206389 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Sources; Ion sources; Methods of ionisation Microwaves
HIGH TEMPERATURE NV CENTER SENSING UP TO 1400K
#2METHODS AND SYSTEMS FOR RECLAMATION OF LI-ION CATHODE MATERIALS USING MICROWAVE PLASMA PROCESSING
#3PLASMA JET SOLID ABLATION-BASED DIRECT ANALYSIS APPARATUS
#4Modular microwave source with embedded ground surface
#5Modular microwave source with embedded ground surface
#6Methods and systems for plasma deposition and treatment
#7Methods and systems for plasma deposition and treatment
#8Plasma source
#9Methods and systems for plasma deposition and treatment
#10Methods and systems for plasma deposition and treatment
#11Source for selectively providing positively or negatively charged particles for a focusing column
#12Focused ion beam systems and methods of operation
#13Uniformity control using adjustable internal antennas
#14Plasma ion source for use with a focused ion beam column with selectable ions
#15Multi-source plasma focused ion beam system
#16High voltage isolation of an inductively coupled plasma ion source with a liquid that is not actively pumped
#17Ion source of an ion implanter
#18Methods and systems for plasma deposition and treatment
#19Methods and systems for plasma deposition and treatment
#20Methods and systems for plasma deposition and treatment
#21Source for selectively providing positively or negatively charged particles for a focusing column
#22Multi-source plasma focused ion beam system
#23Plasma potential modulated ion implantation system
#24Automated ion beam idle
#25Microplasma ion source for focused ion beam applications
#26Inductively-coupled plasma ion source for use with a focused ion beam column with selectable ions
#27Inductively coupled plasma source as an electron beam source for spectroscopic analysis
#28Encapsulation of electrodes in solid media
#29Multi-source plasma focused ion beam system
#30Apparatus and method for doping
#31Encapsulation of electrodes in solid media for use in conjunction with fluid high voltage isolation
#32Low-power gaseous plasma source
#33Apparatus for controlling the temperature of an RF ion source window
#34RF-driven ion source with a back-streaming electron dump
#35Electron cyclotron ion source and manufacturing method thereof
#36Methods and systems for plasma deposition and treatment
#37Composite focused ion beam device, process observation method using the same, and processing method
#38Techniques for providing a multimode ion source
#39High density helicon plasma source for wide ribbon ion beam generation
#40Ion source for generating negatively charged ions
#41Techniques for providing a multimode ion source
#42Multi-source plasma focused ion beam system
#43Multi mode ion source
#44Apparatus and method for doping
#45Techniques for providing a multimode ion source
#46Double plasma ion source
#47Focused ion beam apparatus
#48Focused Ion Beam Apparatus
#49Methods for beam current modulation by ion source parameter modulation
#50Apparatus and method for doping
#51Apparatus and method for doping