177266 ⎘
Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography; Technique, e.g. interferometric; Non-optical, e.g. mechanical, capacitive, using an electron beam, acoustic or thermal waves Scanning probe microscopy, e.g. AFM, scanning tunneling microscopy
DETERMINING A MEASUREMENT RECIPE IN A METROLOGY METHOD
#2Apparatus and method for determining a position of an element on a photolithographic mask
#3Method and metrology tool for determining information about a target structure, and cantilever probe
#4Apparatus and methods for determining the position of a target structure on a substrate
#5Apparatus and method for determining a position of an element on a photolithographic mask
#6Method of determining an overlay error, method for manufacturing a multilayer semiconductor device, atomic force microscopy device, lithographic system and semiconductor device
#7Alignment system and method
#8System and method for performing lithography process in semiconductor device fabrication
#9Measurement system and measurement method
#10System and method for performing lithography process in semiconductor device fabrication
#11Focus detection apparatus for projection lithography system
#12Apparatus and method for aligning surfaces
#13Method of aligning a first article relative to a second article
#14Apparatus for aligning a first article relative to a second article
#15Nanometer-precision tip-to-substrate control and pattern registration for scanning-probe lithography
#16Surface shape measuring apparatus, surface measuring method, and exposure apparatus