200142319
2020-05-07

Alignment measurement system

 #6
20190178641
2019-06-13

Distance sensor, alignment system and method

 #7
20180157170
2018-06-07

Configuring optical layers in imprint lithography processes

 #8
20150241767
2015-08-27

Mask manufacturing method, mask substrate, and charged beam drawing method

 #9
20140293250
2014-10-02

Focus control apparatus for photolithography

 #10
20140096614
2014-04-10

Gas gauge compatible with vacuum environments

 #11
20140049276
2014-02-20

Capacitive sensing system

 #12
20130065328
2013-03-14

Focus control method for photolithography

 #13
20130009626
2013-01-10

Current measurement system

 #14
20130003034
2013-01-03

Active shield for capacitive measurement system

 #15
20120292820
2012-11-22

METHOD AND DEVICE FOR NANOIMPRINT LITHOGRAPHY

 #16
20120268725
2012-10-25

Lithography system for processing a target, such as a wafer, and a method for operating a lithography system for processing a target, such as a wafer

 #17
20120268724
2012-10-25

Lithography system for processing a target, such as a wafer, a method for operating a lithography system for processing a target, such as a wafer and a substrate for use in such a lithography system

 #18
20120015289
2012-01-19

Alignment method and method for manufacturing flat panel display

 #19
20110310373
2011-12-22

Lithography apparatus and device manufacturing method

 #20
20110261344
2011-10-27

EXPOSURE METHOD

 #21
20110254565
2011-10-20

Capacitive sensing system with differential pairs

 #22
20110193574
2011-08-11

Capacitive sensing system

 #23
20110193573
2011-08-11

Integrated sensor system

 #24
20110042861
2011-02-24

METHODS AND APPARATUS OF FIELD-INDUCED PRESSURE IMPRINT LITHOGRAPHY

 #25
20110037488
2011-02-17

Flexural mechanism for passive angle alignment and locking

 #26
20110018173
2011-01-27

Imprint device and imprint method

 #27
20110014378
2011-01-20

LEVELING DEVICES AND METHODS

 #28
20100309445
2010-12-09

Gas gauge compatible with vacuum environments

 #29
20100233309
2010-09-16

RELEASE SURFACES, PARTICULARLY FOR USE IN NANOIMPRINT LITHOGRAPHY

 #30
20100118290
2010-05-13

Exposure device

 #31
20100116161
2010-05-13

High resolution flexural stage for in-plane position and out-of-plane pitch/roll alignment

 #32
20100109202
2010-05-06

Substrate alignment

 #33
20090316124
2009-12-24

Lithographic apparatus, device manufacturing method and device manufactured thereby

 #34
20090244511
2009-10-01

Electroactive polymers for lithography

 #35
20090242806
2009-10-01

Electroactive polymers for lithography

 #36
20090130573
2009-05-21

Multilayer active mask lithography

 #37
20090127723
2009-05-21

AIM-Compatible Targets for Use with Methods of Inspecting and Optionally Reworking Summed Photolithography Patterns Resulting from Plurally-Overlaid Patterning Steps During Mass Production of Semiconductor Devices

 #38
20090117475
2009-05-07

Multilayer active mask lithography

 #39
20080309950
2008-12-18

Calibrating a lithographic apparatus

 #40
20080265447
2008-10-30

METHOD OF INPRINTING PATTERNS AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE BY USING THE SAME

 #41
20080230947
2008-09-25

Articles Comprising Nanoscale Patterns With Reduced Edge Roughness and Methods of Making Same

 #42
20080213469
2008-09-04

METHOD AND APPRATUS FOR HIGH DENSITY NANOSTRUCTURES

 #43
20080166640
2008-07-10

Mask used for LIGA process, method of manufacturing the mask, and method of manufacturing microstructure using LIGA process

 #44
20080164637
2008-07-10

RELEASE SURFACES, PARTICULARLY FOR USE IN NANOIMPRINT LITHOGRAPHY

 #45
20080106003
2008-05-08

Methods and apparatus of pressure imprint lithography

 #46
20080090160
2008-04-17

Alignment for contact lithography

 #47
20080089470
2008-04-17

Alignment for contact lithography

 #48
20070257389
2007-11-08

Imprint Mask and Method for Defining a Structure on a Substrate

 #49
20070146680
2007-06-28

Exposure apparatus, exposure method, and exposure mask

 #50
20070145643
2007-06-28

Alignment for imprint lithography

 #51
20070058323
2007-03-15

Electroactive polymers for lithography

 #52
20060266953
2006-11-30

Method and system for determining a positioning error of an electron beam of a scanning electron microscope

 #53
20060264016
2006-11-23

Active mask lithography

 #54
20060264015
2006-11-23

Electroactive polymers for lithography

 #55
20060145400
2006-07-06

Method and apparatus for direct referencing of top surface of workpiece during imprint lithography

 #56
20060139660
2006-06-29

Lithographic apparatus, device manufacturing method and device manufactured thereby

 #57
20060127522
2006-06-15

Lithographic apparatus for molding ultrafine features

 #58
20060078807
2006-04-13

Lithographic mask alignment

 #59
20060065143
2006-03-30

Imprint apparatus and imprint method

 #60
20060006580
2006-01-12

Device for transferring a pattern to an object

 #61
20050186509
2005-08-25

Lithographic apparatus and device manufacturing method

 #62
20050167847
2005-08-04

Method for transferring a pattern

 #63
20050150862
2005-07-14

Workpiece alignment assembly

 #64
20050146079
2005-07-07

Lithographic method for molding a pattern

 #65
20050134816
2005-06-23

Lithographic apparatus, method of exposing a substrate, method of measurement, device manufacturing method, and device manufactured thereby